Patents by Inventor Koichi Asami
Koichi Asami has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8686383Abstract: In order to enable high accuracy positioning and strong pressing of a substrate, the present invention provides a substrate holding apparatus including: a rotating bed having an inclined surface supporting a lower side of an outer circumferential side surface of the substrate, which bed rotates on a normal line of the substrate as the rotation axis together with the substrate; a position restriction unit rotating together with the rotating bed and restricting the substrate in a predetermined position on the rotating bed by pressing a plurality of points on the circumference on an upper side of the outer circumferential side surface of the substrate prior to the rotation; and a pressing unit rotating together with the rotating bed and pressing the substrate against the inclined surface by pressing a plurality of points on the upper side of the outer circumferential side surface of the substrate during the rotation.Type: GrantFiled: April 24, 2012Date of Patent: April 1, 2014Assignee: Hitachi High-Technologies CorporationInventors: Kazuhiro Zama, Koichi Asami, Yusuke Miyazaki
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Patent number: 8472016Abstract: A laser beam oscillated from a laser source is folded in its path by first and second plane mirrors and enters a beam expander. The surface of each plane mirror is deteriorated with illumination by the laser beam and the reflectance is reduced. To avoid a light quantity of the laser beam entering the beam expander from being reduced below a reference value, when the laser beam is illuminated over a certain time, a position on each of the first and second plane mirrors at which the laser beam is illuminated is changed by a structure for rotating and/or translating a reflecting surface of each plane mirror on a plane, which includes the plane mirror, while an optical axis is kept same. Thus, the useful life of each plane mirror can be prolonged without displacing the optical axis.Type: GrantFiled: March 28, 2012Date of Patent: June 25, 2013Assignee: Hitachi High-Technologies CorporationInventors: Yuuichiro Iijima, Koichi Asami, Yusuke Miyazaki, Kazuhiro Zama, Rieko Hachiya
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Publication number: 20120205850Abstract: In order to enable high accuracy positioning and strong pressing of a substrate, the present invention provides a substrate holding apparatus including: a rotating bed having an inclined surface supporting a lower side of an outer circumferential side surface of the substrate, which bed rotates on a normal line of the substrate as the rotation axis together with the substrate; a position restriction unit rotating together with the rotating bed and restricting the substrate in a predetermined position on the rotating bed by pressing a plurality of points on the circumference on an upper side of the outer circumferential side surface of the substrate prior to the rotation; and a pressing unit rotating together with the rotating bed and pressing the substrate against the inclined surface by pressing a plurality of points on the upper side of the outer circumferential side surface of the substrate during the rotation.Type: ApplicationFiled: April 24, 2012Publication date: August 16, 2012Applicant: Hitachi High-Technologies CorporationInventors: Kazuhiro ZAMA, Koichi Asami, Yusuke Miyazaki
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Publication number: 20120182547Abstract: A laser beam oscillated from a laser source is folded in its path by first and second plane mirrors and enters a beam expander. The surface of each plane mirror is deteriorated with illumination by the laser beam and the reflectance is reduced. To avoid a light quantity of the laser beam entering the beam expander from being reduced below a reference value, when the laser beam is illuminated over a certain time, a position on each of the first and second plane mirrors at which the laser beam is illuminated is changed by a structure for rotating and/or translating a reflecting surface of each plane mirror on a plane, which includes the plane mirror, while an optical axis is kept same. Thus, the useful life of each plane mirror can be prolonged without displacing the optical axis.Type: ApplicationFiled: March 28, 2012Publication date: July 19, 2012Applicant: Hitachi High-Technologies CorporationInventors: Noriyuki Aizawa, Hiroyuki Kawakami, Kazuhiro Zama, Kazuo Takashi, Yusuke Miyazaki, Shingo Tanaka, Yuuichiro Iijima, Masayuki Hachiya, Rieko Hachiya, Koichi Asami
