Patents by Inventor Kohji Hattori

Kohji Hattori has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11840477
    Abstract: The present disclosure provides a novel glass composition that has a low permittivity and is suitable for mass production. A glass composition provided satisfies, in wt %, for example, 40?SiO2?60, 25?B2O3?45, 0<Al2O3?18, 0<R2O?5, and 0?RO?12, and satisfies at least one of: i) SiO2+B2O3?80 and SiO2+B2O3+Al2O3?99.9; and ii) SiO2+B2O3?78, SiO2+B2O3+Al2O3?99.9, and 0<RO<10. Another glass composition provided includes SiO2, B2O3, Al2O3, R2O, and 3<RO<8 at the same contents as the above, and satisfies SiO2+B2O3?75 and SiO2+B2O3+Al2O3<97, where R2O=Li2O+Na2O+K2O and RO=MgO+CaO+SrO.
    Type: Grant
    Filed: August 3, 2022
    Date of Patent: December 12, 2023
    Assignees: NIPPON SHEET GLASS COMPANY, LIMITED, UNITIKA LTD., UNITIKA GLASS FIBER CO., LTD.
    Inventors: Aya Nakamura, Hidetoshi Fukuchi, Junji Kurachi, Riku Sawai, Takaharu Miyazaki, Yoshito Nawa, Kohji Hattori
  • Patent number: 11773009
    Abstract: The present disclosure provides a novel glass composition that has a low permittivity and is suitable for mass production. A glass composition provided satisfies, in wt %, for example, 40?SiO2?60, 25?B2O3?45, 0<Al2O3?18, 0<R2O?5, and 0?RO?12, and satisfies at least one of: i) SiO2+B2O3?80 and SiO2+B2O3+Al2O3?99.9; and ii) SiO2+B2O3?78, SiO2+B2O3+Al2O3?99.9, and 0<RO<10. Another glass composition provided includes SiO2, B2O3, Al2O3, R2O, and 3<RO<8 at the same contents as the above, and satisfies SiO2+B2O3?75 and SiO2+B2O3+Al2O3<97, where R2O?Li2O+Na2O+K2O and RO?MgO+CaO+SrO.
    Type: Grant
    Filed: August 3, 2022
    Date of Patent: October 3, 2023
    Assignees: NIPPON SHEET GLASS COMPANY, LIMITED, UNITIKA LTD., UNITIKA GLASS FIBER CO., LTD.
    Inventors: Aya Nakamura, Hidetoshi Fukuchi, Junji Kurachi, Riku Sawai, Takaharu Miyazaki, Yoshito Nawa, Kohji Hattori
  • Publication number: 20220402811
    Abstract: The present disclosure provides a novel glass composition that has a low permittivity and is suitable for mass production. A glass composition provided satisfies, in wt %, for example, 40?SiO2?60, 25?B2O3?45, 0<Al2O3?18, 0<R2O?5, and 0?RO?12, and satisfies at least one of: i) SiO2+B2O3?80 and SiO2+B2O3+Al2O3?99.9; and ii) SiO2+B2O3?78, SiO2+B2O3+Al2O3?99.9, and 0<RO<10. Another glass composition provided includes SiO2, B2O3, Al2O3, R2O, and 3<RO<8 at the same contents as the above, and satisfies SiO2+B2O3?75 and SiO2+B2O3+Al2O3<97, where R2O=Li2O+Na2O+K2O and RO=MgO+CaO+SrO.
    Type: Application
    Filed: August 3, 2022
    Publication date: December 22, 2022
    Inventors: Aya NAKAMURA, Hidetoshi FUKUCHI, Junji KURACHI, Riku SAWAI, Takaharu MIYAZAKI, Yoshito NAWA, Kohji HATTORI
  • Publication number: 20220371945
    Abstract: The present disclosure provides a novel glass composition that has a low permittivity and is suitable for mass production. A glass composition provided satisfies, in wt %, for example, 40?SiO2?60, 25?B2O3?45, 0<Al2O3?18, 0<R2O?5, and 0?RO?12, and satisfies at least one of: i) SiO2+B2O3?80 and SiO2+B2O3+Al2O3?99.9; and ii) SiO2+B2O3?78, SiO2+B2O3+Al2O3?99.9, and 0<RO<10. Another glass composition provided includes SiO2, B2O3, Al2O3, R2O, and 3<RO<8 at the same contents as the above, and satisfies SiO2+B2O3?75 and SiO2+B2O3+Al2O3<97, where R2O=Li2O+Na2O+K2O and RO=MgO+CaO+SrO.
