Patents by Inventor Kiyoshi Ishikawa

Kiyoshi Ishikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11954155
    Abstract: An information processing device according to the present application includes a generation unit and a providing unit. The generation unit uses a model that is trained to learn a relationship between a criterion for classifying users of a first company and a criterion for classifying users of a second company to generate a criterion (common key) for classifying the users of the second company into a first category, from the criterion for classifying the users of the first company into the first category. The providing unit provides a criterion generated by the generation unit.
    Type: Grant
    Filed: March 9, 2022
    Date of Patent: April 9, 2024
    Assignee: Yahoo Japan Corporation
    Inventors: Kiyoshi Sasaki, Akira Tajima, Takahiro Ishikawa, Koji Tsukamoto, Seira Nakamura, Kazuki Nakayama
  • Publication number: 20230272386
    Abstract: A myoregulin inhibitor such as an antisense oligonucleotide against myoregulin or an anti-myoregulin antibody is used as an active ingredient of a prophylactic or therapeutic agent for a muscle disease such as muscular dystrophy, inclusion body myositis, amyotrophic lateral sclerosis, disused muscular atrophy, and sarcopenia.
    Type: Application
    Filed: July 16, 2021
    Publication date: August 31, 2023
    Applicant: MITSUBISHI TANABE PHARMA CORPORATION
    Inventors: Kiyoshi ISHIKAWA, Shumpei MURATA
  • Patent number: 11088640
    Abstract: A drive apparatus for a motor having a stator and a rotor, the drive apparatus including a current detection unit configured to detect, when the motor is rotating, each of multi-phase currents flowing through coils of the stator, and a control unit for controlling the motor by sensor-less control configured to convert the detected multi-phase currents into a d-axis current Id and a q-axis current Iq in a d-q coordinate system, calculate a phase error between an actual rotational position of the rotor and an imaginary rotational position thereof by comparing the d-axis current Id with a d-axis current command value Idref and comparing the q-axis current Iq with the d-axis current command value Idref, perform control so that the phase error gets closer to zero, and output voltage command values to a motor drive circuit.
    Type: Grant
    Filed: December 16, 2019
    Date of Patent: August 10, 2021
    Assignee: RENESAS ELECTRONICS CORPORATION
    Inventors: Naohiko Aoki, Kiyoshi Ishikawa
  • Publication number: 20200119666
    Abstract: A drive apparatus for a motor having a stator and a rotor, the drive apparatus including a current detection unit configured to detect, when the motor is rotating, each of multi-phase currents flowing through coils of the stator, and a control unit for controlling the motor by sensor-less control configured to convert the detected multi-phase currents into a d-axis current Id and a q-axis current Iq in a d-q coordinate system, calculate a phase error between an actual rotational position of the rotor and an imaginary rotational position thereof by comparing the d-axis current Id with a d-axis current command value Idref and comparing the q-axis current Iq with the d-axis current command value Idref, perform control so that the phase error gets closer to zero, and output voltage command values to a motor drive circuit.
    Type: Application
    Filed: December 16, 2019
    Publication date: April 16, 2020
    Inventors: Naohiko AOKI, Kiyoshi ISHIKAWA
  • Patent number: 10530281
    Abstract: An oil-pump motor drive apparatus includes a current detection unit for detecting each of multi-phase currents flowing through coils of a stator, a control unit for converting the detected multi-phase currents into a d-axis current Id and a q-axis current Iq, calculating a phase error between an actual rotational position of the rotor and an imaginary rotational position by comparing the d-axis current Id with a d-axis current command value Idref and comparing the q-axis current Iq with the d-axis current command value Idref, performing control so that the phase error gets closer to zero, and outputting voltage command values indicating voltages to be applied to respective phases of the brushless motor, to a motor drive circuit, in which the control unit sets the d-axis current command value Idref to a value larger than zero when the number of revolutions of the motor is smaller than a predetermined number.
