Abstract: Disclosed is a purification method for removing a metal component from a fluorine compound gas containing hydrogen fluoride and a metal component. This method includes a removing step for removing the hydrogen fluoride and the metal component therefrom by bringing the fluorine compound gas into contact with a solid metal fluoride to adsorb the hydrogen fluoride and the metal component on the metal fluoride. It is preferable for the fluorine compound gas to contain at least one kind selected from the group consisting of CIF, CIF3, IF5, IF7, BrF3, BrF5, NF3, WF6, SiF4, CF4, SF6 and BF3. It is also preferable for the metal fluoride to be an alkali metal fluoride or an alkali earth metal fluoride. Surprisingly, the presence of hydrogen fluoride in a fluorine compound gas makes it possible to remove a metal component therefrom as an impurity as a result of adsorption thereof by a metal fluoride.

Abstract: Disclosed is a purification method for removing a metal component from a fluorine compound gas containing hydrogen fluoride and a metal component. This method includes a removing step for removing the hydrogen fluoride and the metal component therefrom by bringing the fluorine compound gas into contact with a solid metal fluoride to adsorb the hydrogen fluoride and the metal component on the metal fluoride. It is preferable for the fluorine compound gas to contain at least one kind selected from the group consisting of CIF, CIF3, IF5, IF7, BrF3, BrF5, NF3, WF6, SiF4, CF4, SF6 and BF3. It is also preferable for the metal fluoride to be an alkali metal fluoride or an alkali earth metal fluoride. Surprisingly, the presence of hydrogen fluoride in a fluorine compound gas makes it possible to remove a metal component therefrom as an impurity as a result of adsorption thereof by a metal fluoride.

Abstract: Disclosed is a purification method for removing a metal component from a fluorine gas containing hydrogen fluoride and a metal component. This method includes a removing step for removing the hydrogen fluoride and the metal component therefrom by bringing the fluorine gas into contact with a solid metal fluoride to adsorb the hydrogen fluoride and the metal component on the metal fluoride. The content of the hydrogen fluoride in the fluorine gas before the removing step is 50 volume ppm to 1 volume %, relative to the total volume of the fluorine gas, the hydrogen fluoride and the metal component. The metal fluoride is preferably an alkali metal fluoride or an alkali earth metal fluoride. Surprisingly, the presence of hydrogen fluoride in a fluorine gas makes it possible to remove a metal component therefrom as an impurity as a result of adsorption thereof by a metal fluoride.