Patents by Inventor Koichi Kimoto

Koichi Kimoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4289071
    Abstract: A shallow relief non-bottoming printing plate is disclosed having a polymerized layer of less than about 0.020 inch and which includes a plurality of dispersed particles sufficient to create small protuberances in non-image or background areas to prevent bottoming. Photopolymerizable elements, as well as processing techniques, are also disclosed for making such printing plates.
    Type: Grant
    Filed: September 12, 1979
    Date of Patent: September 15, 1981
    Assignee: Napp Systems (USA), Inc.
    Inventors: Robert W. Hallman, Koichi Kimoto, Sakuo Okai
  • Patent number: 4283481
    Abstract: A photopolymerizable composition and photosensitive elements produced therefrom are disclosed. The photopolymerizable composition includes: (a) a monomer component, (b) a polymer component, (c) a photopolymerization initiator, and (d) an activator.The monomer component contains at least one water soluble, monofunctional unsaturated ethylenic monomer or the combination of such a monomer and at least one polyfunctional unsaturated ethylenic monomer.The polymer component includes a partially saponified water soluble, polyvinyl acetate polymer compatible with the monomer components. The polyvinyl acetate polymer contains both acetyl and hydroxyl groups and has a polymerization degree of from 300-2000. The degree of saponification of the polymer is desirably in the range of 65 to 99 percent.
    Type: Grant
    Filed: June 23, 1980
    Date of Patent: August 11, 1981
    Assignee: Napp Systems (USA) Inc.
    Inventors: Sakuo Okai, Koichi Kimoto
  • Patent number: 4251622
    Abstract: A photo-sensitive composition for dry formation of image comprising a dyestuff having a photo-fading property, a ketonic sensitizing agent and a high molecular polymer as a binding agent, which can provide a visible image by the irradiation of light and maintain the image without any fixing treatment.
    Type: Grant
    Filed: March 1, 1978
    Date of Patent: February 17, 1981
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Koichi Kimoto, Yasusi Umeda, Shin Saito, Kunsei Tanabe, Yasuyuki Takimoto
  • Patent number: 4233391
    Abstract: A photopolymerizable composition and photosensitive elements produced therefrom are disclosed. The photopolymerizable composition includes: (a) a monomer component, (b) a polymer component, (c) a photopolymerization initiator, and (d) an activator.The monomer component contains at least one water soluble, monofunctional unsaturated ethylenic monomer or the combination of such a monomer and at least one polyfunctional unsaturated ethylenic monomer.The polymer component includes a partially saponified water soluble, polyvinyl acetate polymer compatible with the monomer components. The polyvinyl acetate polymer contains both acetyl and hydroxyl groups and has a polymerization degree of from 300-2000. The degree of saponification of the polymer is desirably in the range of 65 to 99 percent.
    Type: Grant
    Filed: August 27, 1979
    Date of Patent: November 11, 1980
    Assignee: Napp Systems (USA) Inc.
    Inventors: Sakuo Okai, Koichi Kimoto
  • Patent number: 4164422
    Abstract: Letterpress and offset photopolymer printing plates are disclosed having relatively thin water developable photopolymer layers, which, after being developed, have ink-repulsive, non-image areas. Adhesive layers are provided in the disclosed printing plates that are interposed between an ink-repulsive coating contained in the printing plate substrate and the water-developable photopolymer, and provide a balance between satisfactory adhesive and ink-repulsive properties in the resulting plate.
    Type: Grant
    Filed: September 19, 1977
    Date of Patent: August 14, 1979
    Assignee: Napp Systems (USA), Inc.
    Inventors: Sakuo Okai, Koichi Kimoto
  • Patent number: 4042386
    Abstract: A photopolymerizable composition and photosensitive elements produced therefrom are disclosed which include a monomer component, a polymer component and a polymerization initiator activatable by actinic light. The monomer component includes at least one water soluble monofunctional unsaturated ethylenic monomer, and at least one polyfunctional unsaturated ethylenic monomer. The polymer component includes a partially saponified, water-soluble, polyvinyl acetate which is compatible with said monomer components. The ratio, by weight, of polyfunctional monomer to monofunctional monomer is in the range of about 0.2 to about 0.6, and the ratio, by weight, of said monomer component to said polymer component is in the range of about 0.7 to about 1.2.
    Type: Grant
    Filed: June 7, 1976
    Date of Patent: August 16, 1977
    Assignee: Napp Systems
    Inventors: Sakuo Okai, Koichi Kimoto