Abstract: A radiation emitting device may have a plurality of emitters and a plurality of optical elements. The emitters may be arranged along a first emitter direction at a first average emitter spacing AE1 and along a second emitter direction extending obliquely or perpendicularly to the first emitter direction at a second average emitter spacing AE2. The optical elements may be arranged along a first optics direction at a first average optics spacing AO1 and along a second optics direction extending obliquely or perpendicularly to the first optics direction at a second average optics spacing AO2.

Abstract: An optical display device includes a plurality of emitters configured to emit electromagnetic radiation in a main emission direction and at least one optical modulation unit which has an adjustable focal length. The emitters are arranged in a main plane and are separately controllable from one another. The optical modulation unit is arranged downstream of the emitters in the main emission direction. Images of the emitters are generated by means of the optical modulation unit, the images of the emitters each having a distance from the main plane which can be predetermined by means of the adjustable focal length. Methods of operating an optical display device are also disclosed.

Abstract: In one embodiment, the optoelectronic semiconductor device comprises a carrier having electrical connection surfaces on a carrier upper side. At least four semiconductor chips are configured to emit light of different colors from each other. The semiconductor chips are mounted close to each other on the connection surfaces so that a distance between adjacent semiconductor chips is at most 100 ?m in a top view on the carrier upper side.

Abstract: An optical display device includes a plurality of emitters configured to emit electromagnetic radiation in a main emission direction and at least one optical modulation unit which has an adjustable focal length. The emitters are arranged in a main plane and are separately controllable from one another. The optical modulation unit is arranged downstream of the emitters in the main emission direction. Images of the emitters are generated by means of the optical modulation unit, the images of the emitters each having a distance from the main plane which can be predetermined by means of the adjustable focal length. Methods of operating an optical display device are also disclosed.

Abstract: In one embodiment, the optoelectronic semiconductor device comprises a carrier having electrical connection surfaces on a carrier upper side. At least four semiconductor chips are configured to emit light of different colors from each other. The semiconductor chips are mounted close to each other on the connection surfaces so that a distance between adjacent semiconductor chips is at most 100 ?m in a top view on the carrier upper side.

Abstract: A rotatable compensator configured to transmit non-collimated light over a broad range of wavelengths, including ultraviolet, with a high degree of retardation uniformity across the aperture is presented. In one embodiment, a rotatable compensator includes a stack of four individual plates in optical contact. The two thin plates in the middle of the stack are made from a birefringent material and are arranged to form a compound, zeroth order bi-plate. The remaining two plates are relatively thick and are made from an optically isotropic material. These plates are disposed on either end of the compound, zeroth order bi-plate. The low order plates minimize the sensitivity of retardation across the aperture to non-collimated light. Materials are selected to ensure transmission of ultraviolet light. The optically isotropic end plates minimize coherence effects induced at the optical interfaces of the thin plates.

Abstract: A rotatable compensator configured to transmit non-collimated light over a broad range of wavelengths, including ultraviolet, with a high degree of retardation uniformity across the aperture is presented. In one embodiment, a rotatable compensator includes a stack of four individual plates in optical contact. The two thin plates in the middle of the stack are made from a birefringent material and are arranged to form a compound, zeroth order bi-plate. The remaining two plates are relatively thick and are made from an optically isotropic material. These plates are disposed on either end of the compound, zeroth order bi-plate. The low order plates minimize the sensitivity of retardation across the aperture to non-collimated light. Materials are selected to ensure transmission of ultraviolet light. The optically isotropic end plates minimize coherence effects induced at the optical interfaces of the thin plates.

Abstract: A rotatable compensator configured to transmit non-collimated light over a broad range of wavelengths, including ultraviolet, with a high degree of retardation uniformity across the aperture is presented. In one embodiment, a rotatable compensator includes a stack of four individual plates in optical contact. The two thin plates in the middle of the stack are made from a birefringent material and are arranged to form a compound, zeroth order bi-plate. The remaining two plates are relatively thick and are made from an optically isotropic material. These plates are disposed on either end of the compound, zeroth order bi-plate. The low order plates minimize the sensitivity of retardation across the aperture to non-collimated light. Materials are selected to ensure transmission of ultraviolet light. The optically isotropic end plates minimize coherence effects induced at the optical interfaces of the thin plates.

Abstract: Methods and systems are described herein for producing high radiance illumination light suitable for semiconductor metrology. A cold gas is repeatedly ignited by a pulsed laser to periodically generate accessible, high brightness illumination light generated during each break-down event. The pulse duration and repetition period are set to ignite, but not sustain fully formed plasma. The central plasma core emits high color temperature light before a cooler plasma region forms around the central core. Thus, after ignition, the plasma is extinguished before the arrival of the next laser pulse. The repeated plasma ignition/extinction cycle generates illumination light at high color temperature that is accessible for illumination purposes in a metrology application. In one embodiment, a bulb filled with Xenon gas at 10 atmospheres is repeatedly ignited with a pulsed laser having pulse duration of 10 nanoseconds to generate illumination light with a color temperature of approximately 60,000 Kelvin.