    Type: Grant
    Filed: May 2, 2018
    Date of Patent: January 7, 2020
    Assignee: RENESAS ELECTRONICS CORPORATION
    Inventors: Naohiko Aoki, Kiyoshi Ishikawa
  • Publication number: 20180337620
    Abstract: An oil-pump motor drive apparatus includes a current detection unit for detecting each of multi-phase currents flowing through coils of a stator, a control unit for converting the detected multi-phase currents into a d-axis current Id and a q-axis current Iq, calculating a phase error between an actual rotational position of the rotor and an imaginary rotational position by comparing the d-axis current Id with a d-axis current command value Idref and comparing the q-axis current Iq with the d-axis current command value Idref, performing control so that the phase error gets closer to zero, and outputting voltage command values indicating voltages to be applied to respective phases of the brushless motor, to a motor drive circuit, in which the control unit sets the d-axis current command value Idref to a value larger than zero when the number of revolutions of the motor is smaller than a predetermined number.
    Type: Application
    Filed: May 2, 2018
    Publication date: November 22, 2018
    Inventors: Naohiko AOKI, Kiyoshi ISHIKAWA
  • Patent number: 9868090
    Abstract: A process removes metal impurities from an untreated chemical liquid, which includes a silylating agent. The process includes providing a strongly acidic cation-exchange resin in which a cation-exchange group is immobilized to a resin membrane or an integral structure of a particle-removing membrane and an ion exchange resin membrane in which a strongly acidic cation-exchange resin has been chemically introduced onto surfaces of pores in a porous resin. The wettability of the ion exchange resin membrane is thereafter improved by contacting the ion-exchange resin membrane with an organic solvent. The metal impurities are then removed from the untreated chemical liquid by passing the untreated chemical liquid through the ion-exchange resin membrane.
    Type: Grant
    Filed: March 15, 2016
    Date of Patent: January 16, 2018
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Kiyoshi Ishikawa, Akira Kumazawa, Daijiro Mori
  • Publication number: 20160279578
    Abstract: A process for preparing a chemical liquid of a silylating agent that has a reduced metal impurity concentration, and a surface treatment method using a chemical liquid of a silylating agent obtained by the preparation process. The process includes reducing metal impurities contained in an untreated chemical liquid of a silylating agent using an ion-exchange resin membrane that has been brought into contact with an organic solvent in advance. A surface treatment method that hydrophobizes a substrate surface includes exposing, to the substrate surface, a chemical liquid of a silylating agent obtained by the above process for preparing a chemical liquid of a silylating agent.
    Type: Application
    Filed: March 15, 2016
    Publication date: September 29, 2016
    Inventors: Kiyoshi ISHIKAWA, Akira KUMAZAWA, Daijiro MORI
  • Patent number: 9405199
    Abstract: A method of forming a resist pattern, and a film including a metal-containing compound formed on the resist pattern while developing the resist pattern. The method uses an organic solvent developer liquid, in which a metal compound capable of generating a hydroxyl group upon hydrolysis is dissolved in an organic solvent that does not have a functional group that reacts with the metal compound.
    Type: Grant
    Filed: August 4, 2014
    Date of Patent: August 2, 2016
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Mai Sugawara, Kiyoshi Ishikawa
  • Patent number: 9112510
    Abstract: A reference voltage generation circuit has: a first PN junction element; a second PN junction element having a higher forward direction voltage than the first PN junction element; a first differential amplifier inputting an anode of the first PN junction element and a first connection node between a first and a second resistor disposed in series between a first output of the first differential amplifier and a first potential, and generating a first output voltage at the first output; and a second differential amplifier inputting an anode of the second PN junction element and a second connection node between a fourth and a third resistor disposed in series between a second output of the second differential amplifier and the first output of the first differential amplifier, and generating a reference voltage at the second output. A resistance ratio between the third and the fourth resistors is variable.
    Type: Grant
    Filed: November 30, 2012
    Date of Patent: August 18, 2015
    Assignee: SOCIONEXT INC.
