Patents by Inventor Kiyoko Kawamura

Kiyoko Kawamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10273316
    Abstract: A technology for curing a photocurable resin composition by ultraviolet ray/infrared ray hybrid irradiation is provided. An infrared ray irradiation is applied at least one of before or after the application of ultraviolet ray irradiation to a photocurable resin composition, to have the photocurable resin composition cured. It becomes possible to relax the ultraviolet ray irradiation conditions for photo curing by applying an infrared ray irradiation as compared with the case in which the infrared ray irradiation is not applied, and, in particular, the scratch resistance characteristics of a cured film are significantly enhanced. Moreover, because of a combination of ultraviolet ray irradiation and infrared ray irradiation, the curing time period of a cured film can be reduced and/or stress relaxation effects can be produced. Besides, it becomes possible to control the reflectance of a cured film by varying an irradiation amount of infrared ray.
    Type: Grant
    Filed: November 21, 2017
    Date of Patent: April 30, 2019
    Assignee: HERAEUS KABUSHIKI KAISHA
    Inventors: Kazuo Ashikaga, Kiyoko Kawamura, Teruo Orikasa
  • Patent number: 10144787
    Abstract: A technology for curing a photocurable resin composition by ultraviolet ray/infrared ray hybrid irradiation is provided. An infrared ray irradiation is applied at least one of before or after the application of ultraviolet ray irradiation to a photocurable resin composition, to have the photocurable resin composition cured. It becomes possible to relax the ultraviolet ray irradiation conditions for photo curing by applying an infrared ray irradiation as compared with the case in which the infrared ray irradiation is not applied, and, in particular, the scratch resistance characteristics of a cured film are significantly enhanced. Moreover, because of a combination of ultraviolet ray irradiation and infrared ray irradiation, the curing time period of a cured film can be reduced and/or stress relaxation effects can be produced. Besides, it becomes possible to control the reflectance of a cured film by varying an irradiation amount of infrared ray.
    Type: Grant
    Filed: November 21, 2017
    Date of Patent: December 4, 2018
    Assignee: HERAEUS KABUSHIKI KAISHA
    Inventors: Kazuo Ashikaga, Kiyoko Kawamura, Teruo Orikasa
  • Publication number: 20180171036
    Abstract: A technology for curing a photocurable resin composition by ultraviolet ray/infrared ray hybrid irradiation is provided. An infrared ray irradiation is applied at least one of before or after the application of ultraviolet ray irradiation to a photocurable resin composition, from which volatile components have been removed by a heating process, to have the photocurable resin composition cured. It becomes possible to relax the ultraviolet ray irradiation conditions for photo curing by applying an infrared ray irradiation as compared with the case in which the infrared ray irradiation is not applied, and, in particular, the scratch resistance characteristics of a cured film are significantly enhanced. Moreover, because of a combination of ultraviolet ray irradiation and infrared ray irradiation, the curing time period of a cured film can be reduced and/or stress relaxation effects can be produced.
    Type: Application
    Filed: November 21, 2017
    Publication date: June 21, 2018
    Inventors: Kazuo ASHIKAGA, Kiyoko KAWAMURA, Teruo ORIKASA
  • Patent number: 9868796
    Abstract: A technology for curing a photocurable resin composition by ultraviolet ray/infrared ray hybrid irradiation is provided. An infrared ray irradiation is applied at least one of before or after the application of ultraviolet ray irradiation to a photocurable resin composition, from which volatile components have been removed by a heating process, to have the photocurable resin composition cured. It becomes possible to relax the ultraviolet ray irradiation conditions for photo curing by applying an infrared ray irradiation as compared with the case in which the infrared ray irradiation is not applied, and, in particular, the scratch resistance characteristics of a cured film are significantly enhanced. Moreover, because of a combination of ultraviolet ray irradiation and infrared ray irradiation, the curing time period of a cured film can be reduced and/or stress relaxation effects can be produced.
    Type: Grant
    Filed: August 25, 2015
    Date of Patent: January 16, 2018
    Assignee: Heraeus Kabushiki Kaisha
    Inventors: Kazuo Ashikaga, Kiyoko Kawamura, Teruo Orikasa
  • Publication number: 20160326275
    Abstract: A technology for curing a photocurable resin composition by ultraviolet ray/infrared ray hybrid irradiation is provided. An infrared ray irradiation is applied at least one of before or after the application of ultraviolet ray irradiation to a photocurable resin composition, from which volatile components have been removed by a heating process, to have the photocurable resin composition cured. It becomes possible to relax the ultraviolet ray irradiation conditions for photo curing by applying an infrared ray irradiation as compared with the case in which the infrared ray irradiation is not applied, and, in particular, the scratch resistance characteristics of a cured film are significantly enhanced. Moreover, because of a combination of ultraviolet ray irradiation and infrared ray irradiation, the curing time period of a cured film can be reduced and/or stress relaxation effects can be produced.
    Type: Application
    Filed: August 25, 2015
    Publication date: November 10, 2016
    Inventors: Kazuo ASHIKAGA, Kiyoko KAWAMURA, Teruo ORIKASA
  • Publication number: 20100233125
    Abstract: The invention relates to novel chimeric adenoviruses comprising the type 5-modified chimeric adenoviruses, in which the fiber knob domain in the adenoviruses type 5 is replaced by the adenoviruses type 35 fiber knob domain and any exogenous transcriptional regulatory regions controlling expression of the E1A and E1B genes are introduced into the region from which adenoviruses type 5 E1A transcriptional regulatory region has been removed. The chimeric adenoviruses are cytotoxic or oncolytic chimeric adenoviruses and can be utilized as, for example, pharmaceutical agents having high cytotoxic activity against intractable tumors such as malignant mesothelioma.
    Type: Application
    Filed: August 9, 2007
    Publication date: September 16, 2010
    Applicant: Chiba-ken
    Inventors: Masatoshi Tagawa, Kiyoko Kawamura, Hisanori Takenobu