Patents by Inventor Koichi Kimura

Koichi Kimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11364555
    Abstract: Provided herein is a drill having less possibility of cracks in an inner periphery of a drilled workpiece and deformation of a workpiece upon penetrating with a drill, as well as delamination. A drill according to the present invention comprises two cutting blades which are formed symmetrical about an axis of rotation, wherein each of the cutting blades has a main cutting blade formed from a drill tip toward a peripheral side of the drill to become a shape with curves, a thinning cutting blade in a shape with curves formed in closer to the drill tip than the main cutting blade, and an U-shaped cutting blade in a shape with curves formed in closer to the periphery of the drill than the thinning cutting blade.
    Type: Grant
    Filed: March 29, 2019
    Date of Patent: June 21, 2022
    Assignee: Bic Tool Co., Ltd
    Inventors: Koichi Arai, Giichi Arai, Katsuyo Kimura, Satoshi Teshima
  • Publication number: 20220190380
    Abstract: Provided is a method for producing a non-aqueous alkali metal electricity storage element, comprising a voltage application step of applying a voltage to a non-aqueous alkali metal electricity storage element precursor comprising a positive electrode precursor, a negative electrode, a separator, and a non-aqueous electrolytic solution, housed in a casing, wherein a positive electrode active material layer of the positive electrode precursor comprises a positive electrode active material and an alkali metal compound other than the positive electrode active material, wherein comprising (1) pressurizing the precursor from outside thereof before the voltage application step or during the voltage application step, (2) heating the precursor before the voltage application step or during the voltage application step, (3) carrying out constant voltage charge of the precursor after constant current charge of the precursor in the voltage application step, and wherein (4) a C rate of the constant current charge is 1.
    Type: Application
    Filed: March 23, 2020
    Publication date: June 16, 2022
    Applicant: Asahi Kasei Kabushiki Kaisha
    Inventors: Yuichiro Hirakawa, Koichi Hiraoka, Hitoshi Morita, Yuima Kimura, Kazuteru Umetsu
  • Patent number: 11362346
    Abstract: A fuel cell system includes a fuel exhaust gas inlet channel for guiding a fuel exhaust gas containing liquid water discharged from a fuel cell stack to a gas liquid separator provided downstream of a humidifier in an oxygen-containing gas inlet channel. The specific gravity of the fuel exhaust gas is lighter than the specific gravity of the oxygen-containing exhaust gas. An outlet channel of the gas liquid separator includes a stirring booster having a first point and a second point positioned downstream of the first point. The second point is positioned ahead of the first point in the gravity direction.
    Type: Grant
    Filed: August 19, 2019
    Date of Patent: June 14, 2022
    Assignee: HONDA MOTOR CO., LTD.
    Inventors: Yuhei Horiuchi, Koichi Kimura
  • Patent number: 11352943
    Abstract: A rotation adjusting device is controlled such that an engine speed rising rate at the time of acceleration request is made smaller when a turbocharging pressure is lower than the turbocharging pressure is higher. Therefore, an engine speed can be increased at such a low speed that a rising delay in the turbocharging pressure hardly occurs, in a low turbocharging pressure region. Further, when the rotation adjusting device is controlled such that the engine speed rising rate at the time of the acceleration request is set to a value corresponding to the turbocharging pressure, an MG2 torque is controlled to compensate for an insufficient drive torque of an actual engine torque for a request engine torque. Therefore, even when the engine torque is increased slowly by increasing the engine speed at a slow speed, the insufficient drive torque is compensated for by the MG2 torque.
    Type: Grant
    Filed: June 30, 2020
    Date of Patent: June 7, 2022
    Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Atsushi Tabata, Koichi Okuda, Tooru Matsubara, Takahiro Kimura, Yasutaka Tsuchida
  • Publication number: 20220151027
    Abstract: A heater includes a base having a first surface and a second surface, and a heat generator disposed on a third surface of the base, the third surface being parallel to the first surface. The base includes a hole portion that opens in at least the second surface. The third surface includes a plurality of blank areas on each of which the heat generator is not present and each of which is circular. The blank areas include a first blank area including a region that the hole portion overlaps and a second blank area that does not include a region that the hole portion overlaps.
    Type: Application
    Filed: January 20, 2020
    Publication date: May 12, 2022
    Applicant: Sumitomo Electric Industries, Ltd.
    Inventors: Shigenobu SAKITA, Koichi KIMURA, Akira MIKUMO
  • Patent number: 11306022
    Abstract: A casing includes a plate-shaped cover glass for use in an exterior portion of an article; an inorganic coating which covers an end surface of the cover glass; and a resin coating which is at least partially overlaid on the inorganic coating, and which forms an outer edge of the cover glass.
    Type: Grant
    Filed: December 12, 2018
    Date of Patent: April 19, 2022
    Assignee: FUJITSU LIMITED
    Inventors: Koji Omote, Koichi Kimura
  • Patent number: 11268424
    Abstract: An exhaust gas purification device includes a selective catalytic reduction (SCR) device arranged in a downstream exhaust flow path, and a mixer arranged upstream of the selective catalytic reduction device and including a helical flow path that helically guides the flow of exhaust gas from an internal combustion engine. In the exhaust gas purification device, the mixer includes a casing, an injector, and a partition plate. The casing has an upstream opening and a downstream opening and is provided with the helical flow path therein. The injector is arranged in the helical flow path to add a reducing agent to the helical flow path. The partition plate is continuous from the upstream opening to the downstream opening. The partition plate is arranged to divide the inner space of the casing into an upstream side and a downstream side, and defines the helical flow path.
    Type: Grant
    Filed: November 13, 2020
    Date of Patent: March 8, 2022
    Assignee: Nissin Kogyo Co., Ltd.
    Inventors: Koichi Kimura, Sachiko Yoshizawa, Kenichi Miyazawa
  • Patent number: 11251442
    Abstract: A fuel cell system includes a gas liquid separator provided downstream of a humidifier in an oxygen-containing gas inlet channel, a fuel exhaust gas inlet channel for guiding a fuel exhaust gas containing liquid water discharged from a fuel cell stack to the gas liquid separator. The gas liquid separator performs gas liquid separation of both of an oxygen-containing gas humidified by the humidifier and the fuel exhaust gas containing the liquid water guided from the fuel exhaust gas inlet channel.
    Type: Grant
    Filed: August 19, 2019
    Date of Patent: February 15, 2022
    Assignee: HONDA MOTOR CO., LTD.
    Inventors: Yuhei Horiuchi, Koichi Kimura
  • Patent number: 11239057
    Abstract: A showerhead provided in a chamber of a semiconductor manufacturing apparatus and facing a wafer holder includes: a disk-shaped member having a plurality of through holes penetrating the disk-shaped member in a direction of a thickness thereof; a high-frequency conductor embedded in the disk-shaped member; a hole provided in the disk-shaped member, extending in the direction of the thickness of the disk-shaped member and having a bottom exposing a portion of the conductor; an electrode terminal portion disposed in the hole and having a base portion electrically connected to the conductor and a columnar portion provided on the base portion; a cylindrical member having a first end portion fitted outside the columnar portion and facing the conductor and a second end portion facing away from the first end portion, and a sealing member surrounding the first end portion.
    Type: Grