Patents by Inventor Kiyoung KWARK

Kiyoung KWARK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method for treating substrate
    Patent number: 10460923
    Abstract: Disclosed are an apparatus and a method for liquid-treating a substrate. The method for liquid-treating a substrate includes a first treatment liquid supplying operation of supplying a first treatment liquid to a treatment location of the substrate, and a wetting operation of, after the first treatment liquid supplying operation, supplying a wetting liquid onto the substrate, wherein the wetting operation includes a simultaneous supply operation of supplying the wetting liquid to the first location while the first treatment liquid is supplied, and wherein the first location is a location deviating from the treatment location. Accordingly, the surface of the substrate may be prevented from being dried while the treatment liquid is converted to a wetting liquid.
    Type: Grant
    Filed: June 28, 2017
    Date of Patent: October 29, 2019
    Assignee: SEMES CO., LTD.
    Inventors: Young Ha Kim, Se Jeong Choi, Kang Suk Lee, Kiyoung Kwark, Jeoung Eun Park, Jeong Yeong Park
  • APPARATUS AND METHOD FOR TREATING SUBSTRATE
    Publication number: 20180005817
    Abstract: Disclosed are an apparatus and a method for liquid-treating a substrate. The method for liquid-treating a substrate includes a first treatment liquid supplying operation of supplying a first treatment liquid to a treatment location of the substrate, and a wetting operation of, after the first treatment liquid supplying operation, supplying a wetting liquid onto the substrate, wherein the wetting operation includes a simultaneous supply operation of supplying the wetting liquid to the first location while the first treatment liquid is supplied, and wherein the first location is a location deviating from the treatment location. Accordingly, the surface of the substrate may be prevented from being dried while the treatment liquid is converted to a wetting liquid.
    Type: Application
    Filed: June 28, 2017
    Publication date: January 4, 2018
    Inventors: Young Ha KIM, Se Jeong CHOI, Kang Suk LEE, Kiyoung KWARK, Jeoung Eun PARK, Jeong Yeong PARK