Patents by Inventor Klaus Mehlkopp

Klaus Mehlkopp has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Optical system with isolated measuring structure
    Patent number: 6864988
    Abstract: An optical system, in particular an exposure lens for semiconductor lithography, with a plurality of optical elements has at least one load-dissipating structure. The load-dissipating structure diverts the forces originating from the optical elements. The optical system also has a measuring structure constructed independently of the at least one load-dissipating structure.
    Type: Grant
    Filed: July 1, 2002
    Date of Patent: March 8, 2005
    Assignee: Carl Zeiss Semiconductor Manufacturing Technologies AG
    Inventors: Albrecht Hof, Guenter Maul, Michael Muehlbeyer, Klaus Mehlkopp
  • Lithographic apparatus and device manufacturing method
    Patent number: 6750949
    Abstract: A lithographic projection apparatus according to one embodiment of the invention includes a projection system having a plurality of optical elements or sensors mounted on a frame. The frame includes support portions made of a material (e.g. a glass ceramic) having a coefficient of thermal expansion of less than or approximately equal to 0.1×10−6 K−1.
    Type: Grant
    Filed: July 12, 2002
    Date of Patent: June 15, 2004
    Assignee: AMSL Netherlands B.V.
    Inventors: Erik Roelof Loopstra, Dominicus Jacobus Petrus Adrianus Franken, Josephus Jacobus Smits, Antonius Johannes Josephus Van Dijsseldonk, Johannes Hubertus Josephina Moors, Albrecht Hof, Günter Maul, Michael Mühlbeyer, Klaus Mehlkopp
  • Lithographic apparatus and device manufacturing method
    Publication number: 20030058422
    Abstract: A lithographic projection apparatus according to one embodiment of the invention includes a projection system having a plurality of optical elements or sensors mounted on a frame. The frame includes support portions made of a material (e.g. a glass ceramic) having a coefficient of thermal expansion of less than or approximately equal to 0.1×10−6 K−1.
    Type: Application
    Filed: July 12, 2002
    Publication date: March 27, 2003
    Inventors: Erik Roelof Loopstra, Dominicus Jacobus Petrus Adrianus Franken, Josephus Jacobus Smits, Antonius Johannes Josephus Van Dijsseldonk, Johannes Hubertus Josephina Moors, Albrecht Hof, Gunter Maul, Michael Muhlbeyer, Klaus Mehlkopp
  • Process for manufacturing optical surfaces and shaping machine for carrying out this process
    Patent number: 6523443
    Abstract: The present invention is a process by which optical surfaces of lenses, particularly plastic progressive lenses and molding shells for producing lenses are manufactured directly in a single step according to didicidual data. A blank from which an optical surface or a molding shell is to be manufactured is held at the workpiece carrier of a spindle axis (Z axis) of a shaping machine and is directly turned into its final form by a turning tool which can move relative to the blank (in the X axis), i.e., transversely to the direction of displacement of the tool. During each rotation of the spindle, the turning tool is incrementally adjusted towards or away from the blank depending on the characteristic surface data, which may be predetermined or calculated on-line.
    Type: Grant
    Filed: December 30, 1998
    Date of Patent: February 25, 2003
    Assignees: Carl-Zeiss-Stiftung, Heidenheim/Brenz, Fraunhofer-Gesellschaft zur Forderung der angewandten Forschung e.V.
    Inventors: Albrecht Hof, Klaus Mehlkopp
  • Optical system with a plurality of optical elements
    Publication number: 20030010902
    Abstract: An optical system, in particular an exposure lens for semiconductor lithography, with a plurality of optical elements has at least one load-dissipating structure. The load-dissipating structure diverts the forces originating from the optical elements. The optical system also has a measuring structure constructed independently of the at least one load-dissipating structure.
    Type: Application
    Filed: July 1, 2002
    Publication date: January 16, 2003
    Applicant: CARL-ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
    Inventors: Albrecht Hof, Guenter Maul, Michael Muehlbeyer, Klaus Mehlkopp