Patents by Inventor Koichi Honda

Koichi Honda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250038369
    Abstract: A battery of the present disclosure includes: a power-generation element including a plurality of laminated battery cells connected electrically in parallel, each battery cell including an electrode layer, a counter-electrode layer, and a solid electrolyte layer; and a first connection member connected to a side surface of the power-generation element, and the first connection member includes a first metal layer having a first surface facing the side surface, a first insulating layer located on the first surface, and first conductive vias passing through the first insulating layer and electrically connecting the first metal layer and the electrode layers.
    Type: Application
    Filed: October 2, 2024
    Publication date: January 30, 2025
    Inventors: KOICHI HIRANO, KAZUYOSHI HONDA, KAZUHIRO MORIOKA, AKIRA KAWASE
  • Publication number: 20250030136
    Abstract: A battery of the present disclosure includes: a power-generation element including a plurality of laminated battery cells connected electrically in parallel, each battery cell including an electrode layer, a counter-electrode layer, and a solid electrolyte layer; and a first connection member connected to a side surface of the power-generation element, the first connection member includes a first base material having a first surface facing the side surface and a first conductive member located on the first surface and electrically connected to the electrode layers, and one or more first insulating members are located so as to cover the counter-electrode layers on the side surface.
    Type: Application
    Filed: October 3, 2024
    Publication date: January 23, 2025
    Inventors: KOICHI HIRANO, KAZUYOSHI HONDA, KAZUHIRO MORIOKA, AKIRA KAWASE
  • Publication number: 20240141484
    Abstract: There is provided a technique that includes: a process vessel in which a substrate is processed; a lid capable of closing an opening provided at a lower portion of the process vessel; an elevator capable of elevating and lowering the lid; a heat insulator provided between the lid and the substrate and comprising a case of a cylindrical shape with a closed upper end; and a cooling gas supplier configured to purge an inside of the heat insulator by supplying a purge gas through a discharge port in the case while the opening is closed by the lid, and to cool the heat insulator by supplying a cooling gas through the discharge port while the opening is not closed by the lid.
    Type: Application
    Filed: October 6, 2023
    Publication date: May 2, 2024
    Applicant: Kokusai Electric Corporation
    Inventors: Yasuaki KOMAE, Hiroki OKAMIYA, Koichi HONDA
  • Patent number: 11515152
    Abstract: There is provided a technique that includes forming a film on a substrate by performing a cycle a predetermined number of times, the cycle including: (a) supplying a precursor gas to the substrate in a process container of a substrate processing apparatus via a first pipe made of metal; (b) supplying an oxygen-containing gas to the substrate in the process container via a second pipe made of metal, wherein a fluorine-containing layer is continuously formed on an inner surface of the second pipe; and (c) supplying a nitrogen-and-hydrogen-containing gas to the substrate in the process container via the second pipe.
    Type: Grant
    Filed: May 19, 2020
    Date of Patent: November 29, 2022
    Assignee: KOKUSAI ELECTRIC CORPORATION
    Inventors: Shintaro Kogura, Kazuhiro Harada, Shogo Otani, Koichi Honda, Mamoru Umemoto, Kazuhiro Shimoda, Akihito Yoshino, Naoko Kitagawa, Kenji Kameda
  • Patent number: 11447903
    Abstract: A sewing machine presser foot includes a support part having a support base member, and a roller part including a plurality of rotating members rotatably supported at the support base member and having different diameters so that the roller part is conical as a whole. Each of the plurality of rotating members individually rotates and presses a fabric to be sewn.
    Type: Grant
    Filed: December 21, 2020
    Date of Patent: September 20, 2022
    Assignee: JANOME CORPORATION
    Inventors: Koichi Honda, Yukitaka Omata
  • Publication number: 20210301441
    Abstract: A sewing machine presser foot includes a support part having a support base member, and a roller part including a plurality of rotating members rotatably supported at the support base member and having different diameters so that the roller part is conical as a whole. Each of the plurality of rotating members individually rotates and presses a fabric to be sewn.
    Type: Application
    Filed: December 21, 2020
    Publication date: September 30, 2021
    Inventors: Koichi HONDA, Yukitaka OMATA
  • Publication number: 20200373150
    Abstract: There is provided a technique that includes forming a film on a substrate by performing a cycle a predetermined number of times, the cycle including: (a) supplying a precursor gas to the substrate in a process container of a substrate processing apparatus via a first pipe made of metal; (b) supplying an oxygen-containing gas to the substrate in the process container via a second pipe made of metal, wherein a fluorine-containing layer is continuously formed on an inner surface of the second pipe; and (c) supplying a nitrogen-and-hydrogen-containing gas to the substrate in the process container via the second pipe.
    Type: Application
    Filed: May 19, 2020
    Publication date: November 26, 2020
    Applicant: KOKUSAI ELECTRIC CORPORATION
    Inventors: Shintaro KOGURA, Kazuhiro HARADA, Shogo OTANI, Koichi HONDA, Mamoru UMEMOTO, Kazuhiro SHIMODA, Akihito YOSHINO, Naoko KITAGAWA, Kenji KAMEDA
  • Patent number: 9963785
    Abstract: Disclosed is a method of manufacturing a semiconductor device including: performing a pre-process to a metal film or a GST film by supplying a first processing gas to a substrate, on a surface of which the metal film or the GST film is formed, without supplying a second processing gas; and performing a formation process to the substrate to which the pre-process has been performed such that a film is formed on the metal film or the GST film by executing at least one cycle of alternately (i) supplying the first processing gas, and (ii) supplying the second processing gas that is activated by plasma excitation.
    Type: Grant
    Filed: March 25, 2015
    Date of Patent: May 8, 2018
    Assignee: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Masayuki Asai, Koichi Honda, Mamoru Umemoto, Kazuyuki Okuda
  • Patent number: 9828711
    Abstract: A needle plate replacement device including positioning mechanisms provided in an opposing manner in the needle plate and the bed portion, the positioning mechanisms positioning the needle plate to an attaching position in the bed portion; a lock mechanism including a locking member provided in the bed portion and a locked member provided in the needle plate, in which by mounting the needle plate on the attaching position in the bed portion, the locking member and the locked member is locked to each other thus maintaining a locked state; a push-up mechanism provided in the bed portion, the push-up mechanism pushing up the needle plate mounted on the bed portion towards a dismount position above the bed portion; and a release mechanism cancelling the locked state between the locking member and the locked member of the lock mechanism by being interlocked with an operation of the push-up mechanism.
    Type: Grant
    Filed: March 24, 2015
    Date of Patent: November 28, 2017
    Assignee: JANOME SEWING MACHINE CO., LTD.
    Inventors: Koji Maeda, Koichi Honda, Yoshitaka Bamba
  • Patent number: 9593422
    Abstract: Disclosed is a method of manufacturing a semiconductor device including: performing a pre-process to a substrate, on a surface of which a metal film or a GST film is formed, such that a first film is formed on the metal film or the GST film by executing at least one cycle of alternately performing (i) supplying a first processing gas, and (ii) supplying a second processing gas that is not activated by plasma excitation; and performing a formation process to the substrate to which the pre-process has been performed such that a second film is formed on the first film by executing at least one cycle of alternately (i) supplying the first processing gas, and (ii) supplying the second processing gas that is activated by plasma excitation.
    Type: Grant
    Filed: March 25, 2015
    Date of Patent: March 14, 2017
    Assignee: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Masayuki Asai, Koichi Honda, Mamoru Umemoto, Kazuyuki Okuda
  • Publication number: 20160040342
    Abstract: A needle plate replacement device including positioning mechanisms provided in an opposing manner in the needle plate and the bed portion, the positioning mechanisms positioning the needle plate to an attaching position in the bed portion; a lock mechanism including a locking member provided in the bed portion and a locked member provided in the needle plate, in which by mounting the needle plate on the attaching position in the bed portion, the locking member and the locked member is locked to each other thus maintaining a locked state; a push-up mechanism provided in the bed portion, the push-up mechanism pushing up the needle plate mounted on the bed portion towards a dismount position above the bed portion; and a release mechanism cancelling the locked state between the locking member and the locked member of the lock mechanism by being interlocked with an operation of the push-up mechanism.
    Type: Application
    Filed: March 24, 2015
    Publication date: February 11, 2016
    Applicant: Janome Sewing Machine Co., Ltd.
    Inventors: Koji Maeda, Koichi Honda, Yoshitaka Bamba
  • Patent number: 9209015
    Abstract: Provided is a substrate processing apparatus, which comprises a process chamber configured to process a substrate, a first plasma generation chamber in the process chamber, a first reactive gas supply unit configured to supply first reactive gas into the first plasma generation chamber, a pair of first discharge electrodes configured to generate plasma and to excite the first reactive gas, a first gas ejection port installed in a side wall of the first plasma generation chamber to eject an active species toward the substrate, a second plasma generation chamber in the process chamber, a second reactive gas supply unit configured to supply second reactive gas into the second plasma generation chamber, a pair of second discharge electrodes configured to generate plasma and to excite the second reactive gas, and a second gas ejection port installed in a side wall of the second plasma generation chamber to eject an active species.
    Type: Grant
    Filed: May 19, 2010
    Date of Patent: December 8, 2015
    Assignee: Hitachi Kokusai Electric Inc.
    Inventors: Tetsuo Yamamoto, Naoki Matsumoto, Koichi Honda
  • Patent number: 9175395
    Abstract: Disclosed is a substrate processing apparatus including: a processing chamber; plural buffer chambers; a first processing gas supply system that supplies a first processing gas to the processing chamber; a second processing gas supply system that supplies a second processing gas to the buffer chambers; a RF power source; plasma-generating electrodes in the buffer chambers; a heating system; and a controller that controls the first and second processing gas supply systems, the power source, and the heating system to expose the substrate having a metal film thereon to the first processing gas, and the second processing gas that is activated in the plural buffer chambers with an application of RF power to the electrodes and that is supplied from the buffer chambers to the processing chamber to form a film on the metal film while heating the substrate to a self-decomposition temperature of the first processing gas or lower.
    Type: Grant
    Filed: September 13, 2011
    Date of Patent: November 3, 2015
    Assignee: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Masayuki Asai, Koichi Honda, Mamoru Umemoto, Kazuyuki Okuda
  • Publication number: 20150197854
    Abstract: Disclosed is a method of manufacturing a semiconductor device including: performing a pre-process to a substrate, on a surface of which a metal film or a GST film is formed, such that a first film is formed on the metal film or the GST film by executing at least one cycle of alternately performing (i) supplying a first processing gas, and (ii) supplying a second processing gas that is not activated by plasma excitation; and performing a formation process to the substrate to which the pre-process has been performed such that a second film is formed on the first film by executing at least one cycle of alternately (i) supplying the first processing gas, and (ii) supplying the second processing gas that is activated by plasma excitation.
    Type: Application
    Filed: March 25, 2015
    Publication date: July 16, 2015
    Inventors: Masayuki ASAI, Koichi HONDA, Mamoru UMEMOTO, Kazuyuki OKUDA
  • Publication number: 20150197855
    Abstract: Disclosed is a method of manufacturing a semiconductor device including: performing a pre-process to a metal film or a GST film by supplying a first processing gas to a substrate, on a surface of which the metal film or the GST film is formed, without supplying a second processing gas; and performing a formation process to the substrate to which the pre-process has been performed such that a film is formed on the metal film or the GST film by executing at least one cycle of alternately (i) supplying the first processing gas, and (ii) supplying the second processing gas that is activated by plasma excitation.
