Abstract: An arrangement for producing structured substrates is provided, which includes a device for applying layer systems including a device for applying liquid materials to rotating substrates, a housing, a rotating holder for the substrate to be coated, a feeder for liquid materials to be applied, and a collection device having multiple removal contraptions for liquid materials that do not remain on the substrate. The housing of the device is filled with an inert gas, in particular dried, molecular nitrogen, noble gas, or a mixture thereof. The additional receptacles and conduits of the arrangement for producing structured substrates are gas-tight and are designed such that an inert molecular nitrogen or noble gas atmosphere is created above the liquid contents thereof. The collection device has various collection zones in which different liquid materials can be selectively collected and selectively removed via the associated removal contraption.

Abstract: An arrangement for producing structured substrates is provided, which includes a device for applying layer systems including a device for applying liquid materials to rotating substrates, a housing, a rotating holder for the substrate to be coated, a feeder for liquid materials to be applied, and a collection device having multiple removal contraptions for liquid materials that do not remain on the substrate. The housing of the device is filled with an inert gas, in particular dried, molecular nitrogen, noble gas, or a mixture thereof. The additional receptacles and conduits of the arrangement for producing structured substrates are gas-tight and are designed such that an inert molecular nitrogen or noble gas atmosphere is created above the liquid contents thereof. The collection device has various collection zones in which different liquid materials can be selectively collected and selectively removed via the associated removal contraption.

Abstract: A developer suitable for use with positive photoresists is based on a buffered aqueous-alkaline solution containing non-ionic surfactants and contains in the solution 1-100 ppm of the surfactants, preferably of the ethoxylated-alkylphenol type. The resultant photoresist shows outstanding properties with respect to the resolution and edge sharpness obtainable in the developed resist image and with respect to its developing activity, developing capacity and stability.