Abstract: An element includes a plurality of light-receiving elements to photoelectrically convert light received from an object, a convolution processing unit to perform convolution operation on signals that are output from the plurality of light-receiving elements, and a pooling processing unit to sample a signal that is output from the convolution processing unit, based on a predetermined condition. The convolution operation of the convolution processing unit and the sampling of the pooling processing unit are repeated.

Abstract: An element includes a plurality of light-receiving elements to photoelectrically convert light received from an object, a convolution processing unit to perform convolution operation on signals that are output from the plurality of light-receiving elements, and a pooling processing unit to sample a signal that is output from the convolution processing unit, based on a predetermined condition. The convolution operation of the convolution processing unit and the sampling of the pooling processing unit are repeated.

Abstract: An element includes a plurality of light-receiving elements to photoelectrically convert light received from an object, a convolution processing unit to perform convolution operation on signals that are output from the plurality of light-receiving elements, and a pooling processing unit to sample a signal that is output from the convolution processing unit, based on a predetermined condition. The convolution operation of the convolution processing unit and the sampling of the pooling processing unit are repeated.

Abstract: A feature extracting element including: a light-receiving substrate where a plurality of light-receiving elements for photoelectrically converting received light are two-dimensionally arrayed; and one or more other substrates that are laminated on the light-receiving substrate, wherein the other substrate has: a convolution processor which has a plurality of multiplying circuits that are correspondingly provided per the light-receiving element or per a block that is configured of a plurality of the light-receiving elements, and performs convolution operation on signals that are output from the plurality of light-receiving elements using the plurality of multiplying circuits; a pooling processing unit to sample a signal that is output from the convolution processor, based on a predetermined condition; and a connection wiring to pass the sampled signal to the plurality of multiplying circuits.

Abstract: A feature extracting element including: a light-receiving substrate where a plurality of light-receiving elements for photoelectrically converting received light are two-dimensionally arrayed; and one or more other substrates that are laminated on the light-receiving substrate, wherein the other substrate has: a convolution processor which has a plurality of multiplying circuits that are correspondingly provided per the light-receiving element or per a block that is configured of a plurality of the light-receiving elements, and performs convolution operation on signals that are output from the plurality of light-receiving elements using the plurality of multiplying circuits; a pooling processing unit to sample a signal that is output from the convolution processor, based on a predetermined condition; and a connection wiring to pass the sampled signal to the plurality of multiplying circuits.

Abstract: A photosensitive resin composition includes (A) a photopolymerization initiator including a compound represented by the following Chemical Formula 1, wherein in Chemical Formula 1, each substituent is the same as defined in the detailed description, (B) a binder resin, (C) a photopolymerizable monomer, (D) a colorant, and (E) a solvent, and a light blocking layer and liquid crystal display (LCD) using the same.

Abstract: A photosensitive resin composition includes (A) a photopolymerization initiator including a compound represented by the following Chemical Formula 1, (B) a binder resin, (C) a photopolymerizable monomer, (D) a colorant, and (E) a solvent, and a light blocking layer and liquid crystal display (LCD) using the same. In Chemical Formula 1, each substituent is the same as defined in the detailed description.

Abstract: A photosensitive resin composition for a color filter includes (A) a binder resin including a cardo-based resin represented by the following Chemical Formula 1, (B) a photopolymerization initiator represented by the following Chemical Formula 14, (C) a photopolymerizable monomer, (E) a colorant, and (F) a solvent and a color filter using the same.

Abstract: A photosensitive resin composition for a color filter includes (A) a binder resin including a cardo-based resin represented by the following Chemical Formula 1, (B) a photopolymerization initiator represented by the following Chemical Formula 14, (C) a photopolymerizable monomer, (E) a colorant, and (F) a solvent and a color filter using the same. In Chemical Formulae 1 and 14, each substituent is the same as defined in the detailed description.

Abstract: Disclosed is an exposure method which illuminates a first object with an exposure beam and exposes a second object with the exposure beam through the first object and a projection optical system, wherein at least a part of one of the first object and the projection optical system is irradiated with a light beam having a wavelength range different from that of the exposure beam through a space waveguide mechanism, to correct an imaging characteristic of the projection optical system.

Abstract: Process tools and methods are disclosed that involve interferometric and other measurements of movements and positions relative to a process position, such as movements and positions of a stage relative to a lithographic optical system. An exemplary apparatus includes a stage that places a workpiece relative to the tool, and that is movable in at least one direction relative to the tool. At least one first interferometer system is situated relative to the stage to determine stage position in a movement direction relative to the process position. A movement-measuring device determines displacement of the tool from the process position. Using data from the interferometer system and movement-measuring device a processor determines a position of the stage relative to the tool. The processor also corrects the determined position for displacement of the tool.

