Patents by Inventor Ko Kedo

Ko Kedo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8642181
    Abstract: The present invention provides a metal-clad white laminate including: a white resin layer which is composed of a resin composition obtained by mixing a polyimide having a repeating unit as represented by a particular chemical structural formula with a white pigment; and at least one metal layer, the white resin layer being an adhesive layer for the metal layer. The metal-clad white laminate of the present invention uses a white resin composition which has high reflectance and whiteness and excellent light resistance, and is easy to be reduced in thickness and weight.
    Type: Grant
    Filed: August 19, 2005
    Date of Patent: February 4, 2014
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Jitsuo Oishi, Shuta Kihara, Ko Kedo, Takakiyo Mine
  • Patent number: 7871554
    Abstract: The invention is directed to a process for producing polyimide film, including stretching, at 150° C. to 380° C. and a stretch ratio of 1.2 to 4.0, an unstretched polyimide film which is formed from a polyimide having a repeating unit represented by formula (1): (wherein R represents a tetravalent group derived from cyclohexane; and ? represents a divalent aliphatic, alicyclic, or aromatic group, or a combination thereof that has a total number of carbon atoms of 2 to 39 and may have at least one connecting group selected from the group consisting of —O—, —SO2—, —CO—, —CH2—, —C(CH3)2—, —OSi(CH3)2—, —C2H4O—, and —S—) and which has an organic solvent content of 0.5 wt. % or more and less than 30 wt. %. The produced polyimide film exhibits transparency, excellent heat resistance, and reduced dimensional changes.
    Type: Grant
    Filed: April 10, 2006
    Date of Patent: January 18, 2011
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Jitsuo Oishi, Takashi Makinoshima, Ko Kedo, Shuta Kihara
  • Patent number: 7858199
    Abstract: The flexible metal-clad laminate of the present invention comprises at least one polyimide layer made of a polyimide having repeating units represented by the following formula I: wherein R and ? are as defined in the specification, and at least one metal layer. The polyimide is soluble in solvents and excellent in heat resistance and adhesion property, and shows a low dielectric constant even in a high frequency range.
    Type: Grant
    Filed: May 6, 2004
    Date of Patent: December 28, 2010
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Shuta Kihara, Ko Kedo
  • Publication number: 20090160089
    Abstract: The invention is directed to a process for producing polyimide film, including stretching, at 150° C. to 380° C. and a stretch ratio of 1.2 to 4.0, an unstretched polyimide film which is formed from a polyimide having a repeating unit represented by formula (1): (wherein R represents a tetravalent group derived from cyclohexane; and ? represents a divalent aliphatic, alicyclic, or aromatic group, or a combination thereof that has a total number of carbon atoms of 2 to 39 and may have at least one connecting group selected from the group consisting of —O—, —SO2—, —CO—, —CH2—, —C(CH3)2—, —OSi(CH3)2—, —C2H4O—, and —S—) and which has an organic solvent content of 0.5 wt. % or more and less than 30 wt. %. The produced polyimide film exhibits transparency, excellent heat resistance, and reduced dimensional changes.
    Type: Application
    Filed: April 10, 2006
    Publication date: June 25, 2009
    Inventors: Jitsuo Oishi, Takashi Makinoshima, Ko Kedo, Shuta Kihara
  • Publication number: 20070292709
    Abstract: The present invention provides a metal-clad white laminate including: a white resin layer which is composed of a resin composition obtained by mixing a polyimide having a repeating unit as represented by a particular chemical structural formula with a white pigment; and at least one metal layer, the white resin layer being an adhesive layer for the metal layer. The metal-clad white laminate of the present invention uses a white resin composition which has high reflectance and whiteness and excellent light resistance, and is easy to be reduced in thickness and weight.