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Patent number: 8184283Abstract: A laser beam oscillated from a laser source is folded in its path by first and second plane mirrors and enters a beam expander. The surface of each plane mirror is deteriorated with illumination by the laser beam and the reflectance is reduced. To avoid a light quantity of the laser beam entering the beam expander from being reduced below a reference value, when the laser beam is illuminated over a certain time, a position on each of the first and second plane mirrors at which the laser beam is illuminated is changed by a structure for rotating and/or translating a reflecting surface of each plane mirror on a plane, which includes the plane mirror, while an optical axis is kept same. Thus, the useful life of each plane mirror can be prolonged without displacing the optical axis.Type: GrantFiled: May 21, 2010Date of Patent: May 22, 2012Assignee: Hitachi High-Technologies CorporationInventors: Yuuichiro Iijima, Masayuki Hachiya, Rieko Hachiya, legal representative, Koichi Asami, Yusuke Miyazaki, Kazuhiro Zama
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Patent number: 8183549Abstract: In order to enable high accuracy positioning and strong pressing of a substrate, the present invention provides a substrate holding apparatus including: a rotating bed having an inclined surface supporting a lower side of an outer circumferential side surface of the substrate, which bed rotates on a normal line of the substrate as the rotation axis together with the substrate; a position restriction unit rotating together with the rotating bed and restricting the substrate in a predetermined position on the rotating bed by pressing a plurality of points on the circumference on an upper side of the outer circumferential side surface of the substrate prior to the rotation; and a pressing unit rotating together with the rotating bed and pressing the substrate against the inclined surface by pressing a plurality of points on the upper side of the outer circumferential side surface of the substrate during the rotation.Type: GrantFiled: July 1, 2011Date of Patent: May 22, 2012Assignee: Hitachi High-Technologies CorporationInventors: Kazuhiro Zama, Koichi Asami, Yusuke Miyazaki
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Publication number: 20110260080Abstract: In order to enable high accuracy positioning and strong pressing of a substrate, the present invention provides a substrate holding apparatus including: a rotating bed having an inclined surface supporting a lower side of an outer circumferential side surface of the substrate, which bed rotates on a normal line of the substrate as the rotation axis together with the substrate; a position restriction unit rotating together with the rotating bed and restricting the substrate in a predetermined position on the rotating bed by pressing a plurality of points on the circumference on an upper side of the outer circumferential side surface of the substrate prior to the rotation; and a pressing unit rotating together with the rotating bed and pressing the substrate against the inclined surface by pressing a plurality of points on the upper side of the outer circumferential side surface of the substrate during the rotation.Type: ApplicationFiled: July 1, 2011Publication date: October 27, 2011Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Kazuhiro ZAMA, Koichi Asami, Yusuke Miyazaki
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Patent number: 7999242Abstract: In order to enable high accuracy positioning and strong pressing of a substrate, the present invention provides a substrate holding apparatus including: a rotating bed having an inclined surface supporting a lower side of an outer circumferential side surface of the substrate, which bed rotates on a normal line of the substrate as the rotation axis together with the substrate; a position restriction unit rotating together with the rotating bed and restricting the substrate in a predetermined position on the rotating bed by pressing a plurality of points on the circumference on an upper side of the outer circumferential side surface of the substrate prior to the rotation; and a pressing unit rotating together with the rotating bed and pressing the substrate against the inclined surface by pressing a plurality of points on the upper side of the outer circumferential side surface of the substrate during the rotation.Type: GrantFiled: April 6, 2010Date of Patent: August 16, 2011Assignee: Hitachi High-Technologies CorporationInventors: Kazuhiro Zama, Koichi Asami, Yusuke Miyazaki
