Patents by Inventor Kjeld Sijbrand Eduard Eikema
Kjeld Sijbrand Eduard Eikema has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11391677Abstract: A metrology apparatus (302) includes a higher harmonic generation (HHG) radiation source for generating (310) EUV radiation. Operation of the HHG source is monitored using a wavefront sensor (420) which comprises an aperture array (424, 702) and an image sensor (426). A grating (706) disperses the radiation passing through each aperture so that the image detector captures positions and intensities of higher diffraction orders for different spectral components and different locations across the beam. In this way, the wavefront sensor can be arranged to measure a wavefront tilt for multiple harmonics at each location in said array. In one embodiment, the apertures are divided into two subsets (A) and (B), the gratings (706) of each subset having a different direction of dispersion. The spectrally resolved wavefront information (430) is used in feedback control (432) to stabilize operation of the HGG source, and/or to improve accuracy of metrology results.Type: GrantFiled: January 23, 2020Date of Patent: July 19, 2022Assignee: ASML Netherlands B. V.Inventors: Stefan Michiel Witte, Gijsbert Simon Matthijs Jansen, Lars Christian Freisem, Kjeld Sijbrand Eduard Eikema, Simon Gijsbert Josephus Mathijssen
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Patent number: 10788765Abstract: As increasing numbers of layers, using increasing numbers of specific materials, are deposited on substrates, it becomes increasingly difficult to detect alignment marks accurately for, for example, applying a desired pattern onto a substrate using a lithographic apparatus, in part due to one or more of the materials used in one or more of the layers being wholly or partially opaque to the radiation used to detect alignment marks. In a first step, the substrate is illuminated with excitation radiation. In a second step, at least one effect associated with a reflected material effect scattered by a buried structure is measured. The effect may, for example, include a physical displacement of the surface of the substrate. In a third step, at least one characteristic of the structure based on the measured effect is derived.Type: GrantFiled: January 10, 2018Date of Patent: September 29, 2020Assignee: ASML Netherlands B.V.Inventors: Stefan Michiel Witte, Alessandro Antoncecchi, Stephen Edward, Hao Zhang, Paulus Clemens Maria Planken, Kjeld Sijbrand Eduard Eikema, Sebastianus Adrianus Goorden, Simon Reinald Huisman, Irwan Dani Setija
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Publication number: 20200232931Abstract: A metrology apparatus (302) includes a higher harmonic generation (HHG) radiation source for generating (310) EUV radiation. Operation of the HHG source is monitored using a wavefront sensor (420) which comprises an aperture array (424, 702) and an image sensor (426). A grating (706) disperses the radiation passing through each aperture so that the image detector captures positions and intensities of higher diffraction orders for different spectral components and different locations across the beam. In this way, the wavefront sensor can be arranged to measure a wavefront tilt for multiple harmonics at each location in said array. In one embodiment, the apertures are divided into two subsets (A) and (B), the gratings (706) of each subset having a different direction of dispersion. The spectrally resolved wavefront information (430) is used in feedback control (432) to stabilize operation of the HGG source, and/or to improve accuracy of metrology results.Type: ApplicationFiled: January 23, 2020Publication date: July 23, 2020Applicants: ASML Netherlands B.V., Stiching Nederlandse Wetenschappelijk Onderzoek Instituten, Stichting VU, Universiteit van AmsterdamInventors: Stefan Michiel WITTE, Gijsbert Simon Matthijs JANSEN, Lars Christian FREISEM, Kjeld Sijbrand Eduard EIKEMA, Simon Gijsbert Josephus MATHIJSSEN
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Patent number: 10648919Abstract: A metrology apparatus (302) includes a higher harmonic generation (HHG) radiation source for generating (310) EUV radiation. Operation of the HHG source is monitored using a wavefront sensor (420) which comprises an aperture array (424, 702) and an image sensor (426). A grating (706) disperses the radiation passing through each aperture so that the image detector captures positions and intensities of higher diffraction orders for different spectral components and different locations across the beam. In this way, the wavefront sensor can be arranged to measure a wavefront tilt for multiple harmonics at each location in said array. In one embodiment, the apertures are divided into two subsets (A) and (B), the gratings (706) of each subset having a different direction of dispersion. The spectrally resolved wavefront information (430) is used in feedback control (432) to stabilize operation of the HGG source, and/or to improve accuracy of metrology results.Type: GrantFiled: May 15, 2018Date of Patent: May 12, 2020Assignee: ASML Netherlands B.V.Inventors: Stefan Michiel Witte, Gijsbert Simon Matthijs Jansen, Lars Christian Freisem, Kjeld Sijbrand Eduard Eikema, Simon Gijsbert Josephus Mathijssen
