Patents by Inventor Koichi Furuyama
Koichi Furuyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20180230603Abstract: To obtain a piezoelectric film having excellent piezoelectric properties. An aspect of the present invention relates to ferroelectric ceramics including a first Sr(Ti1?xRux)O3 film and a PZT film formed on the first Sr(Ti1?xRux)O3 film, wherein the x satisfies a formula 1 below. 0.01?x?0.Type: ApplicationFiled: April 18, 2018Publication date: August 16, 2018Inventors: Takeshi KIJIMA, Yuuji HONDA, Koichi FURUYAMA
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Patent number: 9976219Abstract: To obtain a piezoelectric film having excellent piezoelectric properties. An aspect of the present invention relates to ferroelectric ceramics including a first Sr(Ti1-xRux)O3 film and a PZT film formed on the first Sr(Ti1-xRux)O3 film, wherein the x satisfies a formula 1 below. 0.01?x?0.Type: GrantFiled: February 12, 2015Date of Patent: May 22, 2018Assignee: YOUTEC CO., LTD.Inventors: Takeshi Kijima, Yuuji Honda, Koichi Furuyama
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Patent number: 9887348Abstract: To obtain a piezoelectric film having excellent piezoelectric properties. One aspect of the present invention relates to ferroelectric ceramics including a ZrO2 film oriented in (200), a Pt film that is formed on the ZrO2 film and is oriented in (200) and a piezoelectric film formed on the Pt film.Type: GrantFiled: February 12, 2015Date of Patent: February 6, 2018Assignee: YOUTEC CO., LTD.Inventors: Takeshi Kijima, Yuuji Honda, Koichi Furuyama
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Publication number: 20150236244Abstract: To obtain a piezoelectric film having excellent piezoelectric properties. One aspect of the present invention relates to ferroelectric ceramics including a ZrO2 film oriented in (200), a Pt film that is formed on the ZrO2 film and is oriented in (200) and a piezoelectric film formed on the Pt film.Type: ApplicationFiled: February 12, 2015Publication date: August 20, 2015Inventors: Takeshi KIJIMA, Yuuji HONDA, Koichi FURUYAMA
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Publication number: 20150232346Abstract: To obtain a piezoelectric film having excellent piezoelectric properties. An aspect of the present invention relates to ferroelectric ceramics including a first Sr(Ti1-xRux)O3 film and a PZT film formed on the first Sr(Ti1-xRux)O3 film, wherein the x satisfies a formula 1 below. 0.01?x?0.Type: ApplicationFiled: February 12, 2015Publication date: August 20, 2015Inventors: Takeshi KIJIMA, Yuuji HONDA, Koichi FURUYAMA
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Patent number: 7960901Abstract: A method of manufacturing a ceramic includes forming a film which includes a complex oxide material having an oxygen octahedral structure and a paraelectric material having a catalytic effect for the complex oxide material in a mixed state, and performing a heat treatment to the film, wherein the paraelectric material is one of a layered catalytic substance which includes Si in the constituent elements and a layered catalytic substance which includes Si and Ge in the constituent elements. The heat treatment includes sintering and post-annealing. At least the post-annealing is performed in a pressurized atmosphere including at least one of oxygen and ozone. A ceramic is a complex oxide having an oxygen octahedral structure, and has Si and Ge in the oxygen octahedral structure.Type: GrantFiled: April 26, 2010Date of Patent: June 14, 2011Assignee: Seiko Epson CorporationInventors: Eiji Natori, Takeshi Kijima, Koichi Furuyama, Yuzo Tasaki
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Patent number: 7956519Abstract: A method of manufacturing a ceramic includes forming a film which includes a complex oxide material having an oxygen octahedral structure and a paraelectric material having a catalytic effect for the complex oxide material in a mixed state, and performing a heat treatment to the film, wherein the paraelectric material is one of a layered catalytic substance which includes Si in the constituent elements and a layered catalytic substance which includes Si and Ge in the constituent elements. The heat treatment includes sintering and post-annealing. At least the post-annealing is performed in a pressurized atmosphere including at least one of oxygen and ozone. A ceramic is a complex oxide having an oxygen octahedral structure, and has Si and Ge in the oxygen octahedral structure.Type: GrantFiled: April 26, 2010Date of Patent: June 7, 2011Assignee: Seiko Epson CorporationInventors: Eiji Natori, Takeshi Kijima, Koichi Furuyama, Yuzo Tasaki
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Publication number: 20100289384Abstract: A method of manufacturing a ceramic includes forming a film which includes a complex oxide material having an oxygen octahedral structure and a paraelectric material having a catalytic effect for the complex oxide material in a mixed state, and performing a heat treatment to the film, wherein the paraelectric material is one of a layered catalytic substance which includes Si in the constituent elements and a layered catalytic substance which includes Si and Ge in the constituent elements. The heat treatment includes sintering and post-annealing. At least the post-annealing is performed in a pressurized atmosphere including at least one of oxygen and ozone. A ceramic is a complex oxide having an oxygen octahedral structure, and has Si and Ge in the oxygen octahedral structure.Type: ApplicationFiled: April 26, 2010Publication date: November 18, 2010Applicant: Seiko Epson CorporationInventors: Eiji Natori, Takeshi Kijima, Koichi Furuyama, Yuzo Tasaki
