Patents by Inventor Kirubanandan Naina Shanmugam
Kirubanandan Naina Shanmugam has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240420926Abstract: Methods and apparatus for coating processing reactor component parts are provided herein. In some embodiments, a method for coating a part via atomic layer deposition includes: fastening a workpiece to be coated to an interior volume facing portion of a part coating reactor; and performing an ALD process on the fastened workpiece within the part coating reactor.Type: ApplicationFiled: August 26, 2024Publication date: December 19, 2024Inventors: Michael R. RICE, Hanish Kumar PANAVALAPPIL KUMARANKUTTY, Steven D. MARCUS, Kirubanandan Naina SHANMUGAM, Sriharsha DHARMAPURA SATHYANARAYANAMURTHY, Madhukar KRISHNA, Shivaprakash Padadayya HIREMATH, Senthil Kumar NATTAMAI SUBRAMANIAN, Sankar Menon CHERUBALA PATHAYAPURA
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Patent number: 12074010Abstract: Methods and apparatus for coating processing reactor component parts are provided herein. In some embodiments, a part coating reactor includes: a lower body and a lid assembly that together define and enclose an interior volume; one or more heaters disposed in the lid assembly; one or more coolant channels disposed in the lid assembly to flow a heat transfer medium therethrough; a plurality of gas passages disposed through the lid assembly to facilitate providing one or more gases to the interior volume, wherein the plurality of gas passages include a plurality of fluidly independent plenums disposed in the lid assembly; and one or more mounting brackets to facilitate coupling a workpiece to the lid assembly.Type: GrantFiled: September 9, 2021Date of Patent: August 27, 2024Assignee: APPLIED MATERIALS, INC.Inventors: Michael R. Rice, Hanish Kumar Panavalappil Kumarankutty, Steven D. Marcus, Kirubanandan Naina Shanmugam, Sriharsha Dharmapura Sathyanarayanamurthy, Madhukar Krishna, Shivaprakash Padadayya Hiremath, Senthil Kumar Nattamai Subramanian, Sankar Menon Cherubala Pathayapura
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Publication number: 20240117491Abstract: Embodiments of an apparatus for coating a plurality of gas lines are provided herein. In some embodiments, an apparatus for coating a plurality of gas lines via an ALD process includes: an oven having an enclosure that defines an interior volume configured to house the plurality of gas lines, the enclosure having a door configured for transferring the plurality of gas lines into and out of the interior volume; a plurality of inlet ports disposed through a first wall of the enclosure; a plurality of exhaust ports disposed through a second wall of the enclosure; a fluid panel disposed outside of the oven and coupled to the plurality of inlet ports via corresponding ones of a plurality of fluid distribution assemblies; and a foreline disposed outside of the oven and coupled to the plurality of exhaust ports.Type: ApplicationFiled: October 7, 2022Publication date: April 11, 2024Inventors: Hanish Kumar PANAVALAPPIL KUMARANKUTTY, Yogesh TOMAR, Nikshep M. PATIL, Hari Venkatesh RAJENDRAN, Kirubanandan Naina SHANMUGAM, Gayatri NATU, Mahesh ARCOT, Senthil Kumar NATTAMAI SUBRAMANIAN, Steven D. MARCUS, Michael R. RICE
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Publication number: 20240093367Abstract: Embodiments of part coating reactors are provided herein. In some embodiments, a part coating reactor includes a lid assembly, comprising: a body that includes a central region and a peripheral region, wherein the body includes a central opening in the central region, a first annular heater groove disposed radially outward of the central opening, and a second annular heater groove disposed radially outward of the first annular heater groove, wherein the peripheral region includes a plurality of vertical slots that extend from an upper surface of the body, and wherein a lower surface of the body includes an annular alignment groove; and a blocker plate including a substantially flat plate having a plurality of holes disposed therethrough and an annular wall extending above and below the flat plate, wherein an upper surface of the annular wall is disposed in the annular alignment groove of the body.Type: ApplicationFiled: September 16, 2022Publication date: March 21, 2024Inventors: Sriharsha DHARMAPURA SATHYANARAYANAMURTHY, Hanish Kumar PANAVALAPPIL KUMARANKUTTY, Kirubanandan Naina SHANMUGAM, Manojkumar SHANMUGASUNDARAM, Sriharish SRINIVASAN
