Abstract: Substantially alkali free glasses are disclosed with can be used to produce substrates for flat panel display devices, e.g., active-matrix liquid crystal displays (AMLCDs). The glasses have high annealing temperatures and Young's modulus. Methods for producing substantially alkali free glasses using a downdraw process (e.g., a fusion process) are also disclosed.

Abstract: Substantially alkali free glasses are disclosed with can be used to produce substrates for flat panel display devices, e.g., active-matrix liquid crystal displays (AMLCDs). The glasses have high annealing temperatures and Young's modulus. Methods for producing substantially alkali free glasses using a downdraw process (e.g., a fusion process) are also disclosed.

Abstract: The embodiments described herein relate to low temperature moldable sheet forming glass compositions and glass articles formed from the same. In various embodiments, the glass composition comprises from about 60 mol. % to about 67 mol. % SiO2, from about 6 mol. % to about 11 mol. % B2O3, from about 4.5 mol. % to about 11 mol. % Li2O, Al2O3, Na2O, and K2O. The glass composition also includes greater than about 2 mol. % RO, where RO are divalent metal oxides, and R2O from about 14 mol. % to about 20 mol. %, where R2O are alkali metal oxides. The glass composition also has a glass transition temperature Tg of less than about 500° C., a softening point of less than about 650° C., and a coefficient of thermal expansion (CTE) of less than about 85×10?7K?1.

Abstract: The embodiments described herein relate to low temperature moldable sheet forming glass compositions and glass articles formed from the same. In various embodiments, the glass composition comprises from about 60 mol. % to about 67 mol. % SiO2, from about 6 mol. % to about 11 mol. % B2O3, from about 4.5 mol. % to about 11 mol. % Li2O, Al2O3, Na2O, and K2O. The glass composition also includes greater than about 2 mol. % RO, where RO are divalent metal oxides, and R2O from about 14 mol. % to about 20 mol. %, where R2O are alkali metal oxides. The glass composition also has a glass transition temperature Tg of less than about 500° C., a softening point of less than about 650° C., and a coefficient of thermal expansion (CTE) of less than about 85×10?7K?1.

Abstract: An article including a glass having that includes SiO2, Al2O3, and B2O3 and least one of Li2O, Na2O, K2O, MgO, CaO, SrO, BaO, SnO2, ZnO, La2O3, F, and Fe2O3, wherein the glass includes a dielectric constant of about 10 or less and/or a loss tangent of about 0.01 or less, both as measured with signals at 10 GHz.

Abstract: The embodiments described herein relate to low temperature moldable sheet forming glass compositions and glass articles formed from the same. In various embodiments, the glass composition comprises from about 60 mol. % to about 67 mol. % SiO2, from about 6 mol. % to about 11 mol. % B2O3, from about 4.5 mol. % to about 11 mol. % Li2O, Al2O3, Na2O, and K2O. The glass composition also includes greater than about 2 mol. % RO, where RO are divalent metal oxides, and R2O from about 14 mol. % to about 20 mol. %, where R2O are alkali metal oxides. The glass composition also has a glass transition temperature Tg of less than about 500 C, a softening point of less than about 650 C, and a coefficient of thermal expansion (CTE) of less than about 85×10?7 K?1.

Abstract: Substantially alkali free glasses are disclosed with can be used to produce substrates for flat panel display devices, e.g., active-matrix liquid crystal displays (AMLCDs). The glasses have high annealing temperatures and Young's modulus. Methods for producing substantially alkali free glasses using a downdraw process (e.g., a fusion process) are also disclosed.

Abstract: Substantially alkali free glasses are disclosed with can be used to produce substrates for flat panel display devices, e.g., active-matrix liquid crystal displays (AMLCDs). The glasses have high annealing temperatures and Young's modulus. Methods for producing substantially alkali free glasses using a downdraw process (e.g., a fusion process) are also disclosed.

Abstract: Chemically durable glass compositions are disclosed. In embodiments, the glass composition includes: 48 mol. % to 61 mol. % SiO2; 0 mol. % to 1 mol. % Al2O3; 7 mol. % to 20 mol. % B2O3; 9 mol. % to 16 mol. % R2O, where R2O is a sum of alkali oxides present in the glass composition; 9 mol. % to 15 mol. % Na2O; and 8 mol. % to 21 mol. % ZnO. The glass composition may be substantially free of Li2O. RO (mol. %)<0.5×ZnO (mol. %), where RO is a sum of the alkaline earth oxides in the glass composition. An average coefficient of thermal expansion of the glass composition is 75×10?7/° C. to 88×10?7/° C. over a temperature range from about 20° C. to about 300° C. The glass composition comprises a softening point less than or equal to 660° C. The glass composition comprises a hydrolytic resistance of class HGA1 or class HGA2 according to ISO 720:1985.

