Patents by Inventor Klaus Drews

Klaus Drews has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Device for coating a substrate by means of plasma-CVD or cathode sputtering
    Patent number: 4715319
    Abstract: A device for covering a substrate by means of both plasma chemical vapor deposition and by high-frequency cathode sputtering which, as a result of easily exchangeable individual devices to introduce gaseous substances into the reaction space as well as easily exchangeable individual devices for influencing the flow of the process gases within the reaction space, results in a very good uniformity of the layer thickness of the produced layers even when the operation has to be carried out at higher gas pressures and hence higher flow rates.
    Type: Grant
    Filed: February 27, 1987
    Date of Patent: December 29, 1987
    Assignee: U.S. Philips Corporation
    Inventors: Udo Bringmann, Klaus Drews, Detlef Schon
  • Device for coating a substrate by means of plasma-CVD or cathode sputtering
    Patent number: 4673588
    Abstract: A device for covering a substrate by means of both plasma chemical vapor deposition and by high-frequency cathode sputtering which, as a result of easily exchangeable individual devices to introduce gaseous substances into the reaction space as well as easily exchangeable individual devices for influencing the flow of the process gases within the reaction space, results in a very good uniformity of the layer thickness of the produced layers even when the operation has to be carried out at higher gas pressures and hence higher flow rates.
    Type: Grant
    Filed: January 25, 1985
    Date of Patent: June 16, 1987
    Assignee: U.S. Philips Corporation
    Inventors: Udo Bringmann, Klaus Drews, Detlef G. Schon
  • Substrate holder for etching thin films
    Patent number: 3993909
    Abstract: Substrate holder for etching thin films by means of an ion beam in which a driving device moves the surface of a substrate placed on a turntable with respect to the ion beam, which holder includes a friction disk which rotates in rolling contact with a surface of a driving disk carrying the turntable and is spaced from the axis of the driving disk by a distance equal to that at which the point of impact of the ion beam on the substrate is located.
    Type: Grant
    Filed: December 24, 1975
    Date of Patent: November 23, 1976
    Assignee: U.S. Philips Corporation
    Inventors: Klaus Drews, Jens-Peter Krumme