    Inventor: Kiyoshi Ishikawa
  • Publication number: 20150054504
    Abstract: An optically pumped magnetometer includes: a modulation unit which allows rectangular wave modulation to an angle of a polarization plane of probe light; a detector for detecting a change of the angle of the polarization plane of the probe light transmitted through a cell; and a differential circuit for obtaining a difference in light intensity between components separated by a polarization splitter. Thus, both a reduction of a light intensity noise of the probe light and a separation and reduction of a noise defined by an inverse of a frequency in a low frequency area can be achieved.
    Type: Application
    Filed: March 26, 2013
    Publication date: February 26, 2015
    Applicant: Canon Kabushiki Kaisha
    Inventors: Sunao Ichihara, Tetsuo Kobayashi, Kiyoshi Ishikawa
  • Publication number: 20150044617
    Abstract: A method of forming a resist pattern, and a film including a metal-containing compound formed on the resist pattern while developing the resist pattern. The method uses an organic solvent developer liquid, in which a metal compound capable of generating a hydroxyl group upon hydrolysis is dissolved in an organic solvent that does not have a functional group that reacts with the metal compound.
    Type: Application
    Filed: August 4, 2014
    Publication date: February 12, 2015
    Inventors: Mai Sugawara, Kiyoshi Ishikawa
  • Patent number: 8865395
    Abstract: A method of forming a resist pattern, comprising: a step of forming a resist film on a substrate using a resist composition containing a base component (A) which exhibits decreased solubility in an organic solvent under action of acid and an acid-generator component (B) which generates acid upon exposure; a step of subjecting the resist film to exposure; a step of patterning the resist film by a negative-tone development using a developing solution containing the organic solvent to form a resist pattern; a step of applying a coating material to the resist pattern, thereby forming a coating film; a step of performing a thermal treatment at a temperature lower than the softening point of the resist pattern, thereby heat shrinking the coating film to narrow an interval between the resist pattern; and a step of removing the coating film.
    Type: Grant
    Filed: June 6, 2012
    Date of Patent: October 21, 2014
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Tsuyoshi Nakamura, Kiyoshi Ishikawa
  • Patent number: 8456161
    Abstract: The present invention relates to a method and system for polarizing a solid compound of interest via spin transfer from an optically-pumped alkali vapor. In one embodiment, the method provides a cell which contains a solid compound as well as pure alkali metal and some amount of buffer gas. The cell is heated to vaporize some of the pure alkali. Resonant laser light is passed through the cell to polarize the atomic vapor, a process known as “optical pumping.” Optical pumping can transfer order from photons to atoms, causing a buildup of vapor atoms in one angular momentum state. This vapor polarization is then transferred through the surface of the solid compound in order to polarize the nuclei in the bulk of the compound. This can produce nuclear polarizations in the sample many times larger than the limit set by thermal equilibrium. The method can be used in nuclear magnetic resonance (NMR) or magnetic resonance imaging (MRI).
    Type: Grant
    Filed: September 5, 2007
    Date of Patent: June 4, 2013
    Assignee: The Trustees of Princeton University
    Inventors: William Happer, Kiyoshi Ishikawa, Brian Patton, Yuan-Yu Jau
  • Publication number: 20130082700
    Abstract: The present invention has an object to provide a nuclear magnetic resonance imaging apparatus or the like that avoids a region with zero sensitivity of an optical magnetometer and allows imaging by strong magnetic resonance when a common magnetic field is used as a bias field of an optical magnetometer and as a magnetostatic field to be applied to a sample. When a direction of a magnetostatic field application unit applying a magnetostatic field to a sample is a z direction, alkali metal cell of a scalar magnetometer is arranged so as not to overlap a region to be imaged in a z direction, and so as not to intersect the region to be imaged in an in-plane direction perpendicular to the z direction.
    Type: Application
    Filed: September 5, 2012
    Publication date: April 4, 2013
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Natsuhiko Mizutani, Tetsuo Kobayashi, Kiyoshi Ishikawa
  • Publication number: 20130082701
    Abstract: The present invention has an object to provide a nuclear magnetic resonance imaging apparatus or the like that avoids a region with zero sensitivity of an optical magnetometer and allows imaging by strong magnetic resonance when a common magnetic field is used as a bias field of an optical magnetometer and as a magnetostatic field to be applied to a sample. When a direction of a magnetostatic field application unit applying a magnetostatic field to a sample is a z direction, alkali metal cells of a plurality of scalar magnetometers are arranged so as not to overlap a region to be imaged in a z direction, and so as not to intersect the region to be imaged in an in-plane direction perpendicular to the z direction.