    Type: Application
    Filed: August 19, 2005
    Publication date: December 20, 2007
    Inventors: Jitsuo Oishi, Shuta Kihara, Ko Kedo, Takakiyo Mine
  • Patent number: 7217462
    Abstract: The metal foil-clad laminate of the present invention comprises at least one polyimide layer made of a polyimide having repeating units represented by the following formula I: wherein R and ? are as defined in the specification, at least one insulating substrate, and at least one metal foil layer. The polyimide is excellent in thermopress-bonding property, solubility in solvents and heat resistance, and exhibits a low dielectric constant. The metal foil-clad laminate having the polyimide layer is suitably applicable to high-frequency printed wiring boards, etc.
    Type: Grant
    Filed: May 10, 2004
    Date of Patent: May 15, 2007
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Shuta Kihara, Ko Kedo
  • Patent number: 6962756
    Abstract: A transparent electrically-conductive film comprising a substrate made of an aliphatic polyimide having a repeating unit of the formula [I] and a transparent electrically-conductive thin film layer, the transparent electrically-conductive thin film layer being provided on the substrate, wherein R is a tetravalent aliphatic group having 4 to 39 carbon atoms and ? is a divalent aliphatic group having 1 to 39 carbon atoms or a divalent aromatic group having 6 to 39 carbon atoms; an organic EL element using the above film; a thin-film transistor substrate comprising a substrate formed of a film of a polyimide having a repeating unit of the formula [I] and, provided thereon, a thin-film transistor; and an organic EL element using the above transistor substrate.
    Type: Grant
    Filed: October 31, 2002
    Date of Patent: November 8, 2005
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Shuta Kihara, Hiroki Oguro, Ko Kedo
  • Publication number: 20050037213
    Abstract: The metal foil-clad laminate of the present invention comprises at least one polyimide layer made of a polyimide having repeating units represented by the following formula I: wherein R and ? are as defined in the specification, at least one insulating substrate, and at least one metal foil layer. The polyimide is excellent in thermopress-bonding property, solubility in solvents and heat resistance, and exhibits a low dielectric constant. The metal foil-clad laminate having the polyimide layer is suitably applicable to high-frequency printed wiring boards, etc.
    Type: Application
    Filed: May 10, 2004
    Publication date: February 17, 2005
    Inventors: Shuta Kihara, Ko Kedo
  • Publication number: 20040265609
    Abstract: The flexible metal-clad laminate of the present invention comprises at least one polyimide layer made of a polyimide having repeating units represented by the following formula I: 1
    Type: Application
    Filed: May 6, 2004
    Publication date: December 30, 2004
    Inventors: Shuta Kihara, Ko Kedo
  • Publication number: 20030104232
    Abstract: A transparent electrically-conductive film comprising a substrate made of an aliphatic polyimide having a repeating unit of the formula [I] and a transparent electrically-conductive thin film layer, the transparent electrically-conductive thin film layer being provided on the substrate, 1
    Type: Application
    Filed: October 31, 2002
    Publication date: June 5, 2003
    Inventors: Shuta Kihara, Hiroki Oguro, Ko Kedo
  • Patent number: 6541662
    Abstract: A process for producing a hydrogenation product of aromatic carboxylic acid which comprises continuously producing the hydrogenation product of aromatic carboxylic acid by hydrogenating an aromatic carboxylic acid having a melting point of 250° C. or higher in a solvent in the presence of a solid catalyst, wherein the hydrogenation is conducted in a condition such that substantially the entire amount of the aromatic carboxylic acid of a raw material is dissolved in the solvent by recycling a portion of a reaction liquid taken out of a reactor into the reactor. An aromatic carboxylic acid having a high melting point and hardly soluble in solvents can be hydrogenated at a suitable reaction temperature in accordance with a continuous process without using a great amount of a solvent and the reaction product of the object compound can be produced very efficiently.