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Publication number: 20100196127Abstract: In order to enable high accuracy positioning and strong pressing of a substrate, the present invention provides a substrate holding apparatus including: a rotating bed having an inclined surface supporting a lower side of an outer circumferential side surface of the substrate, which bed rotates on a normal line of the substrate as the rotation axis together with the substrate; a position restriction unit rotating together with the rotating bed and restricting the substrate in a predetermined position on the rotating bed by pressing a plurality of points on the circumference on an upper side of the outer circumferential side surface of the substrate prior to the rotation; and a pressing unit rotating together with the rotating bed and pressing the substrate against the inclined surface by pressing a plurality of points on the upper side of the outer circumferential side surface of the substrate during the rotation.Type: ApplicationFiled: April 6, 2010Publication date: August 5, 2010Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Kazuhiro Zama, Koichi Asami, Yusuke Miyazaki
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Patent number: 7723709Abstract: In order to enable high accuracy positioning and strong pressing of a substrate, the present invention provides a substrate holding apparatus including: a rotating bed having an inclined surface supporting a lower side of an outer circumferential side surface of the substrate, which bed rotates on a normal line of the substrate as the rotation axis together with the substrate; a position restriction unit rotating together with the rotating bed and restricting the substrate in a predetermined position on the rotating bed by pressing a plurality of points on the circumference on an upper side of the outer circumferential side surface of the substrate prior to the rotation; and a pressing unit rotating together with the rotating bed and pressing the substrate against the inclined surface by pressing a plurality of points on the upper side of the outer circumferential side surface of the substrate during the rotation.Type: GrantFiled: August 30, 2007Date of Patent: May 25, 2010Assignee: Hitachi High Technologies CorporationInventors: Kazuhiro Zama, Koichi Asami, Yusuke Miyazaki
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Publication number: 20080054197Abstract: In order to enable high accuracy positioning and strong pressing of a substrate, the present invention provides a substrate holding apparatus including: a rotating bed having an inclined surface supporting a lower side of an outer circumferential side surface of the substrate, which bed rotates on a normal line of the substrate as the rotation axis together with the substrate; a position restriction unit rotating together with the rotating bed and restricting the substrate in a predetermined position on the rotating bed by pressing a plurality of points on the circumference on an upper side of the outer circumferential side surface of the substrate prior to the rotation; and a pressing unit rotating together with the rotating bed and pressing the substrate against the inclined surface by pressing a plurality of points on the upper side of the outer circumferential side surface of the substrate during the rotation.Type: ApplicationFiled: August 30, 2007Publication date: March 6, 2008Inventors: Kazuhiro Zama, Koichi Asami, Yusuke Miyazaki
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Publication number: 20070211241Abstract: A laser beam oscillated from a laser source is folded in its path by first and second plane mirrors and enters a beam expander. The surface of each plane mirror is deteriorated with illumination by the laser beam and the reflectance is reduced. To avoid a light quantity of the laser beam entering the beam expander from being reduced below a reference value, when the laser beam is illuminated over a certain time, a position on each of the first and second plane mirrors at which the laser beam is illuminated is changed by a structure for rotating and/or translating a reflecting surface of each plane mirror on a plane, which includes the plane mirror, while an optical axis is kept same.Type: ApplicationFiled: February 23, 2007Publication date: September 13, 2007Inventors: Noriyuki Aizawa, Hiroyuki Kawakami, Kazuhiro Zama, Yuuichiro Iijima, Kazuo Takahashi, Yusuke Miyazaki, Masayuki Hachiya, Koichi Asami, Shingo Tanaka
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Patent number: 6238785Abstract: This invention relates to a thermoplastic resin film permitting excellent paper feed and discharge and excellent transfer of offset printing ink and ink adhesion even under high humidity conditions in the summertime.Type: GrantFiled: October 3, 1997Date of Patent: May 29, 2001Assignee: Oji-Yuka Synthetic Paper Co., Ltd.Inventors: Kazuhisa Kitamura, Koichi Asami