    Type: Application
    Filed: March 25, 2015
    Publication date: July 16, 2015
    Inventors: Masayuki ASAI, Koichi HONDA, Mamoru UMEMOTO, Kazuyuki OKUDA
  • Publication number: 20150140839
    Abstract: Provided is a substrate processing apparatus, which comprises a process chamber configured to process a substrate, a first plasma generation chamber in the process chamber, a first reactive gas supply unit configured to supply first reactive gas into the first plasma generation chamber, a pair of first discharge electrodes configured to generate plasma and to excite the first reactive gas, a first gas ejection port installed in a side wall of the first plasma generation chamber to eject an active species toward the substrate, a second plasma generation chamber in the process chamber, a second reactive gas supply unit configured to supply second reactive gas into the second plasma generation chamber, a pair of second discharge electrodes configured to generate plasma and to excite the second reactive gas, and a second gas ejection port installed in a side wall of the second plasma generation chamber to eject an active species.
    Type: Application
    Filed: January 8, 2015
    Publication date: May 21, 2015
    Inventors: Tetsuo Yamamoto, Naoki Matsumoto, Koichi Honda
  • Publication number: 20130278156
    Abstract: A light-emitting diode lighting apparatus includes a light source including plural grouped light-emitting diodes, plural lighting circuit parts to perform lighting control of the respective grouped light-emitting diodes of the light source individually, and a dimming control part that inputs a dimming signal from a dimming part and controls an output of each of the lighting circuit parts according to the dimming signal, and sequentially changes, when a dimming gradation is changed, outputs of the plural lighting circuit parts to new gradations in one period of the dimming signal.
    Type: Application
    Filed: September 22, 2011
    Publication date: October 24, 2013
    Applicant: TOSHIBA LIGHTING & TECHNOLOGY CORPORATION
    Inventors: Yumi Hanyuda, Koichi Honda, Tsuyoshi Toyama, Naoto Tokuhara, Junya Murata, Keitaro Takasaka
  • Publication number: 20120100722
    Abstract: Disclosed is a substrate processing apparatus including: a processing chamber; plural buffer chambers; a first processing gas supply system that supplies a first processing gas to the processing chamber; a second processing gas supply system that supplies a second processing gas to the buffer chambers; a RF power source; plasma-generating electrodes in the buffer chambers; a heating system; and a controller that controls the first and second processing gas supply systems, the power source, and the heating system to expose the substrate having a metal film thereon to the first processing gas, and the second processing gas that is activated in the plural buffer chambers with an application of RF power to the electrodes and that is supplied from the buffer chambers to the processing chamber to form a film on the metal film while heating the substrate to a self-decomposition temperature of the first processing gas or lower.
    Type: Application
    Filed: September 13, 2011
    Publication date: April 26, 2012
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Masayuki ASAI, Koichi HONDA, Mamoru UMEMOTO, Kazuyuki OKUDA
  • Publication number: 20100300357
    Abstract: Provided is a substrate processing apparatus, which comprises a process chamber configured to process a substrate, a first plasma generation chamber in the process chamber, a first reactive gas supply unit configured to supply first reactive gas into the first plasma generation chamber, a pair of first discharge electrodes configured to generate plasma and to excite the first reactive gas, a first gas ejection port installed in a side wall of the first plasma generation chamber to eject an active species toward the substrate, a second plasma generation chamber in the process chamber, a second reactive gas supply unit configured to supply second reactive gas into the second plasma generation chamber, a pair of second discharge electrodes configured to generate plasma and to excite the second reactive gas, and a second gas ejection port installed in a side wall of the second plasma generation chamber to eject an active species.
    Type: Application
    Filed: May 19, 2010
    Publication date: December 2, 2010
    Applicant: HITACHI-KOKUSAI ELECTRIC INC.
    Inventors: Tetsuo Yamamoto, Naoki Matsumoto, Koichi Honda
  • Patent number: D867406
    Type: Grant
    Filed: April 23, 2018
    Date of Patent: November 19, 2019
    Assignee: JANOME SEWING MACHINE CO., LTD.
    Inventors: Koichi Honda, Koji Maeda