Patents by Inventor Ko-Jui Lee

Ko-Jui Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11556036
    Abstract: A metal structure includes a patterned molybdenum tantalum oxide layer and a patterned metal layer. The patterned molybdenum tantalum oxide layer is disposed on a first substrate, in which the patterned molybdenum tantalum oxide layer includes about 2 to 12 atomic percent of tantalum. Both of an atomic percent of molybdenum and an atomic percent of oxygen of the patterned molybdenum tantalum oxide layer are greater than the atomic percent of tantalum of the patterned molybdenum tantalum oxide layer. The patterned metal layer is disposed on the patterned molybdenum tantalum oxide layer.
    Type: Grant
    Filed: October 26, 2020
    Date of Patent: January 17, 2023
    Assignee: AU OPTRONICS CORPORATION
    Inventors: Shuo-Hong Wang, Chun-Nan Lin, Chia-Tsung Wu, Chi-Ting Kuo, Ko-Jui Lee, Chia-Hung Li, Chia-Ming Chang
  • Publication number: 20210041751
    Abstract: A metal structure includes a patterned molybdenum tantalum oxide layer and a patterned metal layer. The patterned molybdenum tantalum oxide layer is disposed on a first substrate, in which the patterned molybdenum tantalum oxide layer includes about 2 to 12 atomic percent of tantalum. Both of an atomic percent of molybdenum and an atomic percent of oxygen of the patterned molybdenum tantalum oxide layer are greater than the atomic percent of tantalum of the patterned molybdenum tantalum oxide layer. The patterned metal layer is disposed on the patterned molybdenum tantalum oxide layer.
    Type: Application
    Filed: October 26, 2020
    Publication date: February 11, 2021
    Inventors: Shuo-Hong WANG, Chun-Nan LIN, Chia-Tsung WU, Chi-Ting KUO, Ko-Jui LEE, Chia-Hung LI, Chia-Ming CHANG
  • Patent number: 10852605
    Abstract: A metal structure includes a patterned molybdenum tantalum oxide layer and a patterned metal layer. The patterned molybdenum tantalum oxide layer is disposed on a first substrate, in which the patterned molybdenum tantalum oxide layer includes about 2 to 12 atomic percent of tantalum. Both of an atomic percent of molybdenum and an atomic percent of oxygen of the patterned molybdenum tantalum oxide layer are greater than the atomic percent of tantalum of the patterned molybdenum tantalum oxide layer. The patterned metal layer is disposed on the patterned molybdenum tantalum oxide layer.
    Type: Grant
    Filed: November 30, 2018
    Date of Patent: December 1, 2020
    Assignee: AU OPTRONICS CORPORATION
    Inventors: Shuo-Hong Wang, Chun-Nan Lin, Chia-Tsung Wu, Chi-Ting Kuo, Ko-Jui Lee, Chia-Hung Li, Chia-Ming Chang
  • Publication number: 20190187529
    Abstract: A metal structure includes a patterned molybdenum tantalum oxide layer and a patterned metal layer. The patterned molybdenum tantalum oxide layer is disposed on a first substrate, in which the patterned molybdenum tantalum oxide layer includes about 2 to 12 atomic percent of tantalum. Both of an atomic percent of molybdenum and an atomic percent of oxygen of the patterned molybdenum tantalum oxide layer are greater than the atomic percent of tantalum of the patterned molybdenum tantalum oxide layer. The patterned metal layer is disposed on the patterned molybdenum tantalum oxide layer.
    Type: Application
    Filed: November 30, 2018
    Publication date: June 20, 2019
    Inventors: SHUO-HONG WANG, Chun-Nan Lin, Chia-Tsung Wu, Chi-Ting Kuo, Ko-Jui Lee, Chia-Hung Li, Chia-Ming Chang