Patents by Inventor Koichi Asami

Koichi Asami has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8686383
    Abstract: In order to enable high accuracy positioning and strong pressing of a substrate, the present invention provides a substrate holding apparatus including: a rotating bed having an inclined surface supporting a lower side of an outer circumferential side surface of the substrate, which bed rotates on a normal line of the substrate as the rotation axis together with the substrate; a position restriction unit rotating together with the rotating bed and restricting the substrate in a predetermined position on the rotating bed by pressing a plurality of points on the circumference on an upper side of the outer circumferential side surface of the substrate prior to the rotation; and a pressing unit rotating together with the rotating bed and pressing the substrate against the inclined surface by pressing a plurality of points on the upper side of the outer circumferential side surface of the substrate during the rotation.
    Type: Grant
    Filed: April 24, 2012
    Date of Patent: April 1, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kazuhiro Zama, Koichi Asami, Yusuke Miyazaki
  • Patent number: 8472016
    Abstract: A laser beam oscillated from a laser source is folded in its path by first and second plane mirrors and enters a beam expander. The surface of each plane mirror is deteriorated with illumination by the laser beam and the reflectance is reduced. To avoid a light quantity of the laser beam entering the beam expander from being reduced below a reference value, when the laser beam is illuminated over a certain time, a position on each of the first and second plane mirrors at which the laser beam is illuminated is changed by a structure for rotating and/or translating a reflecting surface of each plane mirror on a plane, which includes the plane mirror, while an optical axis is kept same. Thus, the useful life of each plane mirror can be prolonged without displacing the optical axis.
    Type: Grant
    Filed: March 28, 2012
    Date of Patent: June 25, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yuuichiro Iijima, Koichi Asami, Yusuke Miyazaki, Kazuhiro Zama, Rieko Hachiya
  • Publication number: 20120205850
    Abstract: In order to enable high accuracy positioning and strong pressing of a substrate, the present invention provides a substrate holding apparatus including: a rotating bed having an inclined surface supporting a lower side of an outer circumferential side surface of the substrate, which bed rotates on a normal line of the substrate as the rotation axis together with the substrate; a position restriction unit rotating together with the rotating bed and restricting the substrate in a predetermined position on the rotating bed by pressing a plurality of points on the circumference on an upper side of the outer circumferential side surface of the substrate prior to the rotation; and a pressing unit rotating together with the rotating bed and pressing the substrate against the inclined surface by pressing a plurality of points on the upper side of the outer circumferential side surface of the substrate during the rotation.
    Type: Application
    Filed: April 24, 2012
    Publication date: August 16, 2012
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Kazuhiro ZAMA, Koichi Asami, Yusuke Miyazaki
  • Publication number: 20120182547
    Abstract: A laser beam oscillated from a laser source is folded in its path by first and second plane mirrors and enters a beam expander. The surface of each plane mirror is deteriorated with illumination by the laser beam and the reflectance is reduced. To avoid a light quantity of the laser beam entering the beam expander from being reduced below a reference value, when the laser beam is illuminated over a certain time, a position on each of the first and second plane mirrors at which the laser beam is illuminated is changed by a structure for rotating and/or translating a reflecting surface of each plane mirror on a plane, which includes the plane mirror, while an optical axis is kept same. Thus, the useful life of each plane mirror can be prolonged without displacing the optical axis.
    Type: Application
    Filed: March 28, 2012
    Publication date: July 19, 2012
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Noriyuki Aizawa, Hiroyuki Kawakami, Kazuhiro Zama, Kazuo Takashi, Yusuke Miyazaki, Shingo Tanaka, Yuuichiro Iijima, Masayuki Hachiya, Rieko Hachiya, Koichi Asami
  • Patent number: 8184283
    Abstract: A laser beam oscillated from a laser source is folded in its path by first and second plane mirrors and enters a beam expander. The surface of each plane mirror is deteriorated with illumination by the laser beam and the reflectance is reduced. To avoid a light quantity of the laser beam entering the beam expander from being reduced below a reference value, when the laser beam is illuminated over a certain time, a position on each of the first and second plane mirrors at which the laser beam is illuminated is changed by a structure for rotating and/or translating a reflecting surface of each plane mirror on a plane, which includes the plane mirror, while an optical axis is kept same. Thus, the useful life of each plane mirror can be prolonged without displacing the optical axis.
