Patents by Inventor Kohji Oda

Kohji Oda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mask structure having phase shifting pattern suitable for forming fine pattern on photosensitive film and method of manufacturing solid-state devices using such mask structure
    Patent number: 5604059
    Abstract: A mask structure has two (or more) groups of device patterns formed on one transparent support plate. Each of the device patterns has a transparent partial pattern. One or both of the groups of device patterns are provided with phase shifting patterns for improvement of the resolution in the lithography. The transparent partial pattern in each of the device patterns in each of the device pattern groups is determined such that each of the transparent partial patterns held by one of the device pattern groups is adapted for combination with one transparent partial pattern held by the other device pattern group by two or more times of transmission of an exposure beam through the mask structure. Manufacturing of solid-state devices is possible by use of the mask structure, in which exposure of a photo-sensitive film on a substrate to an exposure beam through the mask structure is repeated two or more times with a relative position between the mask structure and the substrate being changed.
    Type: Grant
    Filed: August 15, 1994
    Date of Patent: February 18, 1997
    Assignee: Hitachi, Ltd.
    Inventors: Ryo Imura, Yoshinori Hoshina, Kengo Asai, Mitsutaka Hikita, Atsushi Isobe, Ryo Suzuki, Kohji Oda, Kazuyuki Sakiyama