Patents by Inventor Kohji Hattori
Kohji Hattori has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11840477Abstract: The present disclosure provides a novel glass composition that has a low permittivity and is suitable for mass production. A glass composition provided satisfies, in wt %, for example, 40?SiO2?60, 25?B2O3?45, 0<Al2O3?18, 0<R2O?5, and 0?RO?12, and satisfies at least one of: i) SiO2+B2O3?80 and SiO2+B2O3+Al2O3?99.9; and ii) SiO2+B2O3?78, SiO2+B2O3+Al2O3?99.9, and 0<RO<10. Another glass composition provided includes SiO2, B2O3, Al2O3, R2O, and 3<RO<8 at the same contents as the above, and satisfies SiO2+B2O3?75 and SiO2+B2O3+Al2O3<97, where R2O=Li2O+Na2O+K2O and RO=MgO+CaO+SrO.Type: GrantFiled: August 3, 2022Date of Patent: December 12, 2023Assignees: NIPPON SHEET GLASS COMPANY, LIMITED, UNITIKA LTD., UNITIKA GLASS FIBER CO., LTD.Inventors: Aya Nakamura, Hidetoshi Fukuchi, Junji Kurachi, Riku Sawai, Takaharu Miyazaki, Yoshito Nawa, Kohji Hattori
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Patent number: 11773009Abstract: The present disclosure provides a novel glass composition that has a low permittivity and is suitable for mass production. A glass composition provided satisfies, in wt %, for example, 40?SiO2?60, 25?B2O3?45, 0<Al2O3?18, 0<R2O?5, and 0?RO?12, and satisfies at least one of: i) SiO2+B2O3?80 and SiO2+B2O3+Al2O3?99.9; and ii) SiO2+B2O3?78, SiO2+B2O3+Al2O3?99.9, and 0<RO<10. Another glass composition provided includes SiO2, B2O3, Al2O3, R2O, and 3<RO<8 at the same contents as the above, and satisfies SiO2+B2O3?75 and SiO2+B2O3+Al2O3<97, where R2O?Li2O+Na2O+K2O and RO?MgO+CaO+SrO.Type: GrantFiled: August 3, 2022Date of Patent: October 3, 2023Assignees: NIPPON SHEET GLASS COMPANY, LIMITED, UNITIKA LTD., UNITIKA GLASS FIBER CO., LTD.Inventors: Aya Nakamura, Hidetoshi Fukuchi, Junji Kurachi, Riku Sawai, Takaharu Miyazaki, Yoshito Nawa, Kohji Hattori
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Publication number: 20220402811Abstract: The present disclosure provides a novel glass composition that has a low permittivity and is suitable for mass production. A glass composition provided satisfies, in wt %, for example, 40?SiO2?60, 25?B2O3?45, 0<Al2O3?18, 0<R2O?5, and 0?RO?12, and satisfies at least one of: i) SiO2+B2O3?80 and SiO2+B2O3+Al2O3?99.9; and ii) SiO2+B2O3?78, SiO2+B2O3+Al2O3?99.9, and 0<RO<10. Another glass composition provided includes SiO2, B2O3, Al2O3, R2O, and 3<RO<8 at the same contents as the above, and satisfies SiO2+B2O3?75 and SiO2+B2O3+Al2O3<97, where R2O=Li2O+Na2O+K2O and RO=MgO+CaO+SrO.Type: ApplicationFiled: August 3, 2022Publication date: December 22, 2022Inventors: Aya NAKAMURA, Hidetoshi FUKUCHI, Junji KURACHI, Riku SAWAI, Takaharu MIYAZAKI, Yoshito NAWA, Kohji HATTORI
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Publication number: 20220371945Abstract: The present disclosure provides a novel glass composition that has a low permittivity and is suitable for mass production. A glass composition provided satisfies, in wt %, for example, 40?SiO2?60, 25?B2O3?45, 0<Al2O3?18, 0<R2O?5, and 0?RO?12, and satisfies at least one of: i) SiO2+B2O3?80 and SiO2+B2O3+Al2O3?99.9; and ii) SiO2+B2O3?78, SiO2+B2O3+Al2O3?99.9, and 0<RO<10. Another glass composition provided includes SiO2, B2O3, Al2O3, R2O, and 3<RO<8 at the same contents as the above, and satisfies SiO2+B2O3?75 and SiO2+B2O3+Al2O3<97, where R2O=Li2O+Na2O+K2O and RO=MgO+CaO+SrO.Type: ApplicationFiled: August 3, 2022Publication date: November 24, 2022Inventors: Aya NAKAMURA, Hidetoshi FUKUCHI, Junji KURACHI, Riku SAWAI, Takaharu MIYAZAKI, Yoshito NAWA, Kohji HATTORI
