Patents by Inventor Klaus-Juergen Przybilla
Klaus-Juergen Przybilla has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 5843319Abstract: A process for producing a solution of a basic or non-basic sulfonium compound (A) of formulae II-V: ##STR1## wherein R.sup.5, R.sup.6 and R.sup.7 each independently represent a C.sub.1 -C.sub.18 alkyl, aryl or heteroaryl group or an aryl group mono-, di- or tri-substituted with an alkyl, an alkylaryl, an aryl, a halogen, an alkoxy, a phenoxy, a thiophenol, a phenylsulfonyl or a phenylsulphenyl;Y represents (CH.sub.2).sub.n (wherein n is 0 or 1), O or S;R.sup.8 and R.sup.9 represent a C.sub.1 -C.sub.4 alkyl, alkoxy or a halogen;R.sup.10 and R.sup.11 represent a C.sub.1 -C.sub.4 alkyl, alkoxy or a halogen;n is 5 or 6; andX.sub.2.sup.- represents a basic anion having a pK.sub.B value of -3 to +5; comprising the steps of:(a) dissolving a sulfonium salt (B) in a metal-ion free polar or non-polar solvent to form a solution, said sulfonium salt (B) being selected from said formulae II-V, wherein R.sup.5 to R.sup.11, Y and n of said sulfonium salt (B) have the sane meaning as above and X.sub.2.sup.Type: GrantFiled: July 29, 1997Date of Patent: December 1, 1998Assignee: Hoechst Japan LimitedInventors: Klaus Juergen Przybilla, Takanori Kudo, Seiya Masuda, Yoshiaki Kinoshita, Natsumi Suehiro, Munirathna Padmanaban, Hiroshi Okazaki, Hajime Endo, Ralph Dammel, Georg Pawlowski
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Patent number: 5776658Abstract: Compounds of the general formula I: (SIL--X--).sub.m IN (I), in which SIL is a radical of the formula Si(R.sup.1)(R.sup.2)(R.sup.3), where R.sup.1 is an alkyl, haloalkyl or alkoxy radical of 1 to 8 carbon atoms, an alkenyl radical, an alkenyloxy or acyloxy radical of 2 to 8 carbon atoms, an aryl or aryloxy radical of 6 to 10 carbon atoms, or a dialkyl-, diaryl- or alkylaryl-methyleneaminooxy radical having C.sub.1 -C.sub.4 -alkyl or C.sub.6 -aryl groups; and R.sup.2 and R.sup.3 are identical or different radicals with the meaning of R.sup.1 or X--IN; X is a group C.sub.n H.sub.2n ; IN is the radical of a compound which is active as a photoinitiator or photosensitizer and which has at least one carbonyl group located on an aromatic nucleus; m is a number from 1 to 4; and n is a number from 2 to 12, or of the formula II: Si.sub.o O.sub.o-1 (--X--IN).sub.p R.sup.4.sub.2o+2-p (II), in which R.sup.4 is a radical with the meaning of R.sup.1, and two or more radicals R.sup.Type: GrantFiled: September 29, 1995Date of Patent: July 7, 1998Assignee: AGFA-Gevaert AGInventors: Claus-Peter Niesert, Georg Pawlowski, Willi-Kurt Gries, Klaus-Juergen Przybilla
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Patent number: 5773187Abstract: A radiation-sensitive recording material comprising:a base;a radiation-sensitive layer comprising a diazonium salt polycondensation product and 3 to 50% by weight, relative to the total weight of the radiation-sensitive layer, of a mineral acid; anda silicone layer.Type: GrantFiled: May 1, 1996Date of Patent: June 30, 1998Assignee: Agfa-Gevaert AGInventors: Willi-Kurt Gries, Klaus-Peter Konrad, Klaus-Juergen Przybilla, Hans-Joachim Schlosser
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Patent number: 5442061Abstract: Sulfonic acid esters of 2,4-bistrichloromethyl-6-(mono- or dihydroxyphenyl)-1,3,5-triazine are disclosed. Also disclosed is a negative-working radiation-sensitive mixture containing such a compound in combination with a compound containing at least two acid-crosslinkable groups, and a water-insoluble polymeric binder which is soluble or at least swellable in aqueous alkaline solutions. The esters are esters of a sulfonic acid or sulfonic acids of the formula R--SO.sub.3 H or R'(--SO.sub.3 H).sub.2 with 2,4-bistrichloromethyl-6-(mono- or dihydroxyphenyl)-1,3,5-triazine of the formulae I and/or II ##STR1## where R is an optionally further substituted (C.sub.1 -C.sub.10)alkyl, (C.sub.5 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.10)aryl, (C.sub.6 -C.sub.10)aryl-(C.sub.1 -C.sub.10)alkyl or (C.sub.3 -C.sub.9)heteroaryl radical, R' is an optionally substituted (C.sub.1 -C.sub.10)alkylene, (C.sub.6 -C.sub.10)arylene or (C.sub.3 -C.sub.9)heteroarylene radical, and n may be 1 or 2.Type: GrantFiled: October 21, 1993Date of Patent: August 15, 1995Assignee: Hoechst AktiengesellschaftInventors: Georg Pawlowski, Horst Roeschert, Walter Spiess, Klaus-Juergen Przybilla
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Patent number: 5401608Abstract: A negative-working radiation-sensitive mixture containinga) a compound which contains at least one --CBr.sub.3 group bound to an atom not linked in turn to a hydrogen atom,b) an alkoxymethylated melamine andc) a water-insoluble polymeric binder which is soluble, or at least swellable, in aqueous alkaline solutions and contains phenolic OH groups,wherein(1) the mixture has an absorption of <0.4 .mu.m.sup.-1 at 248 nm,(2) the CBr.sub.3 group of the compound a) is bound to the sulfur atom of a sulfonyl group and the compound a) is contained in the mixture in an amount of 0.2 to 10% by weight, based on the total amount of the components b) and c),(3) the ratio by mass of the components b) and c) is between 50:50 and 5:95 and(4) the component c) is a homopolymer or copolymer of hydroxystyrene or a derivative thereof, the homopolymer or copolymer having a removal rate of 200 to 3,000 nm/min at 21.degree. C. in an aqueous alkaline developer containing 2.Type: GrantFiled: July 23, 1992Date of Patent: March 28, 1995Assignee: Hoechst AktiengesellschaftInventors: Georg Pawlowski, Ralph Dammel, Horst Roeschert, Winfried Meier, Walter Spiess, Klaus-Juergen Przybilla
