Patents by Inventor Kiyofumi Takano
Kiyofumi Takano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9166182Abstract: The object of the present invention is to provide an organic transistor using an organic semiconductor having excellent transistor properties, and a method for producing the organic transistor, the present invention providing, first, an organic transistor including a gate electrode (b), an insulating layer (c), an organic semiconductor layer (d) which contacts the insulating layer (c) and has a channel formation area, and source/drain electrodes (e), which are formed on (a) a substrate, wherein the organic semiconductor layer (d) contains a fluorine-based compound (surfactant), and, secondly, a method for producing an organic transistor comprising a gate electrode (b), an insulating layer (c), an organic semiconductor layer (d) which contacts the insulating layer (c) and has a channel formation area, and source/drain electrodes (e), which are formed on (a) a substrate, the method comprising: a step in which the organic semiconductor layer (d) is formed on the insulating layer (c) by printing or coating an orgType: GrantFiled: June 29, 2009Date of Patent: October 20, 2015Assignee: DIC CorporationInventors: Masayoshi Kotake, Masanori Kasai, Hisatomo Yonehara, Kiyofumi Takano
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Publication number: 20140011954Abstract: An object of the present invention is to provide a method for producing porous silica particles having a small particle diameter in high yield relative to a volume of a reaction solution. In order to achieve the object, the present invention provides a method for producing porous silica particles having pores on the surfaces thereof, the method including a step of adding a mixed solution (solution A) containing tetraalkoxysilane, alkylamine, and alcohol to a mixed solution (solution B) containing ammonia, alcohol, and water and performing a hydrolysis and condensation reaction of the tetraalkoxysilane to produce silica particles, and a step of removing the alkylamine from the silica particles.Type: ApplicationFiled: January 19, 2012Publication date: January 9, 2014Applicant: DIC CORPORATIONInventors: Hiroki Tokoro, Youzou Yamashina, Kiyofumi Takano, Tomoyo Shimogaki, Minoru Tabuchi, Tomoe Deguchi
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Patent number: 8623478Abstract: Provided is an ink that is the most suitable for a method for forming an organic transistor by transferring a pattern using a liquid-repellent transfer substrate, for example, a microcontact printing method or a reverse printing method. Specifically, provided is an organic semiconductor ink composition which can provide a uniform ink coating film on a surface of a liquid-repellent transfer substrate and which can provide a dry ink film or a semi-dry ink film capable of being easily transferred from the transfer substrate to a transfer-receiving base material. Also provided is a method for forming an organic semiconductor pattern of an organic transistor, the method using the organic semiconductor ink composition. The organic semiconductor ink composition used for obtaining a desired pattern by transferring an ink layer formed on a liquid-repellent transfer substrate to a printing base material contains an organic semiconductor, an organic solvent, and a fluorine-based surfactant.Type: GrantFiled: March 30, 2010Date of Patent: January 7, 2014Assignee: DIC CorporationInventors: Masayoshi Koutake, Masanori Kasai, Hisatomo Yonehara, Kiyofumi Takano
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Patent number: 8410210Abstract: A fluorine-containing novolac resin represented by the following formula, as well as a fluorine based surfactant and a fluorine based surfactant composition, which include the fluorine-containing novolac resin. In the formula, R represents a fluorinated alkyl-containing substituent, R? represents a hydrogen atom or a methyl group, R? represents a hydrogen atom or a non-fluorinated substituent, —X— represents any one of following four types of linking groups, —X? represents any one of three following types of substituents, n represents 0 or an integer of 1 or more, m represents an integer of 1 or more, and n+m is an integer of 2 or more.Type: GrantFiled: May 21, 2008Date of Patent: April 2, 2013Assignee: DIC CorporationInventors: Hideya Suzuki, Shin Sasamoto, Kiyofumi Takano