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Publication number: 20190354026Abstract: As increasing numbers of layers, using increasing numbers of specific materials, are deposited on substrates, it becomes increasingly difficult to detect alignment marks accurately for, for example, applying a desired pattern onto a substrate using a lithographic apparatus, in part due to one or more of the materials used in one or more of the layers being wholly or partially opaque to the radiation used to detect alignment marks. In a first step, the substrate is illuminated with excitation radiation. In a second step, at least one effect associated with a reflected material effect scattered by a buried structure is measured. The effect may, for example, include a physical displacement of the surface of the substrate. In a third step, at least one characteristic of the structure based on the measured effect is derived.Type: ApplicationFiled: January 10, 2018Publication date: November 21, 2019Applicant: ASML Netherlands B.V.Inventors: Stefan Michiel WITTE, Alessandro ANTONCECCHI, Stephen EDWARD, Hao ZHANG, Paulus Clemens Maria PLANKEN, Kjeld Sijbrand Eduard EIKEMA, Sebastianus Adrianus GOORDEN, Simon Reinald HUISMAN, Irwan Dani SETIJA
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Patent number: 10459347Abstract: In an inspection apparatus, a target on the surface is illuminated with illuminating radiation that comprises first and second illuminating components. The illuminating components form one or more periodic illuminating patterns on the surface. A plurality of scattered radiation patterns formed by the illuminating radiation after scattering by the target is captured at a detector for a number of values of a controllable characteristic of at least one of the illuminating components. The captured radiation is then used to reconstruct data describing the target.Type: GrantFiled: March 8, 2017Date of Patent: October 29, 2019Assignee: ASML Netherlands B.V.Inventors: Dirk Ewoud Boonzajer Flaes, Stefan Michiel Witte, Kjeld Sijbrand Eduard Eikema
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Patent number: 10386735Abstract: A lithographic apparatus comprises comprise a substrate table constructed to hold a substrate; and a sensor configured to sense a position of an alignment mark provided onto the substrate held by the substrate table. The sensor comprises a source of radiation configured to illuminate the alignment mark with a radiation beam, a detector configured to detect the radiation beam, having interacted with the alignment mark, as an out of focus optical pattern, and a data processing system. The data processing system is configured to receive image data representing the out of focus optical pattern, and process the image data for determining alignment information, comprising applying a lensless imaging algorithm to the out of focus optical pattern.Type: GrantFiled: August 22, 2016Date of Patent: August 20, 2019Assignee: ASML Netherlands B.V.Inventors: Simon Gijsbert Josephus Mathijssen, Arie Jeffrey Den Boef, Nitesh Pandey, Patricius Aloysius Jacobus Tinnemans, Stefan Michiel Witte, Kjeld Sijbrand Eduard Eikema
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Publication number: 20180348145Abstract: A metrology apparatus (302) includes a higher harmonic generation (HHG) radiation source for generating (310) EUV radiation. Operation of the HHG source is monitored using a wavefront sensor (420) which comprises an aperture array (424, 702) and an image sensor (426). A grating (706) disperses the radiation passing through each aperture so that the image detector captures positions and intensities of higher diffraction orders for different spectral components and different locations across the beam. In this way, the wavefront sensor can be arranged to measure a wavefront tilt for multiple harmonics at each location in said array. In one embodiment, the apertures are divided into two subsets (A) and (B), the gratings (706) of each subset having a different direction of dispersion. The spectrally resolved wavefront information (430) is used in feedback control (432) to stabilize operation of the HGG source, and/or to improve accuracy of metrology results.Type: ApplicationFiled: May 15, 2018Publication date: December 6, 2018Applicants: ASML Netherlands B.V., Stichting Nederlandse Wetenschappelijk Onderzoek Instituten, Stichting VU, Universiteit van AmsterdamInventors: Stefan Michiel WITTE, Gijsbert Simon Matthijs Jansen, Lars Christian Freisem, Kjeld Sijbrand Eduard Eikema, Simon Gijsbert Josephus Mathijssen
