Abstract: Liquid delivery system apparatus and reactor systems including such apparatus are disclosed. Exemplary liquid delivery system apparatus can be used to provide desired control of a flowrate of a liquid-source precursor, while mitigating fluctuations in flowrate that might otherwise occur and while allowing for a relatively low number of fluid lines.

Abstract: A wafer support device includes a susceptor having a wafer mounting surface provided on one surface and a lift pin through hole arranged in the wafer mounting surface, a lift pin inserted into the lift pin through hole, and an elevating device that raises and lowers the susceptor, the wafer mounting surface of the susceptor is uneven, a ventilation path is formed between the lift pin through hole and the lift pin.

Abstract: Methods and apparatuses for etching a perimeter of a substrate are disclosed. Exemplary methods and apparatuses can be used to deposit material and selectively etch material at the perimeter of the substrate within the same reaction chamber.

Abstract: A CVD apparatus includes a chamber, a susceptor, an entry/takeout port for a substrate, and a gate valve provided at the entry/takeout port, in which the susceptor has a mounting plate and a support, the entry/takeout port is provided on a part of a side of the chamber, and is provided in a range from an inner bottom surface of the chamber to a position corresponding to the lower surface of the mounting plate when the susceptor is located at an upper end in the vertical direction, and the inner bottom surface of the chamber, the range from the inner bottom surface of the chamber to the position corresponding to the lower surface of the mounting plate when the susceptor is located at the upper end in the vertical direction, the lower surface of the mounting plate, and the outer side surface of the support are coated with ceramic liners.

Abstract: A gas supply unit is disclosed. An exemplary gas supply unit includes an upper plate provided with a plurality of injection holes; and a divider plate constructed and arranged against the upper plate to guide a flow of gas from the injection holes; wherein one of the plurality of injection holes is a center injection hole and the other than said one of the plurality of injection holes are arranged concentrically around the center injection hole as outer injection holes; and wherein the divider plate is provided with a center through hole fluidly communicating with the center injection hole and is provided with a plurality of protrusions extending towards the upper plate thereby creating a plurality of zones, each of the zones fluidly communicating with one of the outer injection holes.

Abstract: A shower plate is adapted to be attached to the showerhead and includes a front surface adapted to face the susceptor; and a rear surface opposite to the front surface. The shower plate has multiple apertures each extending from the rear surface to the front surface for passing gas therethrough in this direction, and the shower plate has at least one quadrant section defined by radii, wherein the one quadrant section has an opening ratio of a total volume of openings of all the apertures distributed in the section to a total volume of the one quadrant section, which opening ratio is substantially smaller than an opening ratio of another quadrant section of the shower plate.

Abstract: A shower plate is adapted to be attached to the showerhead and includes a front surface adapted to face the susceptor; and a rear surface opposite to the front surface. The shower plate has multiple apertures each extending from the rear surface to the front surface for passing gas therethrough in this direction, and the shower plate has at least one quadrant section defined by radii, wherein the one quadrant section has an opening ratio of a total volume of openings of all the apertures distributed in the section to a total volume of the one quadrant section, which opening ratio is substantially smaller than an opening ratio of another quadrant section of the shower plate.

Abstract: A wafer lift pin structure for lifting a semiconductor wafer includes: a through-hole penetrating through a susceptor; an upper guide fixedly fitted inside the through-hole, a lift pin constituted by an upper part, a middle part, and a lower part and inserted in the upper guide; and a lower guide attached to the underside surface of the susceptor, wherein the lift pin is suspended from the lower guide at the middle part of the lift pin at the lower position. The middle part has a diameter greater than that of the upper part and that of the lower part, and has a weight heavier than that of the upper part and that of the lower part.