Patents by Inventor Kiyoshi Ehara

Kiyoshi Ehara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate processing method and substrate processing apparatus
    Patent number: 10236199
    Abstract: A substrate processing method comprises: an execution step of executing the first processing for the plurality of substrates, and executing the second processing for the substrates having undergone the first processing; a recovery step of recovering the plurality of substrates having undergone the first processing and the second processing to the retraction chamber; a conditioning step of, after completion of the first processing for the last substrate among the plurality of substrates, loading a dummy substrate into the first processing chamber, executing the third processing for the dummy substrate, and unloading the dummy substrate from the first processing chamber; and a second execution step of, after the dummy substrate is unloaded from the first processing chamber in the conditioning step, loading the substrates recovered in the recovery step into the first processing chamber, and executing the third processing for the substrates loaded into the first processing chamber.
    Type: Grant
    Filed: June 2, 2016
    Date of Patent: March 19, 2019
    Assignee: CANON ANELVA CORPORATION
    Inventors: Kiyoshi Ehara, Mitsuo Suzuki
  • SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
    Publication number: 20160276193
    Abstract: A substrate processing method comprises: an execution step of executing the first processing for the plurality of substrates, and executing the second processing for the substrates having undergone the first processing; a recovery step of recovering the plurality of substrates having undergone the first processing and the second processing to the retraction chamber; a conditioning step of, after completion of the first processing for the last substrate among the plurality of substrates, loading a dummy substrate into the first processing chamber, executing the third processing for the dummy substrate, and unloading the dummy substrate from the first processing chamber; and a second execution step of, after the dummy substrate is unloaded from the first processing chamber in the conditioning step, loading the substrates recovered in the recovery step into the first processing chamber, and executing the third processing for the substrates loaded into the first processing chamber.
    Type: Application
    Filed: June 2, 2016
    Publication date: September 22, 2016
    Inventors: Kiyoshi Ehara, Mitsuo Suzuki
  • SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
    Publication number: 20120160805
    Abstract: A substrate processing method comprises: an execution step of executing the first processing for the plurality of substrates, and executing the second processing for the substrates having undergone the first processing; a recovery step of recovering the plurality of substrates having undergone the first processing and the second processing to the retraction chamber; a conditioning step of, after completion of the first processing for the last substrate among the plurality of substrates, loading a dummy substrate into the first processing chamber, executing the third processing for the dummy substrate, and unloading the dummy substrate from the first processing chamber; and a second execution step of, after the dummy substrate is unloaded from the first processing chamber in the conditioning step, loading the substrates recovered in the recovery step into the first processing chamber, and executing the third processing for the substrates loaded into the first processing chamber.
    Type: Application
    Filed: December 19, 2011
    Publication date: June 28, 2012
    Applicant: CANON ANELVA CORPORATION
    Inventors: Kiyoshi Ehara, Mitsuo Suzuki