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Publication number: 20220324751Abstract: The present disclosure provides a novel glass composition that has a low permittivity and is suitable for mass production. A glass composition provided satisfies, in wt %, for example, 40?SiO2?60, 25?B2O3?45, 0?Al2O3?18, 0<R2O?5, and 0?RO?12, and satisfies at least one of: i) SiO2+B2O3?80 and SiO2+B2O3+Al2O3?99.9; and ii) SiO2+B2O3?78, SiO2+B2O3+Al2O3?99.9, and 0<RO<10. Another glass composition provided includes SiO2, B2O3, Al2O3, R2O, and 3<RO<8 at the same contents as the above, and satisfies SiO2+B2O3?75 and SiO2+B2O3+Al2O3<97, where R2O?Li2O+Na2O+K2O and RO?MgO+CaO+SrO.Type: ApplicationFiled: June 19, 2020Publication date: October 13, 2022Inventors: Aya NAKAMURA, Hidetoshi FUKUCHI, Junji KURACHI, Riku SAWAI, Takaharu MIYAZAKI, Yoshito NAWA, Kohji HATTORI
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Patent number: 8083943Abstract: A filtration device is provided having a large number of filters, each comprising a filter element and a casing. The device includes filter strings constructed so that a plurality of filters are connected in a row by header tubes, at least two rows of filter strings are further connected in parallel by a filtrate recovery collecting tube, and the filtrate recovery collecting tube is placed at a higher position than the filtrate recovery header tubes.Type: GrantFiled: December 14, 2007Date of Patent: December 27, 2011Assignee: NGK Insulators, Ltd.Inventors: Kiyotaka Sugiura, Kohji Hattori, Hiroyuki Oyachi
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Publication number: 20080110818Abstract: A filtration device 50 which has a large number of filters 52 each comprising a filter element and a casing, and has such a structure that filter strings 82 are constructed in such a manner that a plurality of filters 52 are connected in a row by header tubes 58 such as unfiltered liquid feeding header tube 60, filtrate recovery header tube 62 and unfiltered liquid recovery header tube 64, and at least two rows of filter strings 82 are further connected in parallel by a filtrate recovery collecting tube 84, and furthermore the filtrate recovery collecting tube 84 is placed at a higher position than the filtrate recovery header tubes 62.Type: ApplicationFiled: December 14, 2007Publication date: May 15, 2008Applicant: NGK Insulators, Ltd.Inventors: Kiyotaka Sugiura, Kohji Hattori, Hiroyuki Oyachi
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Patent number: 5608056Abstract: A compound of the formula: ##STR1## in which R.sup.1 is carboxy or protected carboxy,R.sup.2 is 1-hydroxyethyl,R.sup.3 is methyl,R.sup.4 is optionally substituted pyridyl(lower)alkyl, optionally N-substituted 2-oxopiperazin-1-yl-(lower)alkyl, optionally substituted imidazol-1-yl(C.sub.2 -C.sub.3)alkyl, optionally substituted imidazol-5-yl-(lower)alkyl, optionally substituted imidazol-2-yl-(lower)alkyl, optionally substituted pyrazol-4-(or 5-)yl(lower)alkyl, optionally substituted pyrazol-1-ylethyl, optionally substituted triazolyl(lower)alkyl, optionally substituted pyrimidinyl(lower)alkyl, optionally substituted dihydropyrimidinyl(lower)alkyl, or optionally substituted (2,3-dihydroimidazo-[1,2-b]pyrazol-1-yl)ethyl, andR.sup.5 is hydrogen or imino-protective group,and pharmaceutically acceptable salts thereof, which have antimicrobial activity.Type: GrantFiled: September 21, 1994Date of Patent: March 4, 1997Assignee: Fujisawa Pharmaceutical Co., Ltd.Inventors: Masayoshi Murata, Hideo Tsutsumi, Keiji Matsuda, Kohji Hattori, Takashi Nakajima