    Type: Application
    Filed: September 6, 2012
    Publication date: April 4, 2013
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Natsuhiko Mizutani, Tetsuo Kobayashi, Kiyoshi Ishikawa
  • Patent number: 8378863
    Abstract: An analog-to-digital (AD) converter device, includes: a capacitive digital-to-analog converter (DAC) including a reference capacitor group having capacitors which are weighted with a ratio, one terminal of each of the capacitors being coupled to a common signal line, the other terminal of each of the capacitors being coupled to one of reference power supplies via one of switches; a comparator to compare a voltage of the common signal line with a reference voltage; a successive approximation routine circuit to control the switches based on a comparison result of the comparator; an offset correction circuit to correct an offset of the comparator; and a DAC correction circuit to correct an error in a voltage change of the common signal line, the offset correction circuit and the DAC correction circuit performing a correction so that a residual offset of the comparator and a residual error of the capacitive DAC cancel.
    Type: Grant
    Filed: March 3, 2011
    Date of Patent: February 19, 2013
    Assignee: Fujitsu Limited
    Inventor: Kiyoshi Ishikawa
  • Publication number: 20130017501
    Abstract: A method of forming a resist pattern, comprising: a step of forming a resist film on a substrate using a resist composition containing a base component (A) which exhibits decreased solubility in an organic solvent under action of acid and an acid-generator component (B) which generates acid upon exposure; a step of subjecting the resist film to exposure; a step of patterning the resist film by a negative-tone development using a developing solution containing the organic solvent to form a resist pattern; a step of applying a coating material to the resist pattern, thereby forming a coating film; a step of performing a thermal treatment at a temperature lower than the softening point of the resist pattern, thereby heat shrinking the coating film to narrow an interval between the resist pattern; and a step of removing the coating film.
    Type: Application
    Filed: June 6, 2012
    Publication date: January 17, 2013
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Tsuyoshi Nakamura, Kiyoshi Ishikawa
  • Patent number: 8323745
    Abstract: An application liquid capable of forming a dense silica-based coating film even when embedded into a fine groove, and a method for formation of a silica-based coating film using the application liquid are provided. An application liquid is used including (A) a siloxane polymer, and (B) a base generator represented by the following general formula (I): wherein, R1 and R2 are a hydrocarbon group having 1 to 5 carbon atoms and which may be the same or different; or one of R1 and R2 is a hydrogen atom and the other is a hydrocarbon group having 1 to 5 carbon atoms; when R1 and R2 are both a hydrocarbon group, these may bind to one another to form a ring structure; R3 is a linking group; and R4 is a condensed ring.
    Type: Grant
    Filed: March 26, 2010
    Date of Patent: December 4, 2012
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Tokonori Yamadaya, Kiyoshi Ishikawa, Atsushi Sawano
  • Patent number: 8124312
    Abstract: A novel method for forming a pattern capable of decreasing the number of steps in a double patterning process, and a material for forming a coating film suitably used in the method for forming a pattern are provided. First resist film (2) is formed by applying a first chemically amplified resist composition on support (1), and thus formed film is selectively exposed, and developed to form multiple first resist patterns (3). Next, on the surface of the first resist patterns (3) are formed multiple coating patterns (5) by forming coating films (4) constituted with a water soluble resin film, respectively. Furthermore, a second chemically amplified resist composition is applied on the support (1) having the coating pattern (5) formed thereon to form second resist film (6), which is selectively exposed and developed to form multiple second resist patterns (7). Accordingly, a pattern including the coating patterns (5) and the second resist patterns (7) is formed on the support (1).
    Type: Grant
    Filed: September 13, 2007
    Date of Patent: February 28, 2012
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Kiyoshi Ishikawa, Jun Koshiyama, Kazumasa Wakiya