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Publication number: 20120100667Abstract: Provided is an ink that is the most suitable for a method for forming an organic transistor by transferring a pattern using a liquid-repellent transfer substrate, for example, a microcontact printing method or a reverse printing method. Specifically, provided is an organic semiconductor ink composition which can provide a uniform ink coating film on a surface of a liquid-repellent transfer substrate and which can provide a dry ink film or a semi-dry ink film capable of being easily transferred from the transfer substrate to a transfer-receiving base material. Also provided is a method for forming an organic semiconductor pattern of an organic transistor, the method using the organic semiconductor ink composition. The organic semiconductor ink composition used for obtaining a desired pattern by transferring an ink layer formed on a liquid-repellent transfer substrate to a printing base material contains an organic semiconductor, an organic solvent, and a fluorine-based surfactant.Type: ApplicationFiled: March 30, 2010Publication date: April 26, 2012Applicant: DIC CorporationInventors: Masayoshi Koutake, Masanori Kasai, Hisatomo Yonehara, Kiyofumi Takano
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Publication number: 20110121281Abstract: The object of the present invention is to provide an organic transistor using an organic semiconductor having excellent transistor properties, and a method for producing the organic transistor, the present invention providing, first, an organic transistor including a gate electrode (b), an insulating layer (c), an organic semiconductor layer (d) which contacts the insulating layer (c) and has a channel formation area, and source/drain electrodes (e), which are formed on (a) a substrate, wherein the organic semiconductor layer (d) contains a fluorine-based compound (surfactant), and, secondly, a method for producing an organic transistor comprising a gate electrode (b), an insulating layer (c), an organic semiconductor layer (d) which contacts the insulating layer (c) and has a channel formation area, and source/drain electrodes (e), which are formed on (a) a substrate, the method comprising: a step in which the organic semiconductor layer (d) is formed on the insulating layer (c) by printing or coating an orgType: ApplicationFiled: June 29, 2009Publication date: May 26, 2011Applicant: DIC CORPORATIONInventors: Masayoshi Kotake, Masanori Kasai, Hisatomo Yonehara, Kiyofumi Takano
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Publication number: 20100113678Abstract: A fluorine-containing novolac resin represented by the following formula, as well as a fluorine based surfactant and a fluorine based surfactant composition, which include the fluorine-containing novolac resin. In the formula, R represents a fluorinated alkyl-containing substituent, R? represents a hydrogen atom or a methyl group, R? represents a hydrogen atom or a non-fluorinated substituent, —X— represents any one of following four types of linking groups, —X? represents any one of three following types of substituents, n represents 0 or an integer of 1 or more, m represents an integer of 1 or more, and n+m is an integer of 2 or more.Type: ApplicationFiled: May 21, 2008Publication date: May 6, 2010Applicant: DIC CORPORATIONInventors: Hideya Suzuki, Shin Sasamoto, Kiyofumi Takano
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Patent number: 7592405Abstract: A fluorine-containing photocurable composition containing a (meth)acrylate having a fluorinated alkyl group (A) and a photopolymerization initiator (B). The (meth)acrylate (A) includes a group represented by general formula (1) and two or more (meth)acryloyl groups, and a fluorine atom content in one molecule of the acrylate is 25% by weight or more, and molecular weight of the (meth)acrylate is 500 to 4000 (in the general formula (1), R represents a hydrogen atom or alkyl group having 1 to 4 carbon atoms; X represents an alkylene chain, which may have a hetero atom, or a connecting group represented by the following general formula (2); and Rf represents a fluorinated alkyl group) (in the formula (2), Y represents an oxygen atom or a sulfur atom, m and n are an integer of 1 to 4 which may be the same as or different from each other; and Rf1 is a fluorinated alkyl group).Type: GrantFiled: November 18, 2004Date of Patent: September 22, 2009Assignee: DIC CorporationInventors: Tsuneyuki Otaguro, Hiroshi Kinoshita, Kiyofumi Takano, Hirofumi Yamaguchi
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Patent number: 7537882Abstract: The object of the present invention is to provide an anti-reflective coating composition having excellent coating properties while maintaining performance as an anti-reflective film. An anti-reflective coating composition comprising at least the following components (A), (B), (C), (D), and (E) and a production method for a pattern using the anti-reflective coating composition, (A) perfluoroalkyl•alkylenesulfonic acid represented by the following formula (1): CnF2n+1(CH2CH2)mSO3H (1) (wherein, n represents an integer from 1 to 20, and m represents an integer from 0 to 20); (B) organic amine; (C) water-soluble polymer; (D) perfluoroalkylethyl group containing compound represented by the following formula (2): CkF2k+1CH2CH2—X—Y (2) (wherein, k represents an integer from 1 to 20, x represents a single bond or a divalent linking group, y represents an anionic group or a nonionic group, and this compound has a structure different from that of the component (A)); and (E) water.Type: GrantFiled: June 29, 2005Date of Patent: May 26, 2009Assignees: Dainippon Ink and Chemicals, Inc., AZ Electronic Materials (Japan) K.K.Inventors: Jirou Matsuo, Kiyofumi Takano, Yusuke Takano, Yasushi Akiyama
