Patents by Inventor Kiyohisa Inao

Kiyohisa Inao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5382929
    Abstract: A monolithic crystal filter includes a crystal plate sealed airtight in a vessel. The vessel consists of a metal lid and a main body. The crystal plate is supported a predetermined distance from an insulating substrate. An input electrode and an output electrode are affixed to one surface of the crystal plate. A common electrode is affixed to the other surface of the crystal plate. The insulating substrate has a shield electrode thereon facing the input electrode and output electrode. The shield electrode is grounded to the metal lid of the vessel. An optimal distance between the shield electrode and the input electrode and the output electrode is disclosed for obtaining the best stopband attenuation level. An aluminum electrode island between the crystal plate and an electrode terminal develops an oxide coating which permits relaxation of stress and strain between the electrode island and its associated input and output electrodes to the resulting appropriate bonding strength therebetween.
    Type: Grant
    Filed: August 2, 1993
    Date of Patent: January 17, 1995
    Assignee: NDK, Nihon Dempa Kogyo Company, Ltd.
    Inventors: Kiyohisa Inao, Koji Mizuki, Masaki Kumagai, Takeo Seki
  • Patent number: 4255686
    Abstract: In a photosensor having at least a light-transmitting conductive layer which is arranged on the side of light incidence, and a photoconductive layer in which charges are stored in correspondence with the light incidence; a photosensor characterized in that at least a region of said photoconductive layer for storing the charges is made of an amorphous material which contains hydrogen and silicon as indispensable constituent elements thereof, in which the silicon amounts to at least 50 atomic % and the hydrogen amounts to at least 10 atomic % and at most 50 atomic %, and whose resistivity is not lower than 10.sup.10 .OMEGA..multidot.cm.
    Type: Grant
    Filed: May 16, 1979
    Date of Patent: March 10, 1981
    Assignee: Hitachi, Ltd.
    Inventors: Eiichi Maruyama, Yoshinori Imamura, Saburo Ataka, Kiyohisa Inao, Yukio Takasaki, Toshihisa Tsukada, Tadaaki Hirai
  • Patent number: 4249106
    Abstract: A radiation sensitive screen comprising a crystalline silicon substrate which is located on a side of incidence of radiation, and an amorphous silicon film which contains hydrogen and which is located on the opposite side of the substrate to the side of the incidence of the radiation. The radiation sensitive screen of this invention can be manufactured by a simple method, and can achieve a high resolution. It is useful for the target of an image pickup tube, the electron bombardment target of an X-ray fluorescence multiplier tube, etc.
    Type: Grant
    Filed: November 7, 1979
    Date of Patent: February 3, 1981
    Assignee: Hitachi, Ltd.
    Inventors: Eiichi Maruyama, Saburo Ataka, Kiyohisa Inao, Yoshinori Imamura, Toshihisa Tsukada, Yukio Takasaki, Tadaaki Hirai
  • Patent number: 4195230
    Abstract: An input screen of an X-ray fluoromultiplier tube, that is, an X-ray image intensifier tube, wherein an evaporated aluminum film is interposed between a substrate and a fluorescent substance (cesium iodide) film is disclosed.The input screen according to this invention does not undergo the "charge-up" attributed to the exfoliation or cracks of the cesium iodide film, and can therefore present a picture of extraordinarily high quality.
    Type: Grant
    Filed: March 28, 1978
    Date of Patent: March 25, 1980
    Assignees: Hitachi, Ltd., Hitachi Denshi Kabushiki Kaisha
    Inventors: Saburo Ataka, Kiyohisa Inao, Kanetosi Tada, Yoshinori Okamura, Isamu Kimura
  • Patent number: 4121537
    Abstract: An apparatus for vacuum deposition comprising a turn-table for holding substrates for deposition, and a plurality of evaporation boats arranged in opposition to a circumferential part of the turn-table, the turn-table being rotated at deposition whereby vapors from the respective boats can be cyclically accumulated and stuck onto the substrates, further comprises at least one film-thickness monitor which is fixed to the turn-table and which detects the quantity of a deposited substance of one layer stuck every time the substrates pass over each boat, and means to receive a signal from the film-thickness monitor and divide the signal time sequentially, thereby detecting at least one of the deposition rate and the total amount of the vapor from each boat, and to control the quantity of the vapor arriving to the substrates for deposition from each boat while comparing the detected value with a predetermined value.
    Type: Grant
    Filed: March 21, 1977
    Date of Patent: October 24, 1978
    Assignee: Hitachi, Ltd.
    Inventors: Eiichi Maruyama, Tadaaki Hirai, Sachio Ishioka, Hideaki Yamamoto, Kiyohisa Inao