Patents by Inventor Kit Chen

Kit Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240174707
    Abstract: Provided are compounds having a tetradentate structure of that are useful as emitters in OLED applications.
    Type: Application
    Filed: February 2, 2024
    Publication date: May 30, 2024
    Applicant: Universal Display Corporation
    Inventors: Hsiao-Fan CHEN, Jason BROOKS, Chun LIN, Hai T. LE, Steven Kit CHOW, Neetipalli THRIMURTULU
  • Publication number: 20240122059
    Abstract: A compound of Formula I, is provided. In Formula I, one of Z1, Z2, and Z3 is N and the remainder are C; each of L1 and L2 is independently selected from a direct bond and a linking group; at least one of R1, R2, RA, RB, RC, RD, and RE comprises a group R* having a structure selected form the group consisting of Formula II, -Q(R3)(R4)a(R5)b, Formula III, and Formula IV, Each R, R?, R?, R1, R2, R3, R4, R5, RA, RB, RC, RD, RE, RF, RG, and RH is independently hydrogen or a General Substituent, with the proviso that group R* is not adamantyl. Formulations, OLEDs, and consumer products containing the compound are also provided.
    Type: Application
    Filed: September 27, 2023
    Publication date: April 11, 2024
    Applicant: UNIVERSAL DISPLAY CORPORATION
    Inventors: Hsiao-Fan CHEN, Geza SZIGETHY, Rasha HAMZE, Nicholas J. THOMPSON, Hojae CHOI, Weiye GUAN, Raghupathi NEELARAPU, Charles J. STANTON, Douglas WILLIAMS, Ving Jick LEE, Joseph A. MACOR, Dmitry ANDRIANOV, Chao LIANG, Steven Kit CHOW, Tyler FLEETHAM, Peter WOLOHAN, Morgan C. MACINNIS
  • Patent number: 11926638
    Abstract: Provided are compounds having a tetradentate structure of that are useful as emitters in OLED applications.
    Type: Grant
    Filed: June 30, 2020
    Date of Patent: March 12, 2024
    Assignee: UNIVERSAL DISPLAY CORPORATION
    Inventors: Hsiao-Fan Chen, Jason Brooks, Chun Lin, Hai T. Le, Steven Kit Chow, Neetipalli Thrimurtulu
  • Publication number: 20190143478
    Abstract: In an embodiment, a chemical mechanical planarization (CMP) system includes: a monolithic platen within a platen housing, wherein the monolithic platen is formed of a single piece of material, wherein the monolithic platen includes: a first portion within a first opening, and a second portion within a second opening, wherein the first portion has a different diameter than the second portion; and a polishing fluid delivery module above the monolithic platen, wherein the polishing fluid delivery module is configured to deliver slurry to the monolithic platen during performance of CMP.
    Type: Application
    Filed: April 27, 2018
    Publication date: May 16, 2019
    Inventors: Chou-Zon LIA, Kit Chen, Stone Chen, Sheng-Tai Peng