    Type: Application
    Filed: August 3, 2022
    Publication date: November 24, 2022
    Inventors: Aya NAKAMURA, Hidetoshi FUKUCHI, Junji KURACHI, Riku SAWAI, Takaharu MIYAZAKI, Yoshito NAWA, Kohji HATTORI
  • Publication number: 20220324751
    Abstract: The present disclosure provides a novel glass composition that has a low permittivity and is suitable for mass production. A glass composition provided satisfies, in wt %, for example, 40?SiO2?60, 25?B2O3?45, 0?Al2O3?18, 0<R2O?5, and 0?RO?12, and satisfies at least one of: i) SiO2+B2O3?80 and SiO2+B2O3+Al2O3?99.9; and ii) SiO2+B2O3?78, SiO2+B2O3+Al2O3?99.9, and 0<RO<10. Another glass composition provided includes SiO2, B2O3, Al2O3, R2O, and 3<RO<8 at the same contents as the above, and satisfies SiO2+B2O3?75 and SiO2+B2O3+Al2O3<97, where R2O?Li2O+Na2O+K2O and RO?MgO+CaO+SrO.
    Type: Application
    Filed: June 19, 2020
    Publication date: October 13, 2022
    Inventors: Aya NAKAMURA, Hidetoshi FUKUCHI, Junji KURACHI, Riku SAWAI, Takaharu MIYAZAKI, Yoshito NAWA, Kohji HATTORI
  • Patent number: 8083943
    Abstract: A filtration device is provided having a large number of filters, each comprising a filter element and a casing. The device includes filter strings constructed so that a plurality of filters are connected in a row by header tubes, at least two rows of filter strings are further connected in parallel by a filtrate recovery collecting tube, and the filtrate recovery collecting tube is placed at a higher position than the filtrate recovery header tubes.
    Type: Grant
    Filed: December 14, 2007
    Date of Patent: December 27, 2011
    Assignee: NGK Insulators, Ltd.
    Inventors: Kiyotaka Sugiura, Kohji Hattori, Hiroyuki Oyachi
  • Publication number: 20080110818
    Abstract: A filtration device 50 which has a large number of filters 52 each comprising a filter element and a casing, and has such a structure that filter strings 82 are constructed in such a manner that a plurality of filters 52 are connected in a row by header tubes 58 such as unfiltered liquid feeding header tube 60, filtrate recovery header tube 62 and unfiltered liquid recovery header tube 64, and at least two rows of filter strings 82 are further connected in parallel by a filtrate recovery collecting tube 84, and furthermore the filtrate recovery collecting tube 84 is placed at a higher position than the filtrate recovery header tubes 62.
    Type: Application
    Filed: December 14, 2007
    Publication date: May 15, 2008
    Applicant: NGK Insulators, Ltd.
    Inventors: Kiyotaka Sugiura, Kohji Hattori, Hiroyuki Oyachi
  • Patent number: 5608056
    Abstract: A compound of the formula: ##STR1## in which R.sup.1 is carboxy or protected carboxy,R.sup.2 is 1-hydroxyethyl,R.sup.3 is methyl,R.sup.4 is optionally substituted pyridyl(lower)alkyl, optionally N-substituted 2-oxopiperazin-1-yl-(lower)alkyl, optionally substituted imidazol-1-yl(C.sub.2 -C.sub.3)alkyl, optionally substituted imidazol-5-yl-(lower)alkyl, optionally substituted imidazol-2-yl-(lower)alkyl, optionally substituted pyrazol-4-(or 5-)yl(lower)alkyl, optionally substituted pyrazol-1-ylethyl, optionally substituted triazolyl(lower)alkyl, optionally substituted pyrimidinyl(lower)alkyl, optionally substituted dihydropyrimidinyl(lower)alkyl, or optionally substituted (2,3-dihydroimidazo-[1,2-b]pyrazol-1-yl)ethyl, andR.sup.5 is hydrogen or imino-protective group,and pharmaceutically acceptable salts thereof, which have antimicrobial activity.
    Type: Grant
    Filed: September 21, 1994
    Date of Patent: March 4, 1997
    Assignee: Fujisawa Pharmaceutical Co., Ltd.
