Patents by Inventor Klaus Jurgen Przybilla

Klaus Jurgen Przybilla has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Radiation-sensitive mixture comprising a basic iodonium compound
    Patent number: 5663035
    Abstract: A radiation-sensitive mixture for use in the production of semiconductor elements, which has high sensitivity and high resolution, which can be developed by an aqueous alkaline solution, and which is based on a novel concept in that a stable acid latent image is controlled by using a radiation-decomposable base.The mixture is characterized by comprising as essential components a) a binder which is insoluble in water but soluble in an aqueous alkaline solution; b.sup.1) a compound having at least one bond which can be cleaved by an acid, or b.sup.2) a compound having at least one bond which is crosslinked with the compound a) by an acid; c) a compound which generates an acid when irradiated; and d) a basic iodonium compound.
    Type: Grant
    Filed: April 12, 1995
    Date of Patent: September 2, 1997
    Assignee: Hoechst Japan Limited
    Inventors: Seiya Masuda, Munirathna Padmanaban, Takanori Kudo, Yoshiaki Kinoshita, Natsumi Suehiro, Yuko Nozaki, Hiroshi Okazaki, Klaus Jurgen Przybilla