Patents by Inventor Kiyoshi Ohsuga

Kiyoshi Ohsuga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9925618
    Abstract: A laser processing apparatus is provided wherein a laser beam of a wavelength which passes through a wafer having a surface on which a plurality of devices are disposed is irradiated along a schedule division line to separate the adjacent devices from each other to form a modification layer which continuously extends in a given length in the inside of the wafer. A mark portion is displayed in an overlapping relationship with a picked up image obtained by image pickup of a wafer on a display unit. If the mark portion is moved to a desired position of the picked up image displayed on the display unit, then coordinates which correspond to the desired position of the picked up image are stored as a start point or an end portion of a scheduled division line, along which the modification layer is to be formed, into a storage unit.
    Type: Grant
    Filed: September 1, 2015
    Date of Patent: March 27, 2018
    Assignee: Disco Corporation
    Inventors: Tsutomu Maeda, Kiyoshi Ohsuga
  • Publication number: 20160074959
    Abstract: A laser processing apparatus is provided wherein a laser beam of a wavelength which passes through a wafer having a surface on which a plurality of devices are disposed is irradiated along a schedule division line to separate the adjacent devices from each other to form a modification layer which continuously extends in a given length in the inside of the wafer. A mark portion is displayed in an overlapping relationship with a picked up image obtained by image pickup of a wafer on a display unit. If the mark portion is moved to a desired position of the picked up image displayed on the display unit, then coordinates which correspond to the desired position of the picked up image are stored as a start point or an end portion of a scheduled division line, along which the modification layer is to be formed, into a storage unit.
    Type: Application
    Filed: September 1, 2015
    Publication date: March 17, 2016
    Inventors: Tsutomu Maeda, Kiyoshi Ohsuga
  • Patent number: 8476553
    Abstract: A method of dividing a workpiece includes: forming a pre-machining alteration region in the inside of a region in which no device is formed; detecting the position of the pre-machining alteration region through infrared imaging by imaging means, to thereby recognize a deviation between the pre-machining alteration region and a planned dividing line as machining position correction information; and forming a main machining alteration region by utilizing the machining position correction information, whereby the workpiece can be accurately divided along the planned dividing lines into individual devices.
    Type: Grant
    Filed: September 1, 2011
    Date of Patent: July 2, 2013
    Assignee: Disco Corporation
    Inventors: Satoshi Usuda, Kiyoshi Ohsuga, Masaru Nakamura
  • Publication number: 20120061361
    Abstract: A method of dividing a workpiece includes: forming a pre-machining alteration region in the inside of a region in which no device is formed; detecting the position of the pre-machining alteration region on through infrared imaging by imaging means, to thereby recognize a deviation between the pre-machining alteration region and a planned dividing line as machining position correction information; and forming a main machining alteration region by utilizing the machining position correction information, whereby the workpiece can be accurately divided along the planned dividing lines into individual devices.
    Type: Application
    Filed: September 1, 2011
    Publication date: March 15, 2012
    Applicant: DISCO CORPORATION
    Inventors: Satoshi Usuda, Kiyoshi Ohsuga, Masaru Nakamura
  • Patent number: 7927974
    Abstract: First, mapping data storing interrupted areas is obtained. In a first modified-layer forming step, before a stacked article is stacked on a front surface of a substrate, a laser beam is directed to the interrupted areas based on the mapping data to form modified layers only at the interrupted areas. After the stacked articles have been stacked on the substrate, in a second modified-layer forming step, the laser beam is directed at least to the predetermined dividing line formed with no modified layer in the first modified-layer forming step to form a modified layer.
    Type: Grant
    Filed: November 13, 2008
    Date of Patent: April 19, 2011
    Assignee: Disco Corporation
    Inventors: Yosuke Watanabe, Kenji Furuta, Kiyoshi Ohsuga
  • Publication number: 20090149002
    Abstract: First, mapping data storing interrupted areas is obtained. In a first modified-layer forming step, before a stacked article is stacked on a front surface of a substrate, a laser beam is directed to the interrupted areas based on the mapping data to form modified layers only at the interrupted areas. After the stacked articles have been stacked on the substrate, in a second modified-layer forming step, the laser beam is directed at least to the predetermined dividing line formed with no modified layer in the first modified-layer forming step to form a modified layer.
    Type: Application
    Filed: November 13, 2008
    Publication date: June 11, 2009
    Applicant: DISCO CORPORATION
    Inventors: Yosuke Watanabe, Kenji Furuta, Kiyoshi Ohsuga
  • Patent number: 7483115
    Abstract: A method of laser processing a liquid crystal device wafer which is formed by laminating together a silicon substrate and a glass substrate, and has liquid crystal devices in respective rectangular areas sectioned by streets arranged in a lattice pattern on the front surface, the method comprising: a first deteriorated layer forming step for forming a deteriorated layer along the streets in the inside of the silicon substrate by applying a laser beam of a wavelength capable of passing through the silicone substrate and forming a deteriorated layer in the inside of the silicon substrate from the glass substrate side with its focal point set to the inside of the silicon substrate; and a second deteriorated layer forming step for forming a deteriorated layer along the streets in the inside of the glass substrate by applying a laser beam of a wavelength capable of passing through the glass substrate and forming a deteriorated layer in the inside of the glass substrate with its focal point set to the inside of the
    Type: Grant
    Filed: August 7, 2006
    Date of Patent: January 27, 2009
    Assignee: Disco Corporation
    Inventors: Koichi Shigematsu, Satoshi Kobayashi, Kiyoshi Ohsuga
  • Publication number: 20070035692
    Abstract: A method of laser processing a liquid crystal device wafer which is formed by laminating together a silicon substrate and a glass substrate, and has liquid crystal devices in respective rectangular areas sectioned by streets arranged in a lattice pattern on the front surface, the method comprising: a first deteriorated layer forming step for forming a deteriorated layer along the streets in the inside of the silicon substrate by applying a laser beam of a wavelength capable of passing through the silicone substrate and forming a deteriorated layer in the inside of the silicon substrate from the glass substrate side with its focal point set to the inside of the silicon substrate; and a second deteriorated layer forming step for forming a deteriorated layer along the streets in the inside of the glass substrate by applying a laser beam of a wavelength capable of passing through the glass substrate and forming a deteriorated layer in the inside of the glass substrate with its focal point set to the inside of the
    Type: Application
    Filed: August 7, 2006
    Publication date: February 15, 2007
    Inventors: Koichi Shigematsu, Satoshi Kobayashi, Kiyoshi Ohsuga