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Patent number: 7825569Abstract: A method of manufacturing a ceramic includes forming a film which includes a complex oxide material having an oxygen octahedral structure and a paraelectric material having a catalytic effect for the complex oxide material in a mixed state, and performing a heat treatment to the film, wherein the paraelectric material is one of a layered catalytic substance which includes Si in the constituent elements and a layered catalytic substance which includes Si and Ge in the constituent elements. The heat treatment includes sintering and post-annealing. At least the post-annealing is performed in a pressurized atmosphere including at least one of oxygen and ozone. A ceramic is a complex oxide having an oxygen octahedral structure, and has Si and Ge in the oxygen octahedral structure.Type: GrantFiled: April 10, 2009Date of Patent: November 2, 2010Assignee: Seiko Epson CorporationInventors: Eiji Natori, Takeshi Kijima, Koichi Furuyama, Yuzo Tasaki
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Publication number: 20100207492Abstract: A method of manufacturing a ceramic includes forming a film which includes a complex oxide material having an oxygen octahedral structure and a paraelectric material having a catalytic effect for the complex oxide material in a mixed state, and performing a heat treatment to the film, wherein the paraelectric material is one of a layered catalytic substance which includes Si in the constituent elements and a layered catalytic substance which includes Si and Ge in the constituent elements. The heat treatment includes sintering and post-annealing. At least the post-annealing is performed in a pressurized atmosphere including at least one of oxygen and ozone. A ceramic is a complex oxide having an oxygen octahedral structure, and has Si and Ge in the oxygen octahedral structure.Type: ApplicationFiled: April 26, 2010Publication date: August 19, 2010Applicant: Seiko Epson CorporationInventors: Eiji Natori, Takeshi Kijima, Koichi Furuyama, Yuzo Tasaki
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Publication number: 20090230821Abstract: A method of manufacturing a ceramic includes forming a film which includes a complex oxide material having an oxygen octahedral structure and a paraelectric material having a catalytic effect for the complex oxide material in a mixed state, and performing a heat treatment to the film, wherein the paraelectric material is one of a layered catalytic substance which includes Si in the constituent elements and a layered catalytic substance which includes Si and Ge in the constituent elements. The heat treatment includes sintering and post-annealing. At least the post-annealing is performed in a pressurized atmosphere including at least one of oxygen and ozone. A ceramic is a complex oxide having an oxygen octahedral structure, and has Si and Ge in the oxygen octahedral structure.Type: ApplicationFiled: April 10, 2009Publication date: September 17, 2009Applicant: Seiko Epson CorporationInventors: Eiji Natori, Takeshi Kijima, Koichi Furuyama, Yuzo Tasaki
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Publication number: 20080159939Abstract: A method of manufacturing a ceramic includes forming a film which includes a complex oxide material having an oxygen octahedral structure and a paraelectric material having a catalytic effect for the complex oxide material in a mixed state, and performing a heat treatment to the film, wherein the paraelectric material is one of a layered catalytic substance which includes Si in the constituent elements and a layered catalytic substance which includes Si and Ge in the constituent elements. The heat treatment includes sintering and post-annealing. At least the post-annealing is performed in a pressurized atmosphere including at least one of oxygen and ozone. A ceramic is a complex oxide having an oxygen octahedral structure, and has Si and Ge in the oxygen octahedral structure.Type: ApplicationFiled: December 6, 2007Publication date: July 3, 2008Applicant: Seiko Epson CorporationInventors: Eiji Natori, Takeshi Kijima, Koichi Furuyama, Yuzo Tasaki
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Patent number: 7323257Abstract: A method of manufacturing a ceramic includes forming a film which includes a complex oxide material having an oxygen octahedral structure and a paraelectric material having a catalytic effect for the complex oxide material in a mixed state, and performing a heat treatment to the film, wherein the paraelectric material is one of a layered catalytic substance which includes Si in the constituent elements and a layered catalytic substance which includes Si and Ge in the constituent elements. The heat treatment includes sintering and post-annealing. At least the post-annealing is performed in a pressurized atmosphere including at least one of oxygen and ozone. A ceramic is a complex oxide having an oxygen octahedral structure, and has Si and Ge in the oxygen octahedral structure.Type: GrantFiled: December 23, 2005Date of Patent: January 29, 2008Assignee: Seiko Epson CorporationInventors: Eiji Natori, Takeshi Kijima, Koichi Furuyama, Yuzo Tasaki
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Patent number: 7205056Abstract: A method of manufacturing a ceramic film includes forming the ceramic film by crystallizing a ceramic raw material liquid which includes a first raw material liquid and a second raw material liquid. The first raw material liquid and the second raw material liquid are different types of liquids, the first raw material liquid is a raw material liquid for producing a ferroelectric, the second raw material liquid is a raw material liquid for producing an oxide such as an ABO-type oxide, a solvent included in the first raw material liquid and a solvent included in the second raw material liquid have different polarities, and the ceramic film is formed in a state in which the first raw material liquid and the second raw material liquid are phase separated so that first crystals formed of the first raw material liquid are intermittently formed in a surface direction of the ceramic film and second crystals formed of the second raw material liquid are formed so as to interpose between the first crystals.Type: GrantFiled: June 12, 2002Date of Patent: April 17, 2007Assignee: Seiko Epson CorporationInventors: Eiji Natori, Takeshi Kijima, Koichi Furuyama, Yuzo Tasaki