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Patent number: 10088762Abstract: A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. A lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs). The lithographic apparatus has an inspection apparatus with an EUV radiation source. The radiation source emits a radiation beam that includes coherent radiation of a specific wavelength. The beam propagates to illumination optical system, which focuses the radiation beam into a focused beam of illuminating radiation. The illumination optical system illuminates a three-dimensional product structure on the substrate, which scatters the illuminating radiation. On the surface of a detector, the radiation scattered by the product structure forms a diffraction pattern that is used to reconstruct data describing the three-dimensional product structure.Type: GrantFiled: December 16, 2016Date of Patent: October 2, 2018Assignee: ASML Netherlands B.V.Inventors: Stefan Michiel Witte, Kjeld Sijbrand Eduard Eikema
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Publication number: 20180246423Abstract: A lithographic apparatus comprises comprise a substrate table constructed to hold a substrate; and a sensor configured to sense a position of an alignment mark provided onto the substrate held by the substrate table. The sensor comprises a source of radiation configured to illuminate the alignment mark with a radiation beam, a detector configured to detect the radiation beam, having interacted with the alignment mark, as an out of focus optical pattern, and a data processing system. The data processing system is configured to receive image data representing the out of focus optical pattern, and process the image data for determining alignment information, comprising applying a lensless imaging algorithm to the out of focus optical pattern.Type: ApplicationFiled: August 22, 2016Publication date: August 30, 2018Applicant: ASML Netherlands B.V.Inventors: Simon Gijsbert Josephus MATHIJSSEN, Arie Jeffrey DEN BOEF, Nitesh PANDEY, Patricius Aloysius Jacobus TINNEMANS, Stefan Michiel WITTE, Kjeld Sijbrand Eduard EIKEMA
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Publication number: 20170269482Abstract: In an inspection apparatus, a target on the surface is illuminated with illuminating radiation that comprises first and second illuminating components. The illuminating components form one or more periodic illuminating patterns on the surface. A plurality of scattered radiation patterns formed by the illuminating radiation after scattering by the target is captured at a detector for a number of values of a controllable characteristic of at least one of the illuminating components. The captured radiation is then used to reconstruct data describing the target.Type: ApplicationFiled: March 8, 2017Publication date: September 21, 2017Applicants: Stichting VU, Universiteit van Amsterdam, Stichting voor Fundamenteel Onderzoek der Materie, ASML Netherlands B.V.Inventors: Dirk Ewoud Boonzajer Flaes, Stefan Michiel Witte, Kjeld Sijbrand Eduard Eikema
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Publication number: 20170176879Abstract: A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. A lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs). The lithographic apparatus has an inspection apparatus with an EUV radiation source. The radiation source emits a radiation beam that includes coherent radiation of a specific wavelength. The beam propagates to illumination optical system, which focuses the radiation beam into a focused beam of illuminating radiation. The illumination optical system illuminates a three-dimensional product structure on the substrate, which scatters the illuminating radiation. On the surface of a detector, the radiation scattered by the product structure forms a diffraction pattern that is used to reconstruct data describing the three-dimensional product structure.Type: ApplicationFiled: December 16, 2016Publication date: June 22, 2017Applicants: Stichting VU, Universiteit van Amsterdam, Stichting voor Fundamenteel Onderzoek der Materie, ASML Netherlands B.V.Inventors: Stefan Michiel WITTE, Kjeld Sijbrand Eduard EIKEMA
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Publication number: 20150234170Abstract: A microscopic imaging apparatus to provide an image of a sample. The apparatus includes an illumination system to provide an illumination beam with radiation; and a sensor constructed and arranged to receive: a first image of a first diffraction pattern created by diffraction of the illumination beam on the sample; and a second image of a second diffraction pattern created by diffraction of the illumination beam on the sample.Type: ApplicationFiled: August 27, 2013Publication date: August 20, 2015Inventors: Stefan Michiel Witte, Kjeld Sijbrand Eduard Eikema