Patents by Inventor Klaus Schiessel

Klaus Schiessel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Compensation of defective beamlets in a charged-particle multi-beam exposure tool
    Patent number: 9269543
    Abstract: An exposure pattern is computed which is used for exposing a desired pattern on a target by means of a blanking aperture array in a particle-optical lithography apparatus which has a finite number of defects, said desired pattern being composed of a multitude of image elements within an image area on the target: A list of defective blanking apertures is provided, comprising information about the type of defect of the defective blanking apertures; from the desired pattern a nominal exposure pattern is calculated as a raster graphics over the image elements disregarding the defective blanking apertures; the “compromised” image elements (1105) are determined which are exposed by aperture images of defective blanking apertures; for each compromised element (1105), a set of neighboring image elements is selected as “correction elements” (1104); for each compromised element, corrected dose values are calculated for the correction elements, said corrected dose values minimizing an error functional of the deviation o
    Type: Grant
    Filed: February 25, 2015
    Date of Patent: February 23, 2016
    Assignee: IMS NANOFABRICATION AG
    Inventors: Rafael Reiter, Elmar Platzgummer, Klaus Schiessel
  • COMPENSATION OF DEFECTIVE BEAMLETS IN A CHARGED-PARTICLE MULTI-BEAM EXPOSURE TOOL
    Publication number: 20150248993
    Abstract: An exposure pattern is computed which is used for exposing a desired pattern on a target by means of a blanking aperture array in a particle-optical lithography apparatus which has a finite number of defects, said desired pattern being composed of a multitude of image elements within an image area on the target: A list of defective blanking apertures is provided, comprising information about the type of defect of the defective blanking apertures; from the desired pattern a nominal exposure pattern is calculated as a raster graphics over the image elements disregarding the defective blanking apertures; the “compromised” image elements (1105) are determined which are exposed by aperture images of defective blanking apertures; for each compromised element (1105), a set of neighboring image elements is selected as “correction elements” (1104); for each compromised element, corrected dose values are calculated for the correction elements, said corrected dose values minimizing an error functional of the deviation o
    Type: Application
    Filed: February 25, 2015
    Publication date: September 3, 2015
    Inventors: Rafael Reiter, Elmar Platzgummer, Klaus Schiessel