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Patent number: 11848218Abstract: Exemplary semiconductor chamber component cleaning systems may include a receptacle. The receptacle may include a bottom lid that may be an annulus. The annulus may be characterized by an inner annular wall and an outer annular wall. A plurality of recessed annular ledges may be defined between the inner annular wall and the outer annular wall. Each recessed annular ledge of the plurality of recessed annular ledges may be formed at a different radial position along the bottom lid. The cleaning systems may include a top lid removably coupled with the bottom lid about an exterior region of the top lid. The cleaning systems may include a tank defining a volume to receive the receptacle.Type: GrantFiled: October 22, 2020Date of Patent: December 19, 2023Assignee: Applied Materials, Inc.Inventors: Katty Guyomard, Chidambara A. Ramalingam, Shawyon Jafari, Palash Joshi, Moin Ahmed Khan, Kirubanandan Naina Shanmugam, Subhaschandra Shreepad Salkod, Avishek Ghosh, David W. Groechel, Li Wu, Dorothea Buechel-Rimmel
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Publication number: 20230074149Abstract: Methods and apparatus for coating processing reactor component parts are provided herein. In some embodiments, a part coating reactor includes: a lower body and a lid assembly that together define and enclose an interior volume; one or more heaters disposed in the lid assembly; one or more coolant channels disposed in the lid assembly to flow a heat transfer medium therethrough; a plurality of gas passages disposed through the lid assembly to facilitate providing one or more gases to the interior volume, wherein the plurality of gas passages include a plurality of fluidly independent plenums disposed in the lid assembly; and one or more mounting brackets to facilitate coupling a workpiece to the lid assembly.Type: ApplicationFiled: September 9, 2021Publication date: March 9, 2023Inventors: Michael R. RICE, Hanish Kumar PANAVALAPPIL KUMARANKUTTY, Steven D. MARCUS, Kirubanandan Naina SHANMUGAM, Sriharsha DHARMAPURA SATHYANARAYANAMURTHY, Madhukar KRISHNA, Shivaprakash Padadayya HIREMATH, Senthil Kumar NATTAMAI SUBRAMANIAN, Sankar Menon CHERUBALA PATHAYAPURA
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Publication number: 20230073150Abstract: Embodiments of heated lids for a process chamber are provided herein. In some embodiments, a heated lid includes: a body having a central region and a peripheral region, wherein the body includes a central opening in the central region, wherein the peripheral region includes a plurality of vertical slots that extend into an upper surface of the body and arranged along a circle to provide a thermal break, and wherein the body includes one or more annular plenums that extend into the upper surface of the body and a plurality of holes extending through a bottom surface of the one or more annular plenums to a lower surface of the body; a first heater ring having one or more heating elements disposed therein, wherein the first heater ring is coupled to the central region of the body; and a second heater ring having one or more heating elements disposed therein.Type: ApplicationFiled: September 9, 2021Publication date: March 9, 2023Inventors: Shivaprakash Padadayya HIREMATH, Hanish Kumar PANAVALAPPIL KUMARANKUTTY, Kirubanandan Naina SHANMUGAM, Madhukar KRISHNA, Sriharsha DHARMAPURA SATHYANARAYANAMURTHY, Sriharish SRINIVASAN
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Publication number: 20220130692Abstract: Exemplary semiconductor chamber component cleaning systems may include a receptacle. The receptacle may include a bottom lid that may be an annulus. The annulus may be characterized by an inner annular wall and an outer annular wall. A plurality of recessed annular ledges may be defined between the inner annular wall and the outer annular wall. Each recessed annular ledge of the plurality of recessed annular ledges may be formed at a different radial position along the bottom lid. The cleaning systems may include a top lid removably coupled with the bottom lid about an exterior region of the top lid. The cleaning systems may include a tank defining a volume to receive the receptacle.Type: ApplicationFiled: October 22, 2020Publication date: April 28, 2022Applicant: Applied Materials, Inc.Inventors: Katty Guyomard, Chidambara A. Ramalingam, Shawyon Jafari, Palash Joshi, Moin Ahmed Khan, Kirubanandan Naina Shanmugam, Subhaschandra Shreepad Salkod, Avishek Ghosh, David W. Groechel, Li Wu, Dorothea Buechel-Rimmel