    Inventors: Masayoshi Murata, Hideo Tsutsumi, Keiji Matsuda, Kohji Hattori, Takashi Nakajima
  • Patent number: 5420122
    Abstract: Novel 3-pyrrolidinylthio-1-azabicyclo[3.2.0]hept-2-ene-2-carboxylic acid compounds and processes for their preparation are disclosed. These novel compounds have antimicrobial activity, and are useful as a medicament in the treatment of infectious diseases in human beings and animals.
    Type: Grant
    Filed: April 14, 1992
    Date of Patent: May 30, 1995
    Assignee: Fujisawa Pharmaceutical Co., Ltd.
    Inventors: Masayoshi Murata, Hideo Tsutsumi, Keiji Matsuda, Kohji Hattori, Takashi Nakajima
  • Patent number: 5286721
    Abstract: 1-Azabicyclo[3.2.0]hept-2-ene-2-carboxylic acid compounds of the formula: ##STR1## in which R.sup.1 is carboxy, COO.sup.-- or protected carboxy,R.sup.2 is hydroxy(lower)alkyl or protected hydroxy(lower)alkyl,R.sup.8 is hydrogen or lower alkyl,Z is a group of the formula: ##STR2## wherein R.sup.3 is hydrogen; lower alkyl or lower alkenyl, each of which is optionally substituted by the group consisting of lower alkoxy, carbamoyl, hydroxy, halogen, mono(or di)(lower)alkylcarbamoyl, mono(or di)(lower)alkenylcarbamoyl, mono(or bis)[hydroxy(lower)alkyl]carbamoyl, optionally substituted cyclic-aminocarbonyl, acylamino, ureido, optionally substituted heterocyclic-carbonylamino, carbamoyloxy, mono(or di)(lower)alkylcarbamoyloxy, lower alkylthio, halo(lower)alkylthio, optionally substituted heterocyclicthio, optionally substituted heterocyclic group, optionally substituted aryl, and acyl;R.sup.9 is hydrogen or lower alkyl, andR.sup.
    Type: Grant
    Filed: June 12, 1992
    Date of Patent: February 15, 1994
    Assignee: Fujisawa Pharmaceutical Co., Ltd.
    Inventors: Masayoshi Murata, Toshiyuki Chiba, Hideo Tsutsumi, Kohji Hattori, Satoru Kuroda, Hiroaki Ohtake, Fumiyuki Shirai
  • Patent number: 5202437
    Abstract: The present invention concerns intermediates in the preparation of novel 3-pyrrolidinylthio-1-azabicyclo[3.2.0]hept-2-ene-2-carboxylic acid compounds and pharmaceutically acceptable salts thereof. The novel 3-pyrrolidinylthio-1-azabicyclo[3.2.0]hept-2-ene-2-carboxylic acid compounds and pharmaceutically acceptable salts thereof show antimicrobial activity.
    Type: Grant
    Filed: March 6, 1990
    Date of Patent: April 13, 1993
    Assignee: Fujisawa Pharmaceutical Company, Ltd.
    Inventors: Masayoshi Murata, Hideo Tsutsumi, Keiji Matsuda, Kohji Hattori, Takashi Nakajima
  • Patent number: 5194624
    Abstract: The invention relates to compounds of the formula: ##STR1## in which R.sup.4 is an unsaturated, 5 or 6-membered heteromonocyclic group,R.sup.5 is hydrogen, lower alkanimidoyl or imino-protective group,R.sup.7 is ar(lower)alkyl or acyl derived from a carboxylic, carbonic, sulfonic or carbamic acid, andA is lower alkylene,or a salt thereof, useful as intermediates in the preparation of antimicrobial agents.
    Type: Grant
    Filed: May 9, 1990
    Date of Patent: March 16, 1993
    Assignee: Fujisawa Pharmaceutical Co., Ltd.
    Inventors: Masayoshi Murata, Hideo Tsutumi, Keiji Matsuda, Kohji Hattori, Takashi Nakajima
  • Patent number: 5138064
    Abstract: Novel 3-pyrrolidinylthio-1-azabiycyclo[3.2.0]hept-2-ene-2-carboxylic acid compounds and pharmaceutically acceptable salts thereof have antimicrobial activity and are useful as medicaments in the treatment of infectious diseases caused by pathogenic microorganisms.
    Type: Grant
    Filed: February 6, 1990
    Date of Patent: August 11, 1992
    Assignee: Fujisawa Pharmaceutical Company, Ltd.
