Patents by Inventor Klim Kouznetsov

Klim Kouznetsov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma activated chemical vapour deposition method and apparatus therefor
    Patent number: 8883246
    Abstract: In plasma activated chemical vapour deposition a plasma decomposition unit is used that is arranged in or connected to a vacuum vessel having a relatively low pressure or vacuum, to which an operating gas is provided. Periodically repeated voltage pulses are applied between the anode and the cathode of the plasma decomposition unit in such a manner that pulsed electric discharges are produced between the cathode and the surrounding anode of the plasma decomposition unit. The anode is arranged in a special way so that at least a portion thereof will obtain only an electrically conductive coating or substantially no coating when operating the unit. For that purpose, the anode includes a portion located in the direct vicinity of the free surface of the cathode. The portion is a flange or edge portion which is located or extends over margins of the free surface of the cathode.
    Type: Grant
    Filed: December 12, 2008
    Date of Patent: November 11, 2014
    Assignee: Plasmatrix Materials AB
    Inventors: Mihai Nicolescu, Äke Hjalmarsson, Klim Kouznetsov
  • Method for enhancing dynamic stiffness
    Patent number: 8460763
    Abstract: A method for composite material synthesis at the surface of a work piece, wherein it includes PECVD, PEPVD methods and plasma generation by electric discharges with closed electron drift. The composite material comprises at least one layer of substantially parallel carbon pillars extending from the bottom surface of the at least one layer up to the top surface of the at least one layer. The carbon pillars have a cross-sectional dimension in the range of 50-200 ?m, and heights in the range of 50 ?m-2 mm.
    Type: Grant
    Filed: February 29, 2008
    Date of Patent: June 11, 2013
    Assignee: Plasmatrix Materials AB
    Inventors: Mihai Nicolescu, Olga Meza, Lars Hemmingsson, Klim Kouznetsov
  • Plasma Activated Chemical Vapour Deposition Method and Apparatus Therefor
    Publication number: 20110081477
    Abstract: In plasma activated chemical vapour deposition a plasma decomposition unit is used that is arranged in or connected to a vacuum vessel having a relatively low pressure or vacuum, to which an operating gas is provided. Periodically repeated voltage pulses are applied between the anode and the cathode of the plasma decomposition unit in such a manner that pulsed electric discharges are produced between the cathode and the surrounding anode of the plasma decomposition unit. The anode is arranged in a special way so that at least a portion thereof will obtain only an electrically conductive coating or substantially no coating when operating the unit. For that purpose, the anode includes a portion located in the direct vicinity of the free surface of the cathode. The portion is a flange or edge portion which is located or extends over margins of the free surface of the cathode.
    Type: Application
    Filed: December 12, 2008
    Publication date: April 7, 2011
    Applicant: PLASMATRIX MATERIALS AB
    Inventors: Mihai Nicolescu, Äke Hjalmarsson, Vladimir Kouznetsov, Klim Kouznetsov