Patents by Inventor Klaus W. Gerstenberg

Klaus W. Gerstenberg has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080230591
    Abstract: A device and method are provided for reflow soldering workpieces wherein a plasma device for an atmospheric plasma treatment of the workpiece is upstream of a solder application and/or upstream of a soldering zone, and wherein the method subjects the workpiece to an atmospheric plasma treatment with the aid of a plasma device prior to the application of the solder and/or prior to the soldering process.
    Type: Application
    Filed: March 7, 2008
    Publication date: September 25, 2008
    Inventors: Ernst Wandke, Klaus W. Gerstenberg
  • Patent number: 5330852
    Abstract: Magneto-optical memory having a substrate of a material which is transparent for the visible-to-infrared spectral range, on which there are provided, in this sequence, a dielectric layer which is transparent for the visible-to-infrared spectral range and has a refractive index which is higher than the refractive index of the substrate and constitutes a diffusion barrier layer for oxygen and/or water, an in essence amorphous and/or in essence micro-crystalline magneto-optical layer with uniaxial anisotropy and a magnetic ordering temperature higher than ambient temperature and a top layer which acts as a reflection or interference layer and as a diffusion barrier layer for oxygen and/or water, the dielectric layer being a layer which is deposited from organic silicon materials by means of a PCVD process.
    Type: Grant
    Filed: May 15, 1990
    Date of Patent: July 19, 1994
    Assignee: U.S. Philips Corporation
    Inventors: Klaus W. Gerstenberg, Heinrich Heitmann
  • Patent number: 4786887
    Abstract: Thin film strain gauge system consisting of an elastically deformable flexible metallic substrate on which an electrically insulating layer of a plasma-polymerized material, in particular of Si:N:O:C:H-containing compounds and thereon a structured resistance layer as well as an electrically readily conducting layer having a structure for the electrical contacting are provided.
    Type: Grant
    Filed: July 30, 1987
    Date of Patent: November 22, 1988
    Assignee: U.S. Philips Corporation
    Inventors: Udo Bringmann, Olaf H. Dossel, Klaus W. Gerstenberg, Gerhard Kursten, Reiner U. Orlowski, Detlef G. Schon