Patents by Inventor Kirthi Kattige

Kirthi Kattige has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma activated conformal dielectric film deposition
    Patent number: 10043655
    Abstract: Methods of depositing a film on a substrate surface include surface mediated reactions in which a film is grown over one or more cycles of reactant adsorption and reaction. In one aspect, the method is characterized by intermittent delivery of dopant species to the film between the cycles of adsorption and reaction.
    Type: Grant
    Filed: February 7, 2017
    Date of Patent: August 7, 2018
    Assignee: Novellus Systems, Inc.
    Inventors: Shankar Swaminathan, Jon Henri, Dennis Hausmann, Pramod Subramonium, Mandyam Sriram, Vishwanathan Rangarajan, Kirthi Kattige, Bart van Schravendijk, Andrew J. McKerrow
  • PLASMA ACTIVATED CONFORMAL DIELECTRIC FILM DEPOSITION
    Publication number: 20170148628
    Abstract: Methods of depositing a film on a substrate surface include surface mediated reactions in which a film is grown over one or more cycles of reactant adsorption and reaction. In one aspect, the method is characterized by intermittent delivery of dopant species to the film between the cycles of adsorption and reaction.
    Type: Application
    Filed: February 7, 2017
    Publication date: May 25, 2017
    Inventors: Shankar Swaminathan, Jon Henri, Dennis Hausmann, Pramod Subramonium, Mandyam Sriram, Vishwanathan Rangarajan, Kirthi Kattige, Bart van Schravendijk, Andrew J. McKerrow
  • Plasma activated conformal dielectric film deposition
    Patent number: 9570274
    Abstract: Methods of depositing a film on a substrate surface include surface mediated reactions in which a film is grown over one or more cycles of reactant adsorption and reaction. In one aspect, the method is characterized by intermittent delivery of dopant species to the film between the cycles of adsorption and reaction.
    Type: Grant
    Filed: January 28, 2015
    Date of Patent: February 14, 2017
    Assignee: Novellus Systems, Inc.
    Inventors: Shankar Swaminathan, Jon Henri, Dennis Hausmann, Pramod Subramonium, Mandyam Sriram, Vishwanathan Rangarajan, Kirthi Kattige, Bart van Schravendijk, Andrew J. McKerrow
  • PLASMA ACTIVATED CONFORMAL DIELECTRIC FILM DEPOSITION
    Publication number: 20150206719
    Abstract: Methods of depositing a film on a substrate surface include surface mediated reactions in which a film is grown over one or more cycles of reactant adsorption and reaction. In one aspect, the method is characterized by intermittent delivery of dopant species to the film between the cycles of adsorption and reaction.
    Type: Application
    Filed: January 28, 2015
    Publication date: July 23, 2015
    Inventors: Shankar Swaminathan, Jon Henri, Dennis Hausmann, Pramod Subramonium, Mandyam Sriram, Vishwanathan Rangarajan, Kirthi Kattige, Bart van Schravendijk, Andrew J. McKerrow