    Type: Grant
    Filed: May 21, 2010
    Date of Patent: May 22, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yuuichiro Iijima, Masayuki Hachiya, Rieko Hachiya, legal representative, Koichi Asami, Yusuke Miyazaki, Kazuhiro Zama
  • Patent number: 8183549
    Abstract: In order to enable high accuracy positioning and strong pressing of a substrate, the present invention provides a substrate holding apparatus including: a rotating bed having an inclined surface supporting a lower side of an outer circumferential side surface of the substrate, which bed rotates on a normal line of the substrate as the rotation axis together with the substrate; a position restriction unit rotating together with the rotating bed and restricting the substrate in a predetermined position on the rotating bed by pressing a plurality of points on the circumference on an upper side of the outer circumferential side surface of the substrate prior to the rotation; and a pressing unit rotating together with the rotating bed and pressing the substrate against the inclined surface by pressing a plurality of points on the upper side of the outer circumferential side surface of the substrate during the rotation.
    Type: Grant
    Filed: July 1, 2011
    Date of Patent: May 22, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kazuhiro Zama, Koichi Asami, Yusuke Miyazaki
  • Publication number: 20110260080
    Abstract: In order to enable high accuracy positioning and strong pressing of a substrate, the present invention provides a substrate holding apparatus including: a rotating bed having an inclined surface supporting a lower side of an outer circumferential side surface of the substrate, which bed rotates on a normal line of the substrate as the rotation axis together with the substrate; a position restriction unit rotating together with the rotating bed and restricting the substrate in a predetermined position on the rotating bed by pressing a plurality of points on the circumference on an upper side of the outer circumferential side surface of the substrate prior to the rotation; and a pressing unit rotating together with the rotating bed and pressing the substrate against the inclined surface by pressing a plurality of points on the upper side of the outer circumferential side surface of the substrate during the rotation.
    Type: Application
    Filed: July 1, 2011
    Publication date: October 27, 2011
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Kazuhiro ZAMA, Koichi Asami, Yusuke Miyazaki
  • Patent number: 7999242
    Abstract: In order to enable high accuracy positioning and strong pressing of a substrate, the present invention provides a substrate holding apparatus including: a rotating bed having an inclined surface supporting a lower side of an outer circumferential side surface of the substrate, which bed rotates on a normal line of the substrate as the rotation axis together with the substrate; a position restriction unit rotating together with the rotating bed and restricting the substrate in a predetermined position on the rotating bed by pressing a plurality of points on the circumference on an upper side of the outer circumferential side surface of the substrate prior to the rotation; and a pressing unit rotating together with the rotating bed and pressing the substrate against the inclined surface by pressing a plurality of points on the upper side of the outer circumferential side surface of the substrate during the rotation.
    Type: Grant
    Filed: April 6, 2010
    Date of Patent: August 16, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kazuhiro Zama, Koichi Asami, Yusuke Miyazaki
  • Publication number: 20100196127
    Abstract: In order to enable high accuracy positioning and strong pressing of a substrate, the present invention provides a substrate holding apparatus including: a rotating bed having an inclined surface supporting a lower side of an outer circumferential side surface of the substrate, which bed rotates on a normal line of the substrate as the rotation axis together with the substrate; a position restriction unit rotating together with the rotating bed and restricting the substrate in a predetermined position on the rotating bed by pressing a plurality of points on the circumference on an upper side of the outer circumferential side surface of the substrate prior to the rotation; and a pressing unit rotating together with the rotating bed and pressing the substrate against the inclined surface by pressing a plurality of points on the upper side of the outer circumferential side surface of the substrate during the rotation.
