Patents by Inventor Kiyoharu Tsutsumi

Kiyoharu Tsutsumi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20020169266
    Abstract: A photoresist polymeric compound includes a monomer unit represented by following Formula (I): 1
    Type: Application
    Filed: October 19, 2001
    Publication date: November 14, 2002
    Inventors: Yoshinori Funaki, Kiyoharu Tsutsumi, Akira Takaragi
  • Patent number: 6440636
    Abstract: A polymeric compound includes at least one monomeric unit of the following formula (I): wherein R1 is a hydrogen atom or a methyl group; and each of R2 and R3 is independently a hydrogen atom or a hydroxyl group. The polymeric compound may include the monomeric unit and at least one monomeric unit selected from monomeric units represented by the following formulae (IIa) and (IIb): wherein R1 is a hydrogen atom or a methyl group; each of R4 and R5 is, for example, a hydrogen atom, a hydroxyl group, an oxo group, or a carboxyl group, wherein R4 and R5 are not concurrently hydrogen atoms; and each of R7 and R8 is independently a hydrogen atom, a hydroxyl group, or an oxo group. The polymeric compound have a high etching resistance in addition to satisfactory transparency, alkali-solubility, and adhesion.
    Type: Grant
    Filed: November 2, 2000
    Date of Patent: August 27, 2002
    Assignees: Kabushiki Kaisha Toshiba, Daicel Chemical Industries, LTD
    Inventors: Toru Ushirogouchi, Takeshi Okino, Koji Asakawa, Naomi Shida, Yoshinori Funaki, Kiyoharu Tsutsumi, Akira Takaragi, Keizo Inoue
  • Patent number: 6054507
    Abstract: There are disclosed a metal-organic polymer composite structure, particularly a porous metal-organic polymer composite structure, for use as functional materials such as catalysts, and a method for producing the structure. The composite structure is composed of a microphase-separated structure from a block copolymer in which a metalphilic polymer chain and a metalphobic polymer chain are bonded together at each end, and ultrafine metal particles are contained in the metalphilic polymer phase of the microphase-separated structure.
    Type: Grant
    Filed: March 9, 1998
    Date of Patent: April 25, 2000
    Assignee: Japan Science and Technology Corporation
    Inventors: Yoshinori Funaki, Kiyoharu Tsutsumi, Takeji Hashimoto, Masafumi Harada