Patents by Inventor Kohei Sanui

Kohei Sanui has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4873292
    Abstract: An antithrombogenic synthetic polymer has repeat structural units represented by the following structural formula consisting of portions I and II: ##STR1## a microdomain structure composed of crystalline phases and amorphous phases, each phase having an average size of 5 to 10 nm, and a molecular weight in the range of about 10,000 to about 300,000. The polymer exhibits little adhesion of blood platelets thereto, an excellent antithrombogenic property and a sufficient mechanical strength.
    Type: Grant
    Filed: February 9, 1988
    Date of Patent: October 10, 1989
    Assignee: Research Development Corporation of Japan
    Inventors: Naoya Ogata, Kohei Sanui, Nobuhiko Yui, Kazunori Kataoka, Teruo Okano, Yasuhisa Sakurai
  • Patent number: 4687831
    Abstract: Antithrombogenic synthetic elastomer having repeat units comprising portion I which is a soft segment unit containing a polyether and portion II which is a hard segment unit: ##STR1## R is a straight-chain or branched-chain alkylene group containing 2 to 4 carbon atoms, R' is amide a urethane, an urea, n ranges up to 180, m is an integer of 1 to 20, l is an integer of 1 to 10, said polymer having a microdomain structure composed of soft and hard segments, the domains of which have an average size of 10 to 20 nm, and a molecular weight of about 80,000 to about 500,000.The polymer shows little adhesion of blood platelets thereto, little deformation of adhering blood platelets and an excellent antithrombogenic property. This polymer has excellent mechanical properties as an elastomer.
    Type: Grant
    Filed: April 16, 1986
    Date of Patent: August 18, 1987
    Assignee: Research Development Corp. of Japan
    Inventors: Naoya Ogata, Kohei Sanui, Nobuhiko Yui, Kazuhiko Nojima, Kazunori Kataoka, Teruo Okano, Yasuhisa Sakurai
  • Patent number: 4556619
    Abstract: An acetalized polyvinyl alcohol having a molecular weight of 10,000 to 1,000,000 represented by the formula: ##STR1## wherein: R.sup.1 represents a halogen-containing residue of an aldehyde or a ketone; R.sup.2 represents a hydrogen atom, which may partially be substituted with an acetyl group; R.sup.3 represents naught or a monomeric unit copolymerizable with vinyl acetate; and l, m, n are integers indicating polymerization degrees, has excellent characteristics such as high sensitivity, high resolving power and excellent dry etching resistance and is suitable as a negative-type resist in ionizing radiation lithography.
    Type: Grant
    Filed: October 5, 1982
    Date of Patent: December 3, 1985
    Assignee: Dai Nippon Insatsu Kabushiki Kaisha
    Inventors: Naoya Ogata, Kohei Sanui, Chiaki Azuma, Hozumi Tanaka, Kiyoshi Oguchi, Yoichi Takahashi, Tomihiro Nakada