Abstract: Component having corrosion protection and including a base body made of one of a steel material and a light metal material. A corrosion-inhibiting surface layer that is a dense, fine-grained, largely pore-free structure formed by plasma-based vapor deposition. The surface layer having an average thickness of between 1 ?m and 50 ?m and being at least one layer of at least one of aluminum, an aluminum alloy, and an aluminum compound. This Abstract is not intended to define the invention disclosed in the specification, nor intended to limit the scope of the invention in any way.

Abstract: The present invention describes a coated cutting tool for metal machining. The coating is formed by one or more layers of refractory compounds of which at least one layer of fine-grained, crystalline &ggr;-phase alumina, Al2O3, with a grainsize less than 0.1 &mgr;m. The Al2O3 layer is deposited with a bipolar pulsed DMS technique (Dual Magnetron Sputtering) at substrate temperatures in the range 450° C. to 700° C. preferably 550° C. to 650° C., depending on the particular material of the tool body to be coated. Identification of the &ggr;-phase alumina is made by X-ray diffraction. Reflexes from the (400) and (440) planes occurring at the 2&thgr;0- angles 45.8 and 66.8 degrees when using CuK&agr; radiation identify the &ggr;-phase Al2O3. The alumina layer is also very strongly textured in the [440]-direction. The Al2O3 layer is virtually free of cracks and halogen impurities. Furthermore, the Al2O3 layer gives the cutting edge of the tool an extremely smooth surface finish.

Abstract: Process and device for coating substrates utilizing bipolar pulsed magnetron sputtering in the frequency range between 10 and 100 kHz, wherein the device includes at least three magnetron sources. Each of the at least three magnetron sources includes a target. At least two of the targets are connected to a potential-free bipolar power supply device. The at least three targets are arranged relative to the substrates in such a way that the substrates are located at least partially inside a discharge current during a coating of the substrates. A switching device is adapted to connect the targets to the bipolar power supply device. A technological predetermined program is used for controlling the switching device. The switching device connects at least two of the targets at a time to the bipolar power supply device according to the technologically predetermined program.

Abstract: Production of a thin-film system containing at least one ultra-thin film, preferentially in the film thickness range from 1 to 10 nm, which is deposited by plasma-aided chemical or physical vapor-phase deposition using magnetron discharges. The method is characterized in that in the course of deposition of the ultra-thin film the power output is introduced into the plasma in the form of a controlled number of power pulses and that the average power output during the pulse-on time is set higher by a factor of at least 3 than the averaged power output over the entire coating time during deposition of the ultra-thin film.

Abstract: An organic substrate having optically-active layers deposited by magnetron sputtering and a preparation process for it are provided. Gas pressure used for carrying out better adhesion by sputtering is high, comprised between 0.8 and 5.0 Pa. Sputtering is particularly suitable for targets of Si, Ti, Zr and organic substrates with or without anti-abrasive coating. Improved adhesion of thin films is obtained.

Abstract: The present invention describes a coating cutting tool for metal machining and a process for producing such tools. The coating is composed of one or more layers of refractory compounds of which at least one layer consists of nanocrystalline aluminum spinel of the type (Me)xAl2O3+x where Me is a second metal and 0<x≦1, deposited by Physical Vapor Deposition.

Abstract: Process and control arrangement for introducing pulsing energy introduction into magnetron discharges. The process includes feeding a charge to the electrodes of a magnetron arrangement via a ignition source at a time t0, and, after the feeding of the electric charge, determining an ignition of the magnetron discharge. The process also includes introducing a current, having a predetermined value, from a boost source at a time t1, and, at a time t2, separating the ignition source from the electrodes of the magnetron arrangement. The introduction of the current by the boost source continues for a certain duration tEIN. The process also includes interrupting the introduction of the electric energy for a predetermined time tAUS.