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Patent number: 7138013Abstract: A method of manufacturing a ceramic film includes a step of forming a ceramic film 30 by crystallizing a raw material body 20. The raw material body 20 contains different types of raw materials in a mixed state. The different types of raw materials differ from one another in at least one of a crystal growth condition and a crystal growth mechanism in the crystallization of the raw materials. According to this manufacturing method, a surface morphology of the ceramic film can be improved.Type: GrantFiled: June 19, 2003Date of Patent: November 21, 2006Assignee: Seiko Epson CorporationInventors: Eiji Natori, Koichi Furuyama, Yuzo Tasaki
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Publication number: 20060120940Abstract: A method of manufacturing a ceramic includes forming a film which includes a complex oxide material having an oxygen octahedral structure and a paraelectric material having a catalytic effect for the complex oxide material in a mixed state, and performing a heat treatment to the film, wherein the paraelectric material is one of a layered catalytic substance which includes Si in the constituent elements and a layered catalytic substance which includes Si and Ge in the constituent elements. The heat treatment includes sintering and post-annealing. At least the post-annealing is performed in a pressurized atmosphere including at least one of oxygen and ozone. A ceramic is a complex oxide having an oxygen octahedral structure, and has Si and Ge in the oxygen octahedral structure.Type: ApplicationFiled: December 23, 2005Publication date: June 8, 2006Applicant: Seiko Epson CorporationInventors: Eiji Natori, Takeshi Kijima, Koichi Furuyama, Yuzo Tasaki
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Publication number: 20060051601Abstract: A method of manufacturing a ceramic film includes forming the ceramic film by crystallizing a ceramic raw material liquid which includes a first raw material liquid and a second raw material liquid. The first raw material liquid and the second raw material liquid are different types of liquids, the first raw material liquid is a raw material liquid for producing a ferroelectric, the second raw material liquid is a raw material liquid for producing an oxide such as an ABO-type oxide, a solvent included in the first raw material liquid and a solvent included in the second raw material liquid have different polarities, and the ceramic film is formed in a state in which the first raw material liquid and the second raw material liquid are phase separated so that first crystals formed of the first raw material liquid are intermittently formed in a surface direction of the ceramic film and second crystals formed of the second raw material liquid are formed so as to interpose between the first crystals.Type: ApplicationFiled: August 31, 2005Publication date: March 9, 2006Applicant: SEIKO EPSON CORPORATIONInventors: Eiji Natori, Takeshi Kijima, Koichi Furuyama, Yuzo Tasaki
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Patent number: 7008669Abstract: A method of manufacturing a ceramic includes forming a film which includes a complex oxide material having an oxygen octahedral structure and a paraelectric material having a catalytic effect for the complex oxide material in a mixed state, and performing a heat treatment to the film, wherein the paraelectric material is one of a layered catalytic substance which includes Si in the constituent elements and a layered catalytic substance which includes Si and Ge in the constituent elements. The heat treatment includes sintering and post-annealing. At least the post-annealing is performed in a pressurized atmosphere including at least one of oxygen and ozone. A ceramic is a complex oxide having an oxygen octahedral structure, and has Si and Ge in the oxygen octahedral structure.Type: GrantFiled: June 12, 2002Date of Patent: March 7, 2006Assignee: Seiko Epson CorporationInventors: Eiji Natori, Takeshi Kijima, Koichi Furuyama, Yuzo Tasaki
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Publication number: 20030213426Abstract: A method of manufacturing a ceramic film includes a step of forming a ceramic film 30 by crystallizing a raw material body 20. The raw material body 20 contains different types of raw materials in a mixed state. The different types of raw materials differ from one another in at least one of a crystal growth condition and a crystal growth mechanism in the crystallization of the raw materials. According to this manufacturing method, a surface morphology of the ceramic film can be improved.Type: ApplicationFiled: June 19, 2003Publication date: November 20, 2003Applicant: Seiko Epson CorporationInventors: Eiji Natori, Koichi Furuyama, Yuzo Tasaki
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Patent number: 6602344Abstract: A method of manufacturing a ceramic film includes a step of forming a ceramic film 30 by crystallizing a raw material body 20. The raw material body 20 contains different types of raw materials in a mixed state. The different types of raw materials differ from one another in at least one of a crystal growth condition and a crystal growth mechanism in the crystallization of the raw materials. According to this manufacturing method, a surface morphology of the ceramic film can be improved.Type: GrantFiled: June 14, 2001Date of Patent: August 5, 2003Assignee: Seiko Epson CorporationInventors: Eiji Natori, Koichi Furuyama, Yuzo Tasaki