Patents by Inventor Kiyokazu Aiso

Kiyokazu Aiso has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Wavelength-independent exposure pattern generation method and exposure pattern generation system for lithography
    Patent number: 6800428
    Abstract: A method of generating an exposure pattern for lithography to create a plurality of patterns arranged in a predetermined direction, comprises a step of counting the plurality of patterns along this predetermined direction, and generating a first enlarged pattern by moving the edges to a first direction along the predetermined direction for a pattern with an odd number, and by moving the edges to a second direction, which is opposite to the first direction, for a pattern with an even number, and a step of generating a second enlarged pattern by moving the edges to the second direction for the pattern with an odd number, and by moving the edges to the first direction for the pattern with an even number. And the first and second patterns are used for creating the plurality of original patterns in a lithography step using the respective enlarged patterns.
    Type: Grant
    Filed: April 29, 2002
    Date of Patent: October 5, 2004
    Assignee: Fujitsu Limited
    Inventors: Tomoyuki Okada, Taketoshi Omata, Kazuya Sugawa, Kiyokazu Aiso, Masao Sugiyama, Tomoaki Kawaguchi
  • Wavelength-independent exposure pattern generation method and exposure pattern generation system for lithography
    Publication number: 20030087193
    Abstract: A method of generating an exposure pattern for lithography to create a plurality of patterns arranged in a predetermined direction, comprises a step of counting the plurality of patterns along this predetermined direction, and generating a first enlarged pattern by moving the edges to a first direction along the predetermined direction for a pattern with an odd number, and by moving the edges to a second direction, which is opposite to the first direction, for a pattern with an even number, and a step of generating a second enlarged pattern by moving the edges to the second direction for the pattern with an odd number, and by moving the edges to the first direction for the pattern with an even number. And the first and second patterns are used for creating the plurality of original patterns in a lithography step using the respective enlarged patterns.
    Type: Application
    Filed: April 29, 2002
    Publication date: May 8, 2003
    Applicant: FUJITSU LIMITED
    Inventors: Tomoyuki Okada, Taketoshi Omata, Kazuya Sugawa, Kiyokazu Aiso, Masao Sugiyama, Tomoaki Kawaguchi