Patents by Inventor Klaus-Peter Schwaab

Klaus-Peter Schwaab has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Microscope illumination system, microscope and oblique incident illumination method
    Patent number: 9250432
    Abstract: A microscope illumination system includes a first light source configured to provide light along an optical axis and an aperture device including an aperture wheel that is rotatable about an axis of rotation. The aperture wheel includes a plurality of apertures of varying size disposed circumferentially on the aperture wheel. The aperture wheel is rotatable so as to dispose each of the apertures in a position that is centered on the optical axis so as to generate an illumination beam path that extends in a centered relationship with respect to the optical axis, and so as to dispose each of the apertures in a position that is off-center from the optical axis and that is within a defined region around the optical axis so as to generate an illumination beam path that extends off-center from the optical axis for oblique incident illumination.
    Type: Grant
    Filed: October 11, 2011
    Date of Patent: February 2, 2016
    Assignee: LEICA MICROSYSTEMS CMS GMBH
    Inventors: Albrecht Weiss, Arnold Mueller-Rentz, Klaus-Peter Schwaab, Stefan Motyka
  • MICROSCOPE ILLUMINATION SYSTEM, MICROSCOPE AND OBLIQUE INCIDENT ILLUMINATION METHOD
    Publication number: 20120086795
    Abstract: A microscope illumination system includes a first light source configured to provide light along an optical axis and an aperture device including an aperture wheel that is rotatable about an axis of rotation. The aperture wheel includes a plurality of apertures of varying size disposed circumferentially on the aperture wheel. The aperture wheel is rotatable so as to dispose each of the apertures in a position that is centered on the optical axis so as to generate an illumination beam path that extends in a centered relationship with respect to the optical axis, and so as to dispose each of the apertures in a position that is off-center from the optical axis and that is within a defined region around the optical axis so as to generate an illumination beam path that extends off-center from the optical axis for oblique incident illumination.
    Type: Application
    Filed: October 11, 2011
    Publication date: April 12, 2012
    Applicant: LEICA MICROSYSTEMS CMS GMBH
    Inventors: Albrecht Weiss, Arnold Mueller-Rentz, Klaus-Peter Schwaab, Stefan Motyka