Abstract: A metal mask substrate includes a metal surface to which a resist is to be disposed. A specular reflectance of incident light to the surface is 45.2% or more.

Abstract: The percentage of a height of each undulation with respect to a length of the undulation is a unit steepness. A steepness is an average value of unit steepnesses of all undulations in a longitudinal direction at each of different positions in a width direction or a metal sheet. The maximum value of steepnesses in a center section in the width direction is less than or equal to 0.3%. The maximum value of steepnesses in a first edge in the width direction and a maximum value of steepnesses in a second edge section in the width direction are less than or equal to 0.6%. The maximum value of steepnesses in at least one of the first edge section and the second edge section in the width direction is less than the maximum value of steepnesses in the center section in the width direction.

Abstract: The ratio of the difference between a surface distance L at each of the different positions in a width direction DW of a metal sheet and a minimum surface distance Lm to the minimum surface distance Lm is an elongation difference ratio. The elongation difference ratio in a center section in the width direction DW of the metal sheet is less than or equal to 3×10?5. The elongation difference ratios in two edge sections in the width direction DW of the metal sheet are less than or equal to 15×10?5. The elongation difference ratio in at least one of the two edge sections in the width direction DW of the metal sheet is less than the elongation difference ratio in the center section in the width direction of the metal sheet.

Abstract: A metal mask substrate includes a metal obverse surface configured such that a resist is placed on the obverse surface. The obverse surface has a three-dimensional surface roughness Sa of less than or equal to 0.11 ?m. The obverse surface also has a three-dimensional surface roughness Sz of less than or equal to 3.17 ?m.

Abstract: A rolled metal sheet includes an obverse surface and a reverse surface that is a surface located opposite to the obverse surface. At least either one of the obverse surface and the reverse surface is a processing object. A method for manufacturing a metal mask substrate includes reducing a thickness of the rolled metal sheet to 10 ?m or less by etching the processing object by 3 ?m or more by use of an acidic etching liquid, and roughening the processing object so that the processing object becomes a resist formation surface that has a surface roughness Rz of 0.2 ?m or more, thereby obtaining a metal mask sheet.

Abstract: A metal mask substrate includes a metal surface to which a resist is to be disposed. A specular reflectance of incident light to the surface is 45.2% or more.

Abstract: A vapor deposition metal mask substrate includes a nickel-containing metal sheet including a obverse surface and a reverse surface, which is opposite to the obverse surface. At least one of the obverse surface and the reverse surface is a target surface for placing a resist layer. The target surface has a surface roughness Sa of less than or equal to 0.019 ?m. The target surface has a surface roughness Sz of less than or equal to 0.308 ?m.