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Patent number: 5364734Abstract: A positive-working radiation-sensitive mixture is disclosed that contains(a) a compound that forms strong acid on exposure to actinic radiation that is an ester of a sulfonic acid or sulfonic acids of the formula R--SO.sub.3 H or R'(--SO.sub.3 H).sub.2 with 2,4-bistrichloromethyl-6-(mono- or dihydroxyphenyl)-1,3,5-triazine of the formulae I and/or II: ##STR1## where R is an optionally further substituted (C.sub.1 -C.sub.10) alkyl, (C.sub.5 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.10)aryl, (C.sub.6 -C.sub.10)aryl- (C.sub.1 -C.sub.10) alkyl or (C.sub.3 -C.sub.9)heteroaryl radical, R' is an optionally substituted (C.sub.1 -C.sub.10)alkylene, (C.sub.6 -C.sub.10)arylene or (C.sub.3 -C.sub.9)heteroarylene radical, and n is 1 or 2,(b) a compound that contains at least one acid-cleavable C--O--C or C--O--Si bond, and(c) a water-insoluble polymeric binder that is soluble or at least swellable in aqueous alkaline solutions.Type: GrantFiled: June 9, 1992Date of Patent: November 15, 1994Assignee: Hoechst AktiengesellschaftInventors: Georg Pawlowski, Horst Roeschert, Walter Spiess, Klaus-Juergen Przybilla
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Patent number: 5328973Abstract: A radiation-sensitive mixture which contains a polymeric binder having acid-labile side groups and a compound which generates a strong acid on irradiation wherein the binder is a polymer built up from novel amides of .alpha.,.beta.-unsaturated carboxylic acids, is highly sensitive in the shortwave uv region and useful in the production of recording material.Type: GrantFiled: July 31, 1992Date of Patent: July 12, 1994Assignee: Hoechst AktiengesellschaftInventors: Horst Roeschert, Georg Pawlowski, Klaus-Juergen Przybilla
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Patent number: 5326840Abstract: A radiation-sensitive mixture is disclosed that contains a polymeric binder having acid-cleavable side groups and a compound which forms a strong acid on irradiation. Novel amides of .alpha.,.beta.-unsaturated carboxylic acids with which the polymers used as binders are synthesized are also disclosed. A positive- or negative-working radiation-sensitive recording material comprising a base and a layer of the radiation-sensitive mixture according to the invention is also disclosed.Type: GrantFiled: June 9, 1992Date of Patent: July 5, 1994Assignee: Hoechst AktiengesellschaftInventors: Klaus-Juergen Przybilla, Georg Pawlowski, Horst Roeschert
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Patent number: 5298364Abstract: Sulfonic acid esters of 2,4-bistrichloromethyl-6-(mono- or dihydroxyphenyl)-1,3,5-triazine are disclosed. Also disclosed is a negative-working radiation-sensitive mixture containing such a compound in combination with a compound containing at least two acid-crosslinkable groups, and a water-insoluble polymeric binder which is soluble or at least swellable in aqueous alkaline solutions. The esters are esters of a sulfonic acid or sulfonic acids of the formula R--SO.sub.3 H or R'(--SO.sub.3 H).sub.2 with 2,4-bistrichloromethyl-6-(mono- or dihydroxyphenyl)-1,3,5-triazine of the formulae I and/or II ##STR1## where R is an optionally further substituted (C.sub.1 -C.sub.10)-alkyl, (C.sub.5 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.10)aryl, (C.sub.6 -C.sub.10)aryl-(C.sub.1 -C.sub.10)alkyl or (C.sub.3 -C.sub.9)heteroaryl radical, R' is an optionally substituted (C.sub.1 -C.sub.10)alkylene, (C.sub.6 -C.sub.10)arylene or (C.sub.3 -C.sub.9)heteroarylene radical, and n may be 1 or 2.Type: GrantFiled: June 9, 1992Date of Patent: March 29, 1994Assignee: Hoechst AktiengesellschaftInventors: Georg Pawlowski, Horst Roeschert, Walter Spiess, Klaus-Juergen Przybilla
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Patent number: 5247096Abstract: A process is described for preparing N-tert-butoxycarbonylmaleimide from maleimide and di-tert-butyl dicarbonate which comprises reacting maleimide with di-tert-butyl dicarbonate in the presence of a basic compound of the general formula I ##STR1## in which A represents the ring members required to complete a five- or six-membered saturated ring and R is (C.sub.1 -C.sub.4)alkyl, in one stage to give the end product.In a preferred embodiment, the compound of the general formula I is N-methylmorpholine.The product is useful as a monomer for polymerization, with the styrene copolymers being particularly suitable for chemically reinforced radiation-sensitive mixtures.Type: GrantFiled: July 17, 1992Date of Patent: September 21, 1993Assignee: Hoechst AktiengesellschaftInventors: Horst Roeschert, Ralph Dammel, Georg Pawlowski, Klaus-Juergen Przybilla