Patents by Inventor Kiyoshi Yamanoi

Kiyoshi Yamanoi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6810181
    Abstract: The present invention relates to an electrode structure, which comprises a substrate provided with an electrode formed thereon, wherein the substrate comprises a layer of a fluorine-containing polyimide and a layer of a fluorine-free resin is interposed between the polyimide layer and the electrode and, in particular, to the foregoing electrode structure, wherein the electrode comprises a gold layer as the outermost or surface layer and an aluminum layer interposed between the substrate and the gold layer. The electrode structure of the present invention never causes any peeling off of the electrode due to insufficient adhesion of the electrode to the substrate, the structure has sufficiently high strength and therefore the boundary between the substrate and the electrode formed thereon is not destroyed by the energy of ultrasonics applied thereto.
    Type: Grant
    Filed: November 18, 2003
    Date of Patent: October 26, 2004
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Masatoshi Yamaguchi, Nobuo Miyadera, Kiyoshi Yamanoi, Hiroyuki Matsuura
  • Publication number: 20040096161
    Abstract: The present invention relates to an electrode structure, which comprises a substrate provided with an electrode formed thereon, wherein the substrate comprises a layer of a fluorine-containing polyimide and a layer of a fluorine-free resin is interposed between the polyimide layer and the electrode and, in particular, to the foregoing electrode structure, wherein the electrode comprises a gold layer as the outermost or surface layer and an aluminum layer interposed between the substrate and the gold layer. The electrode structure of the present invention never causes any peeling off of the electrode due to insufficient adhesion of the electrode to the substrate, the structure has sufficiently high strength and therefore the boundary between the substrate and the electrode formed thereon is not destroyed by the energy of ultrasonics applied thereto.
    Type: Application
    Filed: November 18, 2003
    Publication date: May 20, 2004
    Applicant: HITACHI CHEMICAL CO., LTD.
    Inventors: Masatoshi Yamaguchi, Nobuo Miyadera, Kiyoshi Yamanoi, Hiroyuki Matsuura
  • Patent number: 4963375
    Abstract: Method of controlling the baking for foods, wherein an amount of heat absorbed by a portion near the food to be baked in an oven is measured to control heating temperature and/or air flow rate in the oven, based on the measured amount of heat.
    Type: Grant
    Filed: April 28, 1989
    Date of Patent: October 16, 1990
    Assignee: Meiji Seika Kaisha Co., Ltd.
    Inventors: Akira Sato, Toshio Sato, Kiyoshi Yamanoi
  • Patent number: 4643793
    Abstract: A process for treating a surface of a metal such as copper with a liquid composition comprising (I) copper ions, a complexing agent, a reducing agent, a pH adjusting agent, water, and (II) a nitrogen-containing organic compound such as heterocyclic compound or containing --N.dbd. and --NH.sub.2 and/or --OH groups in its molecule can give multilayer printed wiring boards having excellent adhesive strength and line definition of inner layer copper conductors with long shelf life.
    Type: Grant
    Filed: July 1, 1985
    Date of Patent: February 17, 1987
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Akishi Nakaso, Youichi Kaneko, Toshiro Okamura, Kiyoshi Yamanoi
  • Patent number: 4557762
    Abstract: An electroless copper plating solution comprising cupric ions, a complexing agent, a reducing agent, a pH adjuster, a perfluoropolyether, a cyanide and/or .alpha.,.alpha.'-dipyridyl and/or 1,10-phenanthroline or a derivative thereof is capable of forming a deposited film with high elongation.
    Type: Grant
    Filed: July 30, 1984
    Date of Patent: December 10, 1985
    Assignee: Hitachi Chemical Company
    Inventors: Akishi Nakaso, Toshiro Okamura, Kiyoshi Yamanoi, Sumiko Nakajima
  • Patent number: 4548644
    Abstract: An electroless copper deposition solution comprising (a) cupric ions, a complexing agent for cupric ions, a reducing agent and a pH adjusting agent, (b) a polyoxyethylene ether and (c) at least one member selected from the group consisting of an inorganic cyanide and .alpha.,.alpha.'-dipyridyl can give a deposited film with high elongation.
    Type: Grant
    Filed: September 23, 1983
    Date of Patent: October 22, 1985
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Akishi Nakaso, Kiyoshi Yamanoi, Toshiro Okamura, Yoshiyuki Tsuru