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Patent number: 6001165Abstract: A coating composition for a recording material and a process for producing the recording material are provided, wherein the coating composition includes an aluminum alkoxide, a binder and a hydrophilic solvent.Type: GrantFiled: June 24, 1998Date of Patent: December 14, 1999Assignee: Oji-Yuka Synthetic Paper Co., Ltd.Inventors: Nobuhiro Shibuya, Toshiyuki Hirabe, Koichi Asami, Masahiro Satoh, Hajime Kanbara
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Patent number: 5834098Abstract: A laminate comprising a thermoplastic resin film having thereon a coating layer containing (A) 100 parts by weight of an antistatic agent comprising a water-soluble quaternary nitrogen-containing polymer, (B) 10 to 600 parts by weight of a polyethyleneimine polymer selected from the group consisting of polyethyleneimine, alkyl-modified polyethyleneimine, poly(ethyleneimine-urea), and an ethyleneimine adduct of polyaminepolyamide, and (C) 25 to 1000 parts by weight of a polyalkylene ether polymer selected from the group consisting of polyethylene glycol, polypropylene glycol, an ethylene oxide-propylene oxide copolymer, and derivatives thereof, each having a molecular weight of 200 to 20,000. The laminate has excellent antistatic properties and offset printability.Type: GrantFiled: June 19, 1997Date of Patent: November 10, 1998Assignee: Oji-Yuka Synthetic Paper Co., Ltd.Inventors: Kazuhisa Kitamura, Koichi Asami
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Patent number: 5667872Abstract: A synthetic paper with a multi-layer structure comprising a biaxially stretched film of an olefinic polymer having a melting point (the peak temperature of the DSC curve) of from 130.degree. C. to 210.degree. C. containing from 5 to 40% by weight inorganic fine powders having a mean particle size of from 0.01 to 10 .mu.m as a base material layer (A) having adhered to at least one surface thereof a uniaxially stretched layer (B) having a surface roughness of from 0.3 to 1.5 .mu.m, with the uniaxially stretched layer (B) comprising a propylene .alpha.-olefin copolymer or a high-density polyethylene having a melting point (the peak temperature of the DSC curve) of from 120.degree. C. to 160.degree. C. which is at least 5.degree. C. lower than the melting point of the olefinic polymer of the base material layer (A) and from 8 to 65% by weight inorganic fine powders having a mean particle size of from 0.01 to 5 .mu.Type: GrantFiled: February 28, 1995Date of Patent: September 16, 1997Assignee: Oji Yuka Goseishi Co., Ltd.Inventors: Akihiko Ohno, Atsushi Ishige, Hiroshi Koyama, Koichi Asami
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Patent number: 5397637Abstract: A thermoplastic resin film having a coated layer thereon, the coating layer comprising a quaternary ammonium salt copolymer comprising (a) a structural unit represented by formula (I): ##STR1## wherein A represents --O-- or --NH--; R.sup.1 represents a hydrogen atom or a methyl group; R.sup.2 represents an alkylene group having from 2 to 4 carbon atoms or --CH.sub.2 CH(OH)--CH.sub.2 --; R.sup.3, R.sup.4, R.sup.5, and R.sup.6, which may be the same or different, each represents an alkyl group having from 1 to 3 carbon atoms; R.sup.7 represents an alkyl group having from 1 to 10 carbon atoms or an aralkyl group having from 7 to 10 carbon atoms; n represents an integer of from 1 to 3; and X represents a chlorine atom, a bromine atom or an iodine atom, (b) a structural unit represented by formula (II): ##STR2## wherein R.sup.8 represents a hydrogen atom or a methyl group; and R.sup.Type: GrantFiled: June 16, 1993Date of Patent: March 14, 1995Assignee: Oji Yuka Goseishi Co., Ltd.Inventors: Koichi Asami, Hironobu Amagai, Yukio Saitoh, Isao Itoh
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Patent number: 4906526Abstract: A thermoplastic resin film having improved printability is described, which is formed by coating a polyolefin film with an aqueous solution containing a modified polyethylene-imine represented by the following general formula: ##STR1## where A is ##STR2## or a polyamine-polyamide residue; R.sub.1 -R.sup.4 are each independently H, an alkyl or alkenyl group having 1-24 carbon atoms, an alicyclic hydrocarbon group or a benzyl group, provided that at least one of R.sup.1 -R.sup.4 is a group other than H; m is 0-300; and n, p and q are each a number of 1-300, and drying the coated solution to form a surface coating.Type: GrantFiled: November 30, 1988Date of Patent: March 6, 1990Assignee: Oji Yuka Goseishi Co., Ltd.Inventors: Masayuki Inoue, Akira Okamoto, Koichi Asami, Kazuhide Hayama, Kanji Narazaki