    Type: Application
    Filed: April 6, 2010
    Publication date: August 5, 2010
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Kazuhiro Zama, Koichi Asami, Yusuke Miyazaki
  • Patent number: 7723709
    Abstract: In order to enable high accuracy positioning and strong pressing of a substrate, the present invention provides a substrate holding apparatus including: a rotating bed having an inclined surface supporting a lower side of an outer circumferential side surface of the substrate, which bed rotates on a normal line of the substrate as the rotation axis together with the substrate; a position restriction unit rotating together with the rotating bed and restricting the substrate in a predetermined position on the rotating bed by pressing a plurality of points on the circumference on an upper side of the outer circumferential side surface of the substrate prior to the rotation; and a pressing unit rotating together with the rotating bed and pressing the substrate against the inclined surface by pressing a plurality of points on the upper side of the outer circumferential side surface of the substrate during the rotation.
    Type: Grant
    Filed: August 30, 2007
    Date of Patent: May 25, 2010
    Assignee: Hitachi High Technologies Corporation
    Inventors: Kazuhiro Zama, Koichi Asami, Yusuke Miyazaki
  • Publication number: 20080054197
    Abstract: In order to enable high accuracy positioning and strong pressing of a substrate, the present invention provides a substrate holding apparatus including: a rotating bed having an inclined surface supporting a lower side of an outer circumferential side surface of the substrate, which bed rotates on a normal line of the substrate as the rotation axis together with the substrate; a position restriction unit rotating together with the rotating bed and restricting the substrate in a predetermined position on the rotating bed by pressing a plurality of points on the circumference on an upper side of the outer circumferential side surface of the substrate prior to the rotation; and a pressing unit rotating together with the rotating bed and pressing the substrate against the inclined surface by pressing a plurality of points on the upper side of the outer circumferential side surface of the substrate during the rotation.
    Type: Application
    Filed: August 30, 2007
    Publication date: March 6, 2008
    Inventors: Kazuhiro Zama, Koichi Asami, Yusuke Miyazaki
  • Publication number: 20070211241
    Abstract: A laser beam oscillated from a laser source is folded in its path by first and second plane mirrors and enters a beam expander. The surface of each plane mirror is deteriorated with illumination by the laser beam and the reflectance is reduced. To avoid a light quantity of the laser beam entering the beam expander from being reduced below a reference value, when the laser beam is illuminated over a certain time, a position on each of the first and second plane mirrors at which the laser beam is illuminated is changed by a structure for rotating and/or translating a reflecting surface of each plane mirror on a plane, which includes the plane mirror, while an optical axis is kept same.
    Type: Application
    Filed: February 23, 2007
    Publication date: September 13, 2007
    Inventors: Noriyuki Aizawa, Hiroyuki Kawakami, Kazuhiro Zama, Yuuichiro Iijima, Kazuo Takahashi, Yusuke Miyazaki, Masayuki Hachiya, Koichi Asami, Shingo Tanaka
  • Patent number: 6238785
    Abstract: This invention relates to a thermoplastic resin film permitting excellent paper feed and discharge and excellent transfer of offset printing ink and ink adhesion even under high humidity conditions in the summertime.
    Type: Grant
    Filed: October 3, 1997
    Date of Patent: May 29, 2001
    Assignee: Oji-Yuka Synthetic Paper Co., Ltd.
    Inventors: Kazuhisa Kitamura, Koichi Asami
  • Patent number: 6001165
    Abstract: A coating composition for a recording material and a process for producing the recording material are provided, wherein the coating composition includes an aluminum alkoxide, a binder and a hydrophilic solvent.
    Type: Grant
    Filed: June 24, 1998
    Date of Patent: December 14, 1999
    Assignee: Oji-Yuka Synthetic Paper Co., Ltd.
    Inventors: Nobuhiro Shibuya, Toshiyuki Hirabe, Koichi Asami, Masahiro Satoh, Hajime Kanbara
  • Patent number: 5834098
    Abstract: A laminate comprising a thermoplastic resin film having thereon a coating layer containing (A) 100 parts by weight of an antistatic agent comprising a water-soluble quaternary nitrogen-containing polymer, (B) 10 to 600 parts by weight of a polyethyleneimine polymer selected from the group consisting of polyethyleneimine, alkyl-modified polyethyleneimine, poly(ethyleneimine-urea), and an ethyleneimine adduct of polyaminepolyamide, and (C) 25 to 1000 parts by weight of a polyalkylene ether polymer selected from the group consisting of polyethylene glycol, polypropylene glycol, an ethylene oxide-propylene oxide copolymer, and derivatives thereof, each having a molecular weight of 200 to 20,000. The laminate has excellent antistatic properties and offset printability.