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Publication number: 20070238048Abstract: The object of the present invention is to provide an anti-reflective coating composition having excellent coating properties while maintaining performance as an anti-reflective film. An anti-reflective coating composition comprising at least the following components (A), (B), (C), (D), and (E) and a production method for a pattern using the anti-reflective coating composition, (A) perfluoroalkyl•alkylenesulfonic acid represented by the following formula (1): CnF2n+1(CH2CH2)mSO3H (1) (wherein, n represents an integer from 1 to 20, and m represents an integer from 0 to 20); (B) organic amine; (C) water-soluble polymer; (D) perfluoroalkylethyl group containing compound represented by the following formula (2): CkF2k+1CH2CH2—X—Y (2) (wherein, k represents an integer from 1 to 20, x represents a single bond or a divalent linking group, y represents an anionic group or a nonionic group, and this compound has a structure different from that of the component (A)); and (E) water.Type: ApplicationFiled: June 29, 2005Publication date: October 11, 2007Applicants: DAINIPPON INK AND CHEMICALS, INC., AZ ELECTRONIC MATTERIALS (JAPAN) K.K.Inventors: Jirou Matsuo, Kiyofumi Takano, Yusuke Takano, Yasushi Akiyama
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Publication number: 20070066779Abstract: A fluorine-containing photocurable composition containing a (meth)acrylate having a fluorinated alkyl group (A) and a photopolymerization initiator (B). The (meth)acrylate (A) includes a group represented by general formula (1) and two or more (meth)acryloyl groups, and a fluorine atom content in one molecule of the acrylate is 25% by weight or more, and molecular weight of the (meth)acrylate is 500 to 4000 (in the general formula (1), R represents a hydrogen atom or alkyl group having 1 to 4 carbon atoms; X represents an alkylene chain, which may have a hetero atom, or a connecting group represented by the following general formula (2); and Rf represents a fluorinated alkyl group) (in the formula (2), Y represents an oxygen atom or a sulfur atom, m and n are an integer of 1 to 4 which may be the same as or different from each other; and Rf1 is a fluorinated alkyl group).Type: ApplicationFiled: November 18, 2004Publication date: March 22, 2007Inventors: Tsuneyuki Otaguro, Hiroshi Kinoshita, Kiyofumi Takano, Hirofumi Yamaguchi
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Patent number: 6716943Abstract: The invention provides a surface active agent containing fluorine, which is a copolymer composed of several ethylenic unsaturated monomers containing a fluorinated alkyl group, a silicone chain, and a polyoxyalkylene group, and the surface loss energy of which is less than 110×10−5 mJ in an organic solvent. The copolymer of the surface active agent is soluble to water and in various organic solvents, and has a good compatibility with other ingredients used to form the coating compositions. The present surface active agent reduces the dynamic surface tension of the coating composition, and thereby, have a good foam-preventing property, coating compositions containing the present surface active agent yield coated films with uniform and smooth level surfaces without forming irregularity and striation even by coating operations at high speed and high shearing force.Type: GrantFiled: January 14, 2002Date of Patent: April 6, 2004Assignee: Dainippon Ink and Chemicals, Inc.Inventors: Kazunori Tanaka, Kiyofumi Takano, Torao Higuchi, Yutaka Hashimoto
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Publication number: 20020103316Abstract: The invention provides a surface active agent containing fluorine, which is a copolymer composed of several ethylenic unsaturated monomers containing a fluorinated alkyl group, a silicone chain, and a polyoxyalkylene group, and the surface loss energy of which is less than 110×10−5 mJ in an organic solvent. The copolymer of the surface active agent is soluble to water and in various organic solvents, and has a good compatibility with other ingredients used to form the coating compositions. The present surface active agent reduces the dynamic surface tension of the coating composition, and thereby, have a good foam-preventing property, coating compositions containing the present surface active agent yield coated films with uniform and smooth level surfaces without forming irregularity and striation even by coating operations at high speed and high shearing force.Type: ApplicationFiled: January 14, 2002Publication date: August 1, 2002Applicant: Dainippon Ink. and Chemicals, Inc.Inventors: Kazunori Tanaka, Kiyofumi Takano, Torao Higuchi, Yutaka Hashimoto
