Patents by Inventor Kiyoshi Okabayashi

Kiyoshi Okabayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5342501
    Abstract: Novel aqueous accelerating solutions and methods for their use in connection with metal plating of dielectric materials are disclosed and claimed. The accelerating solutions are mildly basic aqueous solutions including dilute concentrations of copper ions.
    Type: Grant
    Filed: October 30, 1992
    Date of Patent: August 30, 1994
    Assignee: Eric F. Harnden
    Inventor: Kiyoshi Okabayashi
  • Patent number: 5268088
    Abstract: Improved methods for electroplating non-conducting substrates are disclosed utilizing aqueous alkali metal containing adhesion promoter solutions to enhance the surface deposition of colloidal metal activating catalysts to form conducting layers capable of direct electroplating. The adhesion promoter solutions contain sufficient alkali metal ions to deposit trace amounts of metal ions onto the substrate surface to be plated. Copper ions may be incorporated into the adhesion promoters to enhance this effect. These adhesion promoter solutions eliminate the swelling and related problems associated with the direct electroplating of acrylic and epoxy containing substrates. Following adhesion promoter treatment, the substrates are conditioned with a cleaner/conditioner solution and catalytically activated with a colloidal catalyst of palladium and tin forming a highly conductive catalytically treated surface which will support subsequent direct electroplating in conventional plating baths.
    Type: Grant
    Filed: January 31, 1992
    Date of Patent: December 7, 1993
    Assignee: Eric F. Harnden
    Inventor: Kiyoshi Okabayashi
  • Patent number: 5262042
    Abstract: Improved methods for electroplating non-conducting substrates are disclosed utilizing aqueous saline adhesion promoter solutions and rinse solutions to enhance the surface deposition of colloidal metal activating catalysts to form conducting layers capable of direct electroplating. One variation of the process recycles excess activating catalyst into the aqueous saline adhesion promoter to eliminate waste.
    Type: Grant
    Filed: December 12, 1991
    Date of Patent: November 16, 1993
    Assignee: Eric F. Harnden
    Inventor: Kiyoshi Okabayashi
  • Patent number: 4933010
    Abstract: Disclosed is a sensitizing activator for chemical plating operations, that uniformly and efficiently deposits a substance capable of catalytically depositing a plating metal from a plating solution, such as colloidal palladium, on the surface of a material to be plated. The activator includes stannous chloride and palladium chloride colloidally dispersed in a dilute solution of sulfuric acid and sodium chloride. The activator advantageously avoids corrosion of the black oxide that is formed on the inner copper foil of copper-clad laminates.
    Type: Grant
    Filed: September 2, 1988
    Date of Patent: June 12, 1990
    Assignee: Eric F. Harnden
    Inventor: Kiyoshi Okabayashi