    Inventors: Masayoshi Murata, Hideo Tsutsumi, Keiji Matsuda, Kohji Hattori, Takashi Nakajima
  • Patent number: 5102877
    Abstract: 1-Azabicyclo[3.2.0]hept-2-ene-2-carboxyic acids having antimicrobial activity have been prepared.
    Type: Grant
    Filed: April 12, 1990
    Date of Patent: April 7, 1992
    Assignee: Fujisawa Pharmaceutical Co., Ltd.
    Inventors: Masayoshi Murata, Toshiyuki Chiba, Hideo Tsutsumi, Kohji Hattori, Satoru Kuroda, Hiroaki Ohtake, Fumiyuki Shirai
  • Patent number: 4983596
    Abstract: The invention relates to a compound of antimicrobial activity, of the formula: ##STR1## in which R.sup.1 is carboxy or protected carboxy,R.sup.2 is hydroxy(lower)alkyl or protected hydroxy(lower)alkyl,R.sup.3 is hydrogen or lower alkyl,R.sup.4 is 2-fluoroethyl, 2-chloroethyl, 2-fluoropropyl or 4-fluorobutyl,R.sup.5 is hydrogen, lower alkanimidoyl, unsubstituted lower cycloalkenyl or substituted by a group consisting of oxo and amino, or imino-protective group, andA is lower alkylene, or pharmaceutically acceptable salts thereof.
    Type: Grant
    Filed: May 4, 1989
    Date of Patent: January 8, 1991
    Assignee: Fujisawa Pharmaceutical Company, Ltd.
    Inventors: Masayoshi Murata, Hideo Tsutsumi, Keiji Matsuda, Kohji Hattori, Takashi Nakajima
  • Patent number: 4963544
    Abstract: 3-Pyrrolidinylthio-1-azabicyclo[3.2.0]-hept-2-ene carboxylic acids substituted on the pyrrolidine by unsaturated heterocyclyl have been prepared.
    Type: Grant
    Filed: May 5, 1989
    Date of Patent: October 16, 1990
    Assignee: Fujisawa Pharmaceutical Company, Ltd.
    Inventors: Masayoshi Murata, Hideo Tsutsumi, Keiji Matsuda, Kohji Hattori, Takashi Nakajima
  • Patent number: 4963543
    Abstract: 3-pyrrolidinylthio-1-azabicyclo[3.2.0]hepten-2-ene-2-carboxylic acid derivatives are prepared.
    Type: Grant
    Filed: November 17, 1987
    Date of Patent: October 16, 1990
    Assignee: Fujisawa Pharmaceutical Co., Ltd.
    Inventors: Masayoshi Murata, Hideo Tsutsumi, Keiji Matsuda, Kohji Hattori, Takashi Nakajima
  • Patent number: 4925838
    Abstract: 3-Pyrrolidinythio-1-azabicyclo [3.2.0]hept-2-ene-2-carboxylic acid compounds which have antimicrobial activity have been prepared.
    Type: Grant
    Filed: March 14, 1989
    Date of Patent: May 15, 1990
    Assignee: Fujisawa Pharmaceutical Company, Ltd.
    Inventors: Masayoshi Murata, Hideo Tsutsumi, Keiji Matsuda, Kohji Hattori, Takashi Nakajima
  • Patent number: 4921852
    Abstract: 3-Pyrrolidinylthio-1-azabicyclo [320] hept-2-ene-2-carboxylic acid anti-microbiotic compounds are prepared.
    Type: Grant
    Filed: November 24, 1987
    Date of Patent: May 1, 1990
    Assignee: Fujisawa Pharmaceutical Company, Ltd.
    Inventors: Masayoshi Murata, Hideo Tsutsumi, Keiji Matsuda, Kohji Hattori, Takashi Nakajima
  • Patent number: 4822787
    Abstract: This invention consists of 3-pyrrolidinylthio-1-azabicyclo[3.2.0]hept-2-ene-2-carboxylic acid compounds and their use as antimicrobial agents in the treatment of infectious diseases.
    Type: Grant
    Filed: November 5, 1987
    Date of Patent: April 18, 1989
    Assignee: Fujisawa Pharmaceutical Co., Ltd.
    Inventors: Masayoshi Murata, Hideo Tsutsumi, Keiji Matsuda, Kohji Hattori, Takashi Nakajima