Abstract: A method of producing an optical fiber is provided that includes the steps of flowing a first gas into an optical fiber draw furnace. The first gas is passed through a heated section configured to contain and heat a glass source from which the optical fiber is drawn, passing the first gas through a muffle which defines a capture chamber. A portion of the first gas is removed through at least one reclaim port operatively coupled to the capture chamber. A second gas flows into a gas screen at a rate configured to substantially recover a pressure drop associated with removing the portion of the first gas.

Abstract: An article including a glass having that includes SiO2, Al2O3, and B2O3 and least one of Li2O, Na2O, K2O, MgO, CaO, SrO, BaO, SnO2, ZnO, La2O3, F, and Fe2O3, wherein the glass includes a dielectric constant of about 10 or less and/or a loss tangent of about 0.01 or less, both as measured with signals at 10 GHz.

Abstract: A laminate glass article is provided that includes: a core glass layer comprising a first coefficient of thermal expansion (CTE); and a plurality of clad glass layers, each comprising a first primary surface, a second primary surface in contact with the core glass layer and a second CTE that is lower than the first CTE of the core glass layer. The difference in the first and second CTE is about 10×10?7/#C to about 70×10?7/#C. Further, each of the core glass layer and the clad glass layers comprises a viscosity from 109.0 to 1014.0 Poise from about 550#C to about 700#C.

Abstract: Glasses that are substantially free of alkalis that possess high annealing points and, thus, good dimensional stability (i.e., low compaction) for use as TFT backplane substrates in amorphous silicon, oxide and low-temperature polysilicon TFT processes.

Abstract: An article including a glass having that includes SiO2, Al2O3, and B2O3 and least one of Li2O, Na2O, K2O, MgO, CaO, SrO, BaO, SnO2, ZnO, La2O3, F, and Fe2O3, wherein the glass includes a dielectric constant of about 10 or less and/or a loss tangent of about 0.01 or less, both as measured with signals at 10 GHz.

Abstract: Substantially alkali free glasses are disclosed with can be used to produce substrates for flat panel display devices, e.g., active-matrix liquid crystal displays (AMLCDs). The glasses have high annealing temperatures and Young's modulus. Methods for producing substantially alkali free glasses using a downdraw process (e.g., a fusion process) are also disclosed.

Abstract: The embodiments described herein relate to low temperature moldable sheet forming glass compositions and glass articles formed from the same. In various embodiments, the glass composition comprises from about 60 mol. % to about 67 mol. % SiO2, from about 6 mol. % to about 11 mol. % B2O3, from about 4.5 mol. % to about 11 mol. % Li2O, Al2O3, Na2O, and K2O. The glass composition also includes greater than about 2 mol. % RO, where RO are divalent metal oxides, and R2O from about 14 mol. % to about 20 mol. %, where R2O are alkali metal oxides. The glass composition also has a glass transition temperature Tg of less than about 500 C., a softening point of less than about 650 C, and a coefficient of thermal expansion (CTE) of less than about 85×10?7K?1.

Abstract: An article including a glass having that includes SiO2, Al2O3, and B2O3 and least one of Li2O, Na2O, K2O, MgO, CaO, SrO, BaO, SnO2, ZnO, La2O3, F, and Fe2O3, wherein the glass includes a dielectric constant of about 10 or less and/or a loss tangent of about 0.01 or less, both as measured with signals at 10 GHz.

Abstract: A method of making a glass sheet includes exposing a refractory block material comprising at least one multivalent component to a reducing atmosphere for a time and at a temperature sufficient to substantially reduce the at least one multivalent component of the refractory block material. The method also includes flowing molten glass over the refractory block material that has been exposed to the reducing atmosphere while preventing substantial re-oxidation of the at least one multivalent component.

Abstract: Alkali-doped and alkali-free boroaluminosilicate glasses that include barium oxide and the network formers SiO2, B2O3, and Al2O3. The glasses may be doped with up to about 1 mol % of Li2O, Na2O, and/or K2O. The glass may, in some embodiments, have a Young's modulus of less than about 61 GPa and/or a coefficient of thermal expansion, averaged over a temperature range from about 20° C. to about 300° C., of less than about 40×10?7/° C. These glasses may be used as a cover glass for electronic devices, a color filter substrate, a thin film transistor substrate, or an outer clad layer for a glass laminate.

Abstract: A method of producing an optical fiber is provided that includes the steps of flowing a first gas into an optical fiber draw furnace. The first gas is passed through a heated section configured to contain and heat a glass source from which the optical fiber is drawn, passing the first gas through a muffle which defines a capture chamber. A portion of the first gas is removed through at least one reclaim port operatively coupled to the capture chamber. A second gas flows into a gas screen at a rate configured to substantially recover a pressure drop associated with removing the portion of the first gas.