Patents by Inventor Kiyohito Yamamoto

Kiyohito Yamamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7834982
    Abstract: A substrate holding apparatus including a first holding member for attracting a first surface of a substrate, a second holding member which contacts a second surface, opposite to the first surface, of the substrate, in which the second holding member attracts the second surface, and a forcing member for forcing the first holding member toward the second holding member.
    Type: Grant
    Filed: June 27, 2007
    Date of Patent: November 16, 2010
    Assignee: Canon Kabushiki Kaisha
    Inventor: Kiyohito Yamamoto
  • Publication number: 20100136123
    Abstract: In order to heighten the density of microcapsules and facilitate handling by the unit composed of microcapsules in a given amount smaller than in the whole sheet, a microcapsule sheet which comprises a substrate constituted of an edible film and microcapsules each obtained by surrounding a core layer with a first shell film and a second shell film, the microcapsules being arranged according to a given pattern so as to be arranged only in those regions of the substrate which are separated from each other.
    Type: Application
    Filed: October 12, 2007
    Publication date: June 3, 2010
    Applicant: TORAY ENGINEERING CO., LTD.
    Inventors: Shinya Izumida, Takashi Iwade, Takashi Nagayama, Masashi Motoi, Kiyohito Yamamoto
  • Publication number: 20090188630
    Abstract: An apparatus capable of producing a laminated microcapsule sheet through transferring with high productivity of a drug solution of high viscosity accurately as much as a given weight while avoiding run-off from an enteric layer. There is provided an apparatus comprising edible film holding means (1) for holding an edible film (4); solution transfer printing means (2) equipped with multiple needles (22) for transfer printing of a solution containing any of materials; and a pallet (3) for applying of the solution containing any of materials to the solution transfer printing means (2).
    Type: Application
    Filed: February 2, 2007
    Publication date: July 30, 2009
    Applicants: TORAY ENGINEERING CO., LTD.
    Inventors: Kanji Takada, Takashi Iwade, Shinya Izumida, Masamichi Yamashita, Kiyohito Yamamoto
  • Patent number: 7298482
    Abstract: An exposure apparatus for aligning a substrate and performing exposure using the aligned substrate. The apparatus includes a first alignment system, having a first stage and a first image sensing unit, to detect a position of a first mark on the substrate on the first stage using the first image sensing unit, a transfer system to transfer the substrate, on which the position of the first mark has been detected by the first alignment system, from the first stage onto a second stage, and a second alignment system, having the second stage and a second image sensing unit of which magnification is higher than that of the first image sensing unit, to detect a position of a second mark on the substrate on the second stage using the second image sensing unit, and to align the substrate based on the detection obtained by using the second image sensing unit.
    Type: Grant
    Filed: May 20, 2005
    Date of Patent: November 20, 2007
    Assignee: Canon Kabushiki Kaisha
    Inventor: Kiyohito Yamamoto
  • Patent number: 7295287
    Abstract: A substrate holding apparatus including a first holding member for attracting a first surface of a substrate, a second holding member which contacts a second surface, opposite to the first surface, of the substrate, in which the second holding member attracts the second surface, and a forcing member for forcing the first holding member toward the second holding member.
    Type: Grant
    Filed: October 26, 2004
    Date of Patent: November 13, 2007
    Assignee: Canon Kabushiki Kaisha
    Inventor: Kiyohito Yamamoto
  • Publication number: 20070252971
    Abstract: A substrate holding apparatus includes a first holding member for attracting a first surface of a substrate, a second holding member which contacts a second surface, opposite to the first surface, of the substrate; and a forcing member for forcing the first holding member toward said second holding member.
    Type: Application
    Filed: June 27, 2007
    Publication date: November 1, 2007
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Kiyohito YAMAMOTO
  • Publication number: 20050219533
    Abstract: An exposure apparatus for aligning a substrate and performing exposure using the aligned substrate. The apparatus includes a first alignment system, having a first stage and a first image sensing unit, to detect a position of a first mark on the substrate on the first stage using the first image sensing unit, a transfer system to transfer the substrate, on which the position of the first mark has been detected by the first alignment system, from the first stage onto a second stage, and a second alignment system, having the second stage and a second image sensing unit of which magnification is higher than that of the first image sensing unit, to detect a position of a second mark on the substrate on the second stage using the second image sensing unit, and to align the substrate based on the detection obtained by using the second image sensing unit.
    Type: Application
    Filed: May 20, 2005
    Publication date: October 6, 2005
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Kiyohito Yamamoto
  • Patent number: 6952262
    Abstract: An exposure apparatus for aligning a substrate and performing exposure using the aligned substrate. The apparatus includes a first alignment system, having a first stage and a first image sensing unit, to detect a position of a first mark on the substrate on the first stage using the first image sensing unit, a transfer system to transfer the substrate, on which the position of the first mark has been detected by the first alignment system, from the first stage onto a second stage, and a second alignment system, having the second stage and a second image sensing unit of which magnification is higher than that of the first image sensing unit, to detect a position of a second mark on the substrate on the second stage using the second image sensing unit, and to align the substrate based on the detection obtained by using the second image sensing unit.
    Type: Grant
    Filed: January 23, 2004
    Date of Patent: October 4, 2005
    Assignee: Canon Kabushiki Kaisha
    Inventor: Kiyohito Yamamoto
  • Publication number: 20050094126
    Abstract: A substrate holding apparatus includes a first holding member for attracting a first surface of a substrate, a second holding member which contacts a second surface, opposite to the first surface, of the substrate; and a forcing member for forcing the first holding member toward said second holding member.
    Type: Application
    Filed: October 26, 2004
    Publication date: May 5, 2005
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Kiyohito Yamamoto
  • Publication number: 20040150823
    Abstract: An aligning apparatus having a prealignment stage 30 and a reticle stage 10 performs reticle alignment. First, rough alignment is performed on a reticle placed on the prealignment stage 30 such that a reticle mark is brought to a predetermined position. A reticle exchange hand 4 transfers the reticle from the prealignment stage 30 to the reticle stage 10. On the reticle stage 10, an image processing unit 31, a control unit 32 and a first image sensing mechanism 20, 21 perform high-accuracy alignment on the reticle such that the reticle mark is brought to a predetermined position. The reticle aligned on the reticle stage 10 is subjected to exposure processing or the like.
    Type: Application
    Filed: January 23, 2004
    Publication date: August 5, 2004
    Applicant: Canon Kabushiki Kaisha
    Inventor: Kiyohito Yamamoto