    Type: Grant
    Filed: June 19, 1997
    Date of Patent: November 10, 1998
    Assignee: Oji-Yuka Synthetic Paper Co., Ltd.
    Inventors: Kazuhisa Kitamura, Koichi Asami
  • Patent number: 5667872
    Abstract: A synthetic paper with a multi-layer structure comprising a biaxially stretched film of an olefinic polymer having a melting point (the peak temperature of the DSC curve) of from 130.degree. C. to 210.degree. C. containing from 5 to 40% by weight inorganic fine powders having a mean particle size of from 0.01 to 10 .mu.m as a base material layer (A) having adhered to at least one surface thereof a uniaxially stretched layer (B) having a surface roughness of from 0.3 to 1.5 .mu.m, with the uniaxially stretched layer (B) comprising a propylene .alpha.-olefin copolymer or a high-density polyethylene having a melting point (the peak temperature of the DSC curve) of from 120.degree. C. to 160.degree. C. which is at least 5.degree. C. lower than the melting point of the olefinic polymer of the base material layer (A) and from 8 to 65% by weight inorganic fine powders having a mean particle size of from 0.01 to 5 .mu.
    Type: Grant
    Filed: February 28, 1995
    Date of Patent: September 16, 1997
    Assignee: Oji Yuka Goseishi Co., Ltd.
    Inventors: Akihiko Ohno, Atsushi Ishige, Hiroshi Koyama, Koichi Asami
  • Patent number: 5397637
    Abstract: A thermoplastic resin film having a coated layer thereon, the coating layer comprising a quaternary ammonium salt copolymer comprising (a) a structural unit represented by formula (I): ##STR1## wherein A represents --O-- or --NH--; R.sup.1 represents a hydrogen atom or a methyl group; R.sup.2 represents an alkylene group having from 2 to 4 carbon atoms or --CH.sub.2 CH(OH)--CH.sub.2 --; R.sup.3, R.sup.4, R.sup.5, and R.sup.6, which may be the same or different, each represents an alkyl group having from 1 to 3 carbon atoms; R.sup.7 represents an alkyl group having from 1 to 10 carbon atoms or an aralkyl group having from 7 to 10 carbon atoms; n represents an integer of from 1 to 3; and X represents a chlorine atom, a bromine atom or an iodine atom, (b) a structural unit represented by formula (II): ##STR2## wherein R.sup.8 represents a hydrogen atom or a methyl group; and R.sup.
    Type: Grant
    Filed: June 16, 1993
    Date of Patent: March 14, 1995
    Assignee: Oji Yuka Goseishi Co., Ltd.
    Inventors: Koichi Asami, Hironobu Amagai, Yukio Saitoh, Isao Itoh
  • Patent number: 4906526
    Abstract: A thermoplastic resin film having improved printability is described, which is formed by coating a polyolefin film with an aqueous solution containing a modified polyethylene-imine represented by the following general formula: ##STR1## where A is ##STR2## or a polyamine-polyamide residue; R.sub.1 -R.sup.4 are each independently H, an alkyl or alkenyl group having 1-24 carbon atoms, an alicyclic hydrocarbon group or a benzyl group, provided that at least one of R.sup.1 -R.sup.4 is a group other than H; m is 0-300; and n, p and q are each a number of 1-300, and drying the coated solution to form a surface coating.
    Type: Grant
    Filed: November 30, 1988
    Date of Patent: March 6, 1990
    Assignee: Oji Yuka Goseishi Co., Ltd.
    Inventors: Masayuki Inoue, Akira Okamoto, Koichi Asami, Kazuhide Hayama, Kanji Narazaki