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Patent number: 6384168Abstract: The invention provides a surface active agent containing fluorine, which is a copolymer composed of several ethylenic unsaturated monomers containing a fluorinated alkyl group, a silicone chain, and a polyoxyalkylene group, and the surface loss energy of which is less than 110×10−5 mJ in an organic solvent. The copolymer of the surface active agent is soluble to water and in various organic solvents, and has a good compatibility with other ingredients used to form the coating compositions. The present surface active agent reduces the dynamic surface tension of the coating composition, and thereby, have a good foam-preventing property, coating compositions containing the present surface active agent yield coated films with uniform and smooth level surfaces without forming irregularity and striation even by coating operations at high speed and high shearing force.Type: GrantFiled: October 31, 2000Date of Patent: May 7, 2002Assignee: Dainippon Ink and Chemicals, Inc.Inventors: Kazunori Tanaka, Kiyofumi Takano, Torao Higuchi, Yutaka Hashimoto
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Patent number: 6313244Abstract: The invention provides a surface active agent containing fluorine, which is a copolymer composed of several ethylenic unsaturated monomers containing a fluorinated alkyl group, a silicone chain, and a polyoxyalkylene group, and the surface loss energy of which is less than 110×10−5 mJ in an organic solvent. The copolymer of the surface active agent is soluble to water and in various organic solvents, and has a good compatibility with other ingredients used to form the coating compositions. The present surface active agent reduces the dynamic surface tension of the coating composition, and thereby, have a good foam-preventing property, coating compositions containing the present surface active agent yield coated films with uniform and smooth level surfaces without forming irregularity and striation even by coating operations at high speed and high shearing force.Type: GrantFiled: October 20, 2000Date of Patent: November 6, 2001Assignee: Dainippon Ink and Chemicals, Inc.Inventors: Kazunori Tanaka, Kiyofumi Takano, Torao Higuchi, Yutaka Hashimoto
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Patent number: 6309789Abstract: The anti-reflective coating composition comprising at least perfluoroalkylsulfonic acid (A) represented by the general formula: CnF2n+1SO3H (n is an integer of 4 to 8), organic amine (B), water-soluble polymer (C), perfluoroalkyl sulfonamide (D) represented by the general formula: CnF2n+1SO2NH2 (n is an integer of 1 to 8) and water (E) and having a pH value of 1.3 to 3.3 is applied onto a photoresist film formed on a substrate, thus forming an anti-reflective coating. The photoresist and anti-reflective coating are then exposed to light and developed to give a resist pattern. The coating composition can form a uniform anti-reflective coating free of standing wave, multiple reflection, T-top and PED (Post Exposure Delay) in a small amount of drip onto any types of resists regardless of the surface shape of a substrate.Type: GrantFiled: May 25, 2000Date of Patent: October 30, 2001Assignees: Clariant Finance (BVI) Limited, Dainippon Ink and Chemicals, Inc.Inventors: Yusuke Takano, Hatsuyuki Tanaka, Kiyofumi Takano, Yutaka Hashimoto
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Patent number: 6156860Abstract: The invention provides a surface active agent containing fluorine, which is a copolymer composed of several ethylenic unsaturated monomers containing a fluorinated alkyl group, a silicone chain, and a polyoxyalkylene group, and the surface loss energy of which is less than 110.times.10.sup.-5 mJ in an organic solvent. The copolymer of the surface active agent is soluble to water and in various organic solvents, and has a good compatibility with other ingredients used to form the coating compositions. The present surface active agent reduces the dynamic surface tension of the coating composition, and thereby, have a good foam-preventing property, coating compositions containing the present surface active agent yield coated films with uniform and smooth level surfaces without forming irregularity and striation even by coating operations at high speed and high shearing force.Type: GrantFiled: February 17, 1998Date of Patent: December 5, 2000Assignee: Dainippon Ink and Chemicals, Inc.Inventors: Kazunori Tanaka, Kiyofumi Takano, Torao Higuchi, Yutaka Hashimoto