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Patent number: 5420122Abstract: Novel 3-pyrrolidinylthio-1-azabicyclo[3.2.0]hept-2-ene-2-carboxylic acid compounds and processes for their preparation are disclosed. These novel compounds have antimicrobial activity, and are useful as a medicament in the treatment of infectious diseases in human beings and animals.Type: GrantFiled: April 14, 1992Date of Patent: May 30, 1995Assignee: Fujisawa Pharmaceutical Co., Ltd.Inventors: Masayoshi Murata, Hideo Tsutsumi, Keiji Matsuda, Kohji Hattori, Takashi Nakajima
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Patent number: 5286721Abstract: 1-Azabicyclo[3.2.0]hept-2-ene-2-carboxylic acid compounds of the formula: ##STR1## in which R.sup.1 is carboxy, COO.sup.-- or protected carboxy,R.sup.2 is hydroxy(lower)alkyl or protected hydroxy(lower)alkyl,R.sup.8 is hydrogen or lower alkyl,Z is a group of the formula: ##STR2## wherein R.sup.3 is hydrogen; lower alkyl or lower alkenyl, each of which is optionally substituted by the group consisting of lower alkoxy, carbamoyl, hydroxy, halogen, mono(or di)(lower)alkylcarbamoyl, mono(or di)(lower)alkenylcarbamoyl, mono(or bis)[hydroxy(lower)alkyl]carbamoyl, optionally substituted cyclic-aminocarbonyl, acylamino, ureido, optionally substituted heterocyclic-carbonylamino, carbamoyloxy, mono(or di)(lower)alkylcarbamoyloxy, lower alkylthio, halo(lower)alkylthio, optionally substituted heterocyclicthio, optionally substituted heterocyclic group, optionally substituted aryl, and acyl;R.sup.9 is hydrogen or lower alkyl, andR.sup.Type: GrantFiled: June 12, 1992Date of Patent: February 15, 1994Assignee: Fujisawa Pharmaceutical Co., Ltd.Inventors: Masayoshi Murata, Toshiyuki Chiba, Hideo Tsutsumi, Kohji Hattori, Satoru Kuroda, Hiroaki Ohtake, Fumiyuki Shirai
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Patent number: 5202437Abstract: The present invention concerns intermediates in the preparation of novel 3-pyrrolidinylthio-1-azabicyclo[3.2.0]hept-2-ene-2-carboxylic acid compounds and pharmaceutically acceptable salts thereof. The novel 3-pyrrolidinylthio-1-azabicyclo[3.2.0]hept-2-ene-2-carboxylic acid compounds and pharmaceutically acceptable salts thereof show antimicrobial activity.Type: GrantFiled: March 6, 1990Date of Patent: April 13, 1993Assignee: Fujisawa Pharmaceutical Company, Ltd.Inventors: Masayoshi Murata, Hideo Tsutsumi, Keiji Matsuda, Kohji Hattori, Takashi Nakajima
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Patent number: 5194624Abstract: The invention relates to compounds of the formula: ##STR1## in which R.sup.4 is an unsaturated, 5 or 6-membered heteromonocyclic group,R.sup.5 is hydrogen, lower alkanimidoyl or imino-protective group,R.sup.7 is ar(lower)alkyl or acyl derived from a carboxylic, carbonic, sulfonic or carbamic acid, andA is lower alkylene,or a salt thereof, useful as intermediates in the preparation of antimicrobial agents.Type: GrantFiled: May 9, 1990Date of Patent: March 16, 1993Assignee: Fujisawa Pharmaceutical Co., Ltd.Inventors: Masayoshi Murata, Hideo Tsutumi, Keiji Matsuda, Kohji Hattori, Takashi Nakajima
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Patent number: 5138064Abstract: Novel 3-pyrrolidinylthio-1-azabiycyclo[3.2.0]hept-2-ene-2-carboxylic acid compounds and pharmaceutically acceptable salts thereof have antimicrobial activity and are useful as medicaments in the treatment of infectious diseases caused by pathogenic microorganisms.Type: GrantFiled: February 6, 1990Date of Patent: August 11, 1992Assignee: Fujisawa Pharmaceutical Company, Ltd.Inventors: Masayoshi Murata, Hideo Tsutsumi, Keiji Matsuda, Kohji Hattori, Takashi Nakajima
