Patents by Inventor Kiyoshi Shirasuna

Kiyoshi Shirasuna has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040241056
    Abstract: Hydrophobic silica fine powder is produced by pyrolyzing a silane compound to form a silica fine powder and hydrophobizing the silica fine powder with an organohalosilane in a fluidization vessel. Hydrophobized silica fine powder which flies out of the fluidization vessel is collected with a cyclone and bag filter which are held at a temperature of 100-500° C. An apparatus for carrying out the process is also provided. Under simple controlled conditions that involve holding the cyclone and bag filter for recovering fugitive silica from the fluidization vessel to temperatures of 100-500° C., the method and apparatus are able to recover essentially 100% of fugitive silica, thus increasing yield of the product and alleviating the burden on waste gas treatment.
    Type: Application
    Filed: March 11, 2004
    Publication date: December 2, 2004
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasuaki Nozawa, Kiyoshi Shirasuna, Masanori Akiyama, Takayuki Matsuzawa
  • Patent number: 6749823
    Abstract: Hydrophobic silica fine powder is produced by pyrolyzing a silane compound to form a silica fine powder and hydrophobizing the silica fine powder with an organohalosilane in a fluidization vessel. Hydrophobized silica fine powder which flies out of the fluidization vessel is collected with a cyclone and bag filter which are held at a temperature of 100-500° C. An apparatus for carrying out the process is also provided. Under simple controlled conditions that involve holding the cyclone and bag filter for recovering fugitive silica from the fluidization vessel to temperatures of 100-500° C., the method and apparatus are able to recover essentially 100% of fugitive silica, thus increasing yield of the product and alleviating the burden on waste gas treatment.
    Type: Grant
    Filed: August 30, 2001
    Date of Patent: June 15, 2004
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasuaki Nozawa, Kiyoshi Shirasuna, Masanori Akiyama, Takayuki Matsuzawa
  • Patent number: 6696034
    Abstract: Hydrophobic silica fine powder is produced by pyrolyzing a silane compound to form a silica fine powder and hydrophobizing the silica fine powder with an organohalosilane as hydrophobizing agent in a fluidization vessel. A portion of the silica fine powder is bypassed to a waste gas line from the fluidization vessel and collected with a cyclone and bag filter, and the collected powder is fed to the fluidization vessel where it is hydrophobized. The amount of unreacted organohalosilane in the waste gases is reduced, alleviating the burden on waste gas treatment. The silica having the unreacted organohalosilane borne thereon is fed back to the fluidization vessel, increasing the reaction efficiency of organohalosilane.
    Type: Grant
    Filed: August 30, 2001
    Date of Patent: February 24, 2004
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasuaki Nozawa, Kiyoshi Shirasuna, Hidekazu Uehara, Keiji Shibata, Susumu Ueno
  • Publication number: 20020025289
    Abstract: Hydrophobic silica fine powder is produced by pyrolyzing a silane compound to form a silica fine powder and hydrophobizing the silica fine powder with an organohalosilane in a fluidization vessel. Hydrophobized silica fine powder which flies out of the fluidization vessel is collected with a cyclone and bag filter which are held at a temperature of 100-500° C. An apparatus for carrying out the process is also provided. Under simple controlled conditions that involve holding the cyclone and bag filter for recovering fugitive silica from the fluidization vessel to temperatures of 100-500° C., the method and apparatus are able to recover essentially 100% of fugitive silica, thus increasing yield of the product and alleviating the burden on waste gas treatment.
    Type: Application
    Filed: August 30, 2001
    Publication date: February 28, 2002
    Inventors: Yasuaki Nozawa, Kiyoshi Shirasuna, Masanori Akiyama, Takayuki Matsuzawa
  • Publication number: 20020025288
    Abstract: Hydrophobic silica fine powder is produced by pyrolyzing a silane compound to form a silica fine powder and hydrophobizing the silica fine powder with an organohalosilane as hydrophobizing agent in a fluidization vessel. A portion of the silica fine powder is bypassed to a waste gas line from the fluidization vessel and collected with a cyclone and bag filter, and the collected powder is fed to the fluidization vessel where it is hydrophobized. The amount of unreacted organohalosilane in the waste gases is reduced, alleviating the burden on waste gas treatment. The silica having the unreacted organohalosilane borne thereon is fed back to the fluidization vessel, increasing the reaction efficiency of organohalosilane.
    Type: Application
    Filed: August 30, 2001
    Publication date: February 28, 2002
    Inventors: Yasuaki Nozawa, Kiyoshi Shirasuna, Hidekazu Uehara, Keiji Shibata, Susumu Ueno
  • Publication number: 20010033818
    Abstract: Hydrophobic silica fine powder is prepared by pyrolyzing a silane compound to give silica fine powder, then treating the silica fine powder with a hydrophobizing agent in a fluidization vessel containing at most 3 vol % of oxygen. The process effectively confers the pyrogenic silica with hydrophobicity.
    Type: Application
    Filed: April 20, 2001
    Publication date: October 25, 2001
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasuaki Nozawa, Kiyoshi Shirasuna, Masanori Akiyama, Hidekazu Uehara, Susumu Ueno
  • Patent number: 5855860
    Abstract: Crude fumed silica resulting from pyrogenic hydrolysis is purified by continuously feeding particulate silica and steam or a mixture of steam and air in a steam/air volume ratio of at least 1/2 through an upright column from its bottom toward its top for forming a fluidized bed within the column at a gas linear velocity of 1 to 10 cm/sec. and a temperature of 250.degree. to 400.degree. C., whereby steam deprives the particulate silica of the halide borne thereon, and removing fine particulate silica from which the halide has been eliminated from the top of the column. Using a simple apparatus, pure fine particulate silica is collected at a low cost of energy consumption.
    Type: Grant
    Filed: April 29, 1997
    Date of Patent: January 5, 1999
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masanobu Nishimine, Yoshio Tomizawa, Hidekazu Uehara, Kiyoshi Shirasuna, Susumu Ueno