Abstract: Provided is a classification condition setting support apparatus including: a basic information storage unit configured to store basic information including basic imaging information and a basic defect type; a classification condition setting unit; a basic defect type classification unit configured to classify the basic imaging information according to the classification condition; a classification result confirmation screen generator configured to generate a classification result confirmation screen including the number of pieces of classification basic imaging information, the basic defect type associated with the classification basic imaging information, and the number of pieces of correct answer basic imaging information, by classifying the target basic imaging information according to the classification condition; and a display unit.

Abstract: Providing a spectrometric measuring instrument suitable for in-line measurement for example in a semiconductor manufacturing process, an FPD manufacturing process, or the like, by realizing size reduction and imparting resistance to distance fluttering, angle fluttering in a horizontal direction, and angle fluttering in a perpendicular direction. A light interference type spectral element for gradually changing a wavelength of transmitted light by means of a transmitted position is provided immediately before the photoelectric transfer part array device, and based upon a light-receiving side optical system having the function of detecting a change in state of polarization of a reflected light from a sample, and a series of light-receiving amount data obtained from each of photoelectric transfer parts of the photoelectric transfer part array device, polarized light is analyzed. By fitting of a measured waveform to a theoretical waveform, a film thickness or film quality is obtained.

Abstract: Providing a spectrometric measuring instrument suitable for in-line measurement for example in a semiconductor manufacturing process, an FPD manufacturing process, or the like, by realizing size reduction and imparting resistance to distance fluttering, angle fluttering in a horizontal direction, and angle fluttering in a perpendicular direction. A light interference type spectral element for gradually changing a wavelength of transmitted light by means of a transmitted position is provided immediately before the photoelectric transfer part array device, and based upon a light-receiving side optical system having the function of detecting a change in state of polarization of a reflected light from a sample, and a series of light-receiving amount data obtained from each of photoelectric transfer parts of the photoelectric transfer part array device, polarized light is analyzed. By fitting of a measured waveform to a theoretical waveform, a film thickness or film quality is obtained.

Abstract: Light horizontally output from a light source 50 passes through a projection lens 51 and reaches a half mirror 52. The light reflected by the half mirror 52 coaxially reaches the measurement object 43 through a objective lens 53. The light reflected by the objective lens 53 provides an image at a image-taking unit 56 through a telecentric optical system on an object side comprising the objective lens 53 and an aperture stop 54. The light to be input to the image-taking unit 56 passes through a spectral filter provided in a multi-spectral filter 55. Here, the light source 50 and the aperture stop 54 are in an image-forming relation and the object 43 and the image-taking unit 56 are in the image-forming relation.