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Patent number: 5102877Abstract: 1-Azabicyclo[3.2.0]hept-2-ene-2-carboxyic acids having antimicrobial activity have been prepared.Type: GrantFiled: April 12, 1990Date of Patent: April 7, 1992Assignee: Fujisawa Pharmaceutical Co., Ltd.Inventors: Masayoshi Murata, Toshiyuki Chiba, Hideo Tsutsumi, Kohji Hattori, Satoru Kuroda, Hiroaki Ohtake, Fumiyuki Shirai
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Patent number: 4983596Abstract: The invention relates to a compound of antimicrobial activity, of the formula: ##STR1## in which R.sup.1 is carboxy or protected carboxy,R.sup.2 is hydroxy(lower)alkyl or protected hydroxy(lower)alkyl,R.sup.3 is hydrogen or lower alkyl,R.sup.4 is 2-fluoroethyl, 2-chloroethyl, 2-fluoropropyl or 4-fluorobutyl,R.sup.5 is hydrogen, lower alkanimidoyl, unsubstituted lower cycloalkenyl or substituted by a group consisting of oxo and amino, or imino-protective group, andA is lower alkylene, or pharmaceutically acceptable salts thereof.Type: GrantFiled: May 4, 1989Date of Patent: January 8, 1991Assignee: Fujisawa Pharmaceutical Company, Ltd.Inventors: Masayoshi Murata, Hideo Tsutsumi, Keiji Matsuda, Kohji Hattori, Takashi Nakajima
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Patent number: 4963544Abstract: 3-Pyrrolidinylthio-1-azabicyclo[3.2.0]-hept-2-ene carboxylic acids substituted on the pyrrolidine by unsaturated heterocyclyl have been prepared.Type: GrantFiled: May 5, 1989Date of Patent: October 16, 1990Assignee: Fujisawa Pharmaceutical Company, Ltd.Inventors: Masayoshi Murata, Hideo Tsutsumi, Keiji Matsuda, Kohji Hattori, Takashi Nakajima
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Patent number: 4963543Abstract: 3-pyrrolidinylthio-1-azabicyclo[3.2.0]hepten-2-ene-2-carboxylic acid derivatives are prepared.Type: GrantFiled: November 17, 1987Date of Patent: October 16, 1990Assignee: Fujisawa Pharmaceutical Co., Ltd.Inventors: Masayoshi Murata, Hideo Tsutsumi, Keiji Matsuda, Kohji Hattori, Takashi Nakajima
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Patent number: 4925838Abstract: 3-Pyrrolidinythio-1-azabicyclo [3.2.0]hept-2-ene-2-carboxylic acid compounds which have antimicrobial activity have been prepared.Type: GrantFiled: March 14, 1989Date of Patent: May 15, 1990Assignee: Fujisawa Pharmaceutical Company, Ltd.Inventors: Masayoshi Murata, Hideo Tsutsumi, Keiji Matsuda, Kohji Hattori, Takashi Nakajima
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Patent number: 4921852Abstract: 3-Pyrrolidinylthio-1-azabicyclo [320] hept-2-ene-2-carboxylic acid anti-microbiotic compounds are prepared.Type: GrantFiled: November 24, 1987Date of Patent: May 1, 1990Assignee: Fujisawa Pharmaceutical Company, Ltd.Inventors: Masayoshi Murata, Hideo Tsutsumi, Keiji Matsuda, Kohji Hattori, Takashi Nakajima
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Patent number: 4822787Abstract: This invention consists of 3-pyrrolidinylthio-1-azabicyclo[3.2.0]hept-2-ene-2-carboxylic acid compounds and their use as antimicrobial agents in the treatment of infectious diseases.Type: GrantFiled: November 5, 1987Date of Patent: April 18, 1989Assignee: Fujisawa Pharmaceutical Co., Ltd.Inventors: Masayoshi Murata, Hideo Tsutsumi, Keiji Matsuda, Kohji Hattori, Takashi Nakajima