    Type: Grant
    Filed: December 19, 2001
    Date of Patent: April 1, 2003
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Hiroshi Machida, Ko Kedo, Fumiya Zaima
  • Publication number: 20020115884
    Abstract: A process for producing a hydrogenation product of aromatic carboxylic acid which comprises continuously producing the hydrogenation product of aromatic carboxylic acid by hydrogenating an aromatic carboxylic acid having a melting point of 250° C. or higher in a solvent in the presence of a solid catalyst, wherein the hydrogenation is conducted in a condition such that substantially the entire amount of the aromatic carboxylic acid of a raw material is dissolved in the solvent by recycling a portion of a reaction liquid taken out of a reactor into the reactor.
    Type: Application
    Filed: December 19, 2001
    Publication date: August 22, 2002
    Inventors: Hiroshi Machida, Ko Kedo, Fumiya Zaima
  • Patent number: 5948949
    Abstract: A process for producing highly pure 2,6-dimethylnaphthalene in a high yield from a mixture of dimethylnaphthalene isomers in the presence of a solvent, such as an aliphatic or alicyclic saturated hydrocarbon. Highly pure 2,6-dimethylnaphthalene can be produced steadily for a long time by filtering the 2,6-dimethylnaphthalene crystal precipitated by the crystallizing by using a filtration apparatus, such as a rotary vacuum filter, peeling-off the filtered cake from a filter cloth and cleaning the filter cloth with a solvent, at a temperature not lower than a filtration temperature.
    Type: Grant
    Filed: December 30, 1996
    Date of Patent: September 7, 1999
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Makoto Takagawa, Ryusuke Shigematsu, Kuniaki Ageishi, Ko Kedo
  • Patent number: 5436381
    Abstract: There is disclosed a process for producing a monoalkenylbenzene which comprises alkenylating a side chain of an aromatic hydrocarbon compound having at least one hydrogen atom bonded at .alpha.-position of the side chain (such as xylene) with a conjugated diene having 4 or 5 carbon atoms (such as butadiene) in the presence of a catalyst produced by calcining the mixture of potassium hydroxide and aluminum hydroxide and then heat treating the calcined product together with metallic sodium in an atmosphere of an inert gas. According to the aforesaid process, an industrially useful monoalkenylbenzene can be produced in high yield at a low cost with enhanced safety.
    Type: Grant
    Filed: December 20, 1993
    Date of Patent: July 25, 1995
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Makoto Takagawa, Kinji Kato, Norio Fushimi, Ko Kedo
  • Patent number: 5367098
    Abstract: A process for producing a monoalkenyl aromatic hydrocarbon compound which comprises alkenylating a side chain of an aromatic hydrocarbon compound having at least one hydrogen atom bonded at an .alpha.-position of the side chain (such as xylene) with a conjugated diene having 4 or 5 carbon atoms (such as butadiene) in the presence of a catalyst comprising a mixture obtained by heat treating metallic sodium together with a mixture of an aluminum oxide and a potassium compound in an inert gas atmosphere. The process produces a commercially useful monoalkenyl aromatic hydrocarbon compounds in a high yields and at a low cost with enhanced safety.
    Type: Grant
    Filed: April 15, 1993
    Date of Patent: November 22, 1994
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Norio Fushimi, Ko Kedo, Kenji Inamasa, Makoto Takagawa
  • Patent number: 5334794
    Abstract: A process for producing a monoalkenyl aromatic hydrocarbon compound which comprises alkenylating a side chain of an aromatic hydrocarbon compound having at least one hydrogen atom bonded at an .alpha.-position of the side chain (such as xylene) with a conjugated diene having 4 or 5 carbon atoms (such as butadiene) in the presence of a catalyst comprising a mixture obtained by heat treating metallic sodium together with a mixture of a zirconium oxide and a potassium compound in an inert gas atmosphere. An industrially useful monoalkenyl aromatic hydrocarbon compound is produced in a high yield at a low cost with enhanced safety from a specific aromatic hydrocarbon compound and a specific conjugated diene compound.
    Type: Grant
    Filed: April 15, 1993
    Date of Patent: August 2, 1994
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Norio Fushimi, Ko Kedo, Kenji Inamasa, Makoto Takagawa