Abstract: Process tools and methods are disclosed that involve interferometric and other measurements of movements and positions relative to a process position, such as movements and positions of a stage relative to a lithographic optical system. An exemplary apparatus includes a stage that places a workpiece relative to the tool, and that is movable in at least one direction relative to the tool. At least one first interferometer system is situated relative to the stage to determine stage position in a movement direction relative to the process position. A movement-measuring device determines displacement of the tool from the process position. Using data from the interferometer system and movement-measuring device a processor determines a position of the stage relative to the tool. The processor also corrects the determined position for displacement of the tool.

Abstract: Disclosed is an exposure method which illuminates a first object with an exposure beam and exposes a second object with the exposure beam through the first object and a projection optical system, wherein at least a part of one of the first object and the projection optical system is irradiated with a light beam having a wavelength range different from that of the exposure beam through a space waveguide mechanism, to correct an imaging characteristic of the projection optical system.

Abstract: By the combination of adjusting optical properties of an optical system by an irradiation unit irradiating non-exposure light on an optical element, which is movable, and adjusting the optical properties of the optical system with an optical properties adjustment unit by moving the optical element, for example, the change in the optical properties of the optical system caused by the temperature distribution of the optical elements whose center is at a position eccentric from the optical axis is corrected. Further, under a dipole illumination condition, in order to make optical properties of an optical system caused by non-rotational symmetry temperature distribution of optical elements in the vicinity of pupils into optical properties that can be corrected more easily by an optical properties adjustment unit, an irradiation unit irradiates non-exposure light on an optical element, which makes the optical element have a rotational symmetry temperature distribution.

Abstract: Provided are a resist composition for separator formation which can be applied for forming separators in the form including a forward taper shape and a reverse taper shape and can be widely used for production of various organic EL displays, and a separator and an EL display device obtained from this resist composition. A composition containing an alkali-soluble resin, an acid generator, a cross-linking agent and a separator pattern shape controlling agent is used as the resist composition for separator formation of an EL display device and the like. The separator pattern shape controlling agent is preferably constituted of a forward taper controlling agent and a reverse taper controlling agent, and these controlling agents can be composed of an amine and an organic acid.

Abstract: Provided are a resist composition for separator formation which can be applied for forming separators in the form including a forward taper shape and a reverse taper shape and can be widely used for production of various organic EL displays, and a separator and an EL display device obtained from this resist composition. A composition containing an alkali-soluble resin, an acid generator, a cross-linking agent and a separator pattern shape controlling agent is used as the resist composition for separator formation of an EL display device and the like. The separator pattern shape controlling agent is preferably constituted of a forward taper controlling agent and a reverse taper controlling agent, and these controlling agents can be composed of an amine and an organic acid.

Abstract: Methods are disclosed for manufacturing masks (reticles) as used in charged-particle-beam (CPB) microlithography. The methods can include inspecting the masks for defects, and repairing the defects. First, a “parent” mask is prepared from circuit-design data. The resulting pattern elements on the parent mask are inspected and compared with the circuit-design data to determine whether the data have been converted accurately into corresponding pattern elements on the parent mask. This inspection can be performed using an optical microscope. Detected mismatches and defects are corrected as required. The parent mask is used as a microlithography mask in the preparation, by “reduction” optical microlithography, a “progeny” mask. The pattern defined by the progeny mask is imaged and the image is digitized for comparison with a digitized image of the parent mask. The digitized images are compared using a computer.

Abstract: There is disclosed a down-traffic-signal transmission system for a mobile communication system in which communication between the base stations and the mobile station is performed in accordance with the CDMA scheme.

Abstract: The present invention provides a photopolymerizable composition for a color filter containing an addition-polymerizable compound having at least one ethylenically unsaturated double bond, a photopolymerization initiator and the oxide of at least one metal selected from the group consisting of Cu, Fe, Mn, Cr, Co, Ni and Al and being substantially free from any halogen atom; and a process for producing a color filter. The photopolymerizable compositions for a color filter makes it possible to form a color filter having good heat resistance and high electrical insulation resistance and have high storage stability.

Abstract: The present invention provides a photopolymerizable composition for a color filter containing an addition-polymerizable compound having at least one ethylenically unsaturated double bond, a photopolymerization initiator and the oxide of at least one metal selected from the group consisting of Cu, Fe, Mn, Cr, Co, Ni and Al and being substantially free from any halogen atom; and a process for producing a color filter. The photopolymerizable compositions for a color filter makes it possible to form a color filter having good heat resistance and high electrical insulation resistance and have high storage stability.