Abstract: A substrate processing apparatus according to an exemplary embodiment includes a chamber, a source power supply that provides power for exciting plasma in a form in which the power level pulses, a support member that is disposed inside the chamber and supports a substrate, and a bias voltage supply that is connected to the support member and supplies a voltage for bias, and the power level of the output of the source power supply falls at a power fall time, and the voltage level of the output of the bias voltage supply rises from a control voltage level to a reference voltage level at an end time, and the end time is positioned later than the power fall time by a margin time.

Abstract: The present disclosure is directed to a drug delivery system in which urate oxidase and metal-based nanoparticles for hydrogen peroxide degradation are loaded in a temperature-sensitive nanocarrier, and a pharmaceutical composition for treating hyperuricemia-related disease comprising the drug delivery system. In the drug delivery system of the present disclosure, urate oxidase and metal-based nanoparticles for hydrogen peroxide degradation are positioned close to each other, thereby effectively removing the toxic substance hydrogen peroxide (H2O2) generated during uric acid degradation. The drug delivery system of the present disclosure may be developed as an active ingredient of a drug for preventing or treating hyperuricemia-related disease.