Abstract: The present invention may include an illumination source configured to illuminate a surface of a sample, a detector configured to detect at least a portion of light reflected from the surface of the sample, a selectably configurable optical system comprising: a rotatable polarizing element disposed in the illumination arm of the optical system, an analyzing element disposed in the collection arm of the optical system, and a rotatable-translatable compensator element disposed in the collection arm of the optical system, and a control system communicatively configured to selectably configure the optical system in the a rotating compensator (RCSE) mode, a rotating polarizer (RPSE) mode, or a rotating polarizer and compensator (RPRC) mode.

Abstract: An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.

Abstract: Methods and systems for enhancing the throughput of a metrology system generating measurement signals based on at least two different optical properties of the illumination light are presented. A detector having a two dimensional photosensitive area is subdivided into multiple photosensitive stripes by multiple, independent linear arrays of shift register elements located within the photosensitive area. Charge transfer from pixels within each stripe is directed to a distinct linear array of shift register elements. Each photosensitive stripe is able to resolve an optical property dispersed across the length of each stripe with relatively high resolution. In addition, the detector is able to resolve another optical property dispersed across several photosensitive stripes in a direction orthogonal to each linear array of shift registers at a relatively low resolution.

Abstract: An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.

Abstract: The present invention may include loading a diagnostic sample onto a sample stage, focusing light from an illumination source disposed on a multi-axis stage onto the diagnostic sample, collecting a portion of light reflected from a surface of the diagnostic sample utilizing a detector, wherein the illumination source and the detector are optically direct-coupled via an optical system, acquiring a set of diagnostic parameters indicative of illumination source position drift from the diagnostic sample, determining a magnitude of the illumination source position drift by comparing the acquired set of diagnostic parameters to an initial set of parameters obtained from the diagnostic sample at a previously measured alignment condition, determining a direction of the illumination source position drift; and providing illumination source position adjustment parameters configured to correct the determined magnitude and direction of the illumination source position drift to the multi-axis actuation control system of th

Abstract: An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.

Abstract: A rotatable compensator configured to transmit non-collimated light over a broad range of wavelengths, including ultraviolet, with a high degree of retardation uniformity across the aperture is presented. In one embodiment, a rotatable compensator includes a stack of four individual plates in optical contact. The two thin plates in the middle of the stack are made from a birefringent material and are arranged to form a compound, zeroth order bi-plate. The remaining two plates are relatively thick and are made from an optically isotropic material. These plates are disposed on either end of the compound, zeroth order bi-plate. The low order plates minimize the sensitivity of retardation across the aperture to non-collimated light. Materials are selected to ensure transmission of ultraviolet light. The optically isotropic end plates minimize coherence effects induced at the optical interfaces of the thin plates.

Abstract: An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.

Abstract: Systems and methods for determining information for a wafer are provided. One system includes a first grating that diffracts light from a wafer having wavelengths in a first portion of a broadband range and does not diffract the light from the wafer having wavelengths in a second portion of the broadband range. The system also includes a second grating positioned in the path of the light that is not diffracted by the first grating. The second grating diffracts the light from the wafer having the wavelengths in the second portion of the broadband range. The system further includes a first detector configured to generate first output responsive to the light diffracted by the first grating and a second detector configured to generate second output responsive to the light diffracted by the second grating.

Abstract: Methods and systems for enhancing the throughput of a metrology system generating measurement signals based on at least two different optical properties of the illumination light are presented. A detector having a two dimensional photosensitive area is subdivided into multiple photosensitive stripes by multiple, independent linear arrays of shift register elements located within the photosensitive area. Charge transfer from pixels within each stripe is directed to a distinct linear array of shift register elements. Each photosensitive stripe is able to resolve an optical property dispersed across the length of each stripe with relatively high resolution. In addition, the detector is able to resolve another optical property dispersed across several photosensitive stripes in a direction orthogonal to each linear array of shift registers at a relatively low resolution.

Abstract: Methods and systems for matching critical dimension measurement applications at high precision across multiple optical metrology systems are presented. In one aspect, machine parameter values of a metrology system are calibrated based on critical dimension measurement data. In one further aspect, calibration of the machine parameter values is based on critical dimension measurement data collected by a target measurement system from a specimen with assigned critical dimension parameter values obtained from a reference measurement source. In another further aspect, the calibration of the machine parameter values of a target measurement system is based on measurement data without knowledge of critical dimension parameter values. In some examples, the measurement data includes critical dimension measurement data and thin film measurement data.