Abstract: The present invention describes a coated cutting tool for metal maching. The coating is formed by one or more layers of refractory compounds of which at least one layer of fine-grained, crystalline &ggr;-phase alumina, Al2O3, with a grainsize less than 0.1 &mgr;m. The Al2O3 layer is deposited with a bipolar pulsed DMS technique (Dual Magnetron Sputtering) at substrate temperatures in the range 450° C. to 700 C.° preferably 550 C.° to 650 C.°, depending on the particular material of the tool body to be coated. Identification of the &ggr;-phase alumina is made by X-ray diffraction. Reflexes from the (400) and (440) planes occurring at the 2&thgr;-angles 45.8 and 66.8 degrees when using CuK&agr; radiation identify the &ggr;-phase Al2O3. The alumina layer is also very strongly textured in the [440]-direction. The Al2O3 layer is virtually free of cracks and halogen impurities. Furthermore, the Al2O3 layer gives the cutting edge of the tool an extremely smooth surface finish.

Abstract: The present invention relates to a process for producing a coated cutting tool consisting of a coating and a substrate, wherein at least one refractory layer consisting of fine-grained, crystalline &ggr;-Al2O3 is deposited by reactive magnetron sputtering onto the moving substrate in a vacuum by pulsed magnetron sputtering in a mixture of a rare gas and a reactive gas at a pulse frequency set for 10 to 100 kHz. The deposition occurs with a rate of at least 1 nm/s with reference to a stationarily arranged substrate at a magnetron target power density in time average set for at least 10 W/cm2. The substrate temperature is in the range 400 to 700° C. and the flux of impinging particles onto each individual substrate is cyclically interrupted.

Abstract: Existing devices for vacuum coating substrates having different shapes, either in continuous or hatch facilities, are equipped in such a way that several coatings are applied after a coating process. The slide bearings are to be coated with several coats and the coating materials used and the conditions related thereto require the use of several coating techniques. This relates inter alia to conveyance parameters. Existing facilities fail to meet these requirements. According to the invention, such a device comprises several aligned processing chambers. Slide bearings which are held together by positive and non-positive fit in tempered carrier bodies are displaced through said chambers comprising pretreatment, atomization and evaporation chambers using a conveyance system adapted to this process. A tempering device for the carrier bodies is connected upstream from the coating track. Corresponding inlet and outlet channels enable air-to-air conveyance.

Abstract: The invention discloses a method for coating foil comprised of nickel or a nickel alloy by sputtering a layer comprised of a metal compound on the foil in a vacuum. The foil is treated in an argon plasma with a pressure of 1031 3 to 10−2 millibar, for a variable time with a variable rate, and with energy of the plasma ions. A chromium oxide layer or a layer containing chromium oxide is successively sputtered by means of a reactive magnetron atomizing of at least one target comprised of chromium or an alloy containing chromium. The layer is sputtered with at least one atomization source in an argon-oxygen mixture with a pressure of 10−3 to 10−2 millibar. The operating point is constantly maintained in given boundaries and the foil is bonded in a defined thermal contact with a thermal buffer when the foil is being coated. The foil is coated until a given interference color pertaining to an interference of a first or second order is reached on the foil.

Abstract: A method of coating of thin film coated magnetic disks and thin film magnetic disks made thereby is described. In accordance with the invention, a barrier layer is deposited on the substrate before the underlayer film(s) to increase the corrosion resistance of metallic substrate magnetic disks and, in the case of nonmetallic substrates, to reduce the diffusion of water to the substrate and of freely moveable ions from the substrate. Preferably the barrier layer is deposited by medium frequency pulsed sputtering at a frequency of 10 to 200 kHz and a pulse length to pulse pause ratio from 5:1 to 1:10. Aluminum or chromium are the preferred materials for the barrier layer. Additional improvements may be achieved where the sputtering process gas contains a proportion of oxygen and/or nitrogen.

Abstract: The present invention describes a coated substrate material. The coating is formed by one or more layers of refractory compounds of which at least one layer of fine-grained, crystalline &ggr;-phase alumina, Al2O3, with a grainsize less than 0.1 &mgr;m. The Al2O3layer is deposited with a bipolar pulsed DMS technique (Dual Magnetron Sputtering) at substrate temperatures in the range 450° C. to 700° C., preferably 550° C. to 650° C., depending on the particular substrate material. Identification of the &ggr;-phase alumina is made by X-ray diffraction. Reflexes from the (400) and (440) planes occurring at the 2&thgr;-angles 45.8 and 66.8 degrees when using CuK&agr; radiation identify the &ggr;-phase Al2O3. The alumina layer is also very strongly textured in the [440]-direction. The Al2O3 layer is virtually free of cracks and halogen impurities. Furthermore, the Al2O3 layer gives the cutting edge of the tool an extremely smooth surface finish.

Abstract: Production of a thin-film system containing at least one ultra-thin film, preferentially in the film thickness range from 1 to 10 nm, which is separated by plasma-aided chemical or physical vapor-phase deposition using magnetron discharges. The method is characterized in that in the course of deposition of the ultra-thin film the power output is introduced into the plasma in the form of a controlled number of power pulses and that the average power output during the pulse-on time is set higher by a factor of at least 3 than the averaged power output over the entire coating time during deposition of the ultra-thin film.

Abstract: The present invention describes a coating cutting tool for metal machining and a process for producing such tools. The coating is composed of one or more layers of refractory compounds of which at least one layer consists of nanocrystalline aluminum spinel of the type (Me)xAl2O3+x where Me is a second metal and 0<x≦1, deposited by Physical Vapor Deposition.

Abstract: Process and control arrangement for introducing pulsing energy introduction into magnetron discharges. The process includes feeding a charge to the electrodes of a magnetron arrangement via a ignition source at a time t0, and, after the feeding of the electric charge, determining an ignition of the magnetron discharge. The process also includes introducing a current, having a predetermined value, from a boost source at a time t1, and, at a time t2, separating the ignition source from the electrodes of the magnetron arrangement. The introduction of the current by the boost source continues for a certain duration tEIN. The process also includes interrupting the introduction of the electric energy for a predetermined time tAUSj.

Abstract: Magnetron discharges are pulse-operated to avoid the so-called “arcing”. In the case of magnetron discharges from alternating current-fed magnetrons, the process is limited to the minor power of the energy supply because of the load-carrying capacity of the required electric components. When the magnetron discharges are fed by direct current, their effectiveness deteriorates because of the deposition of layers on the anode surfaces. The new process should enable a high supply power and prevent arcing. In magnetron discharges with at least two magnetron electrodes, the energy is supplied in such a way that at least one magnetron electrode is a cathode or anode and a number n1 of direct current pulses of said polarity is supplied. The poles of at least one magnetron electrode are then reversed and a number n2 of direct currents of this polarity are supplied. The process is carried on in this manner, the frequency of the direct current pulses being higher than that of the polarity reversals.

Abstract: The present invention describes a coated cutting tool for metal machining. The coating is composed of one or more layers of refractory compounds of which at least one layer consists of fine-grained, crystalline &ggr;-phase alumina, Al2O3, with a grainsize less than 0.1 &mgr;m. The Al2O3 layer is deposited with a bipolar pulsed DMS technique (Dual Magnetron Sputtering) at substrate temperatures in the range 450° C. to 700° C., preferably 550° C. to 650° C., depending on the particular material of the tool body to be coated. Identification of the &ggr;-phase alumina is made by X-ray diffraction. Reflexes from the (400) and (440) planes occurring at at the 2&thgr;-angles 45.8 and 66.8, degrees when using CuK&agr; radiation identify the &ggr;-phase Al2O3. The alumina layer is also very strongly textured in the [440]-direction.

Abstract: A half bearing has a backing member and at least one metallic overlay, which is applied by electron beam vapour deposition and which comprises at least one finely dispersed component in a matrix material, the atomic weight of which component is greater than that of the matrix material, wherein the concentration of the finely dispersed component (7) decreases continuously from the apex area (8) of the half bearing (1) towards the area (9) of the partial surfaces. The method is characterised in that, during the coating process, an inert gas pressure of 0.1 to 5 Pa is set in the apex area of the bearing shell.

Abstract: A device for the sputter application of hard material coatings, including an exhaustible vacuum chamber, at least one sputtering source for depositing a coating material, a plurality of fixtures for supporting a plurality parts to be coated, the fixtures being mounted on planet gears which are movable via a planetary drive, a centrally disposed heating device, a reactive gas inlet, and a plurality of movable screens for covering the at least one sputtering source, the screens being arranged to surround the fixtures, wherein the heating device, the screens, and the planetary drive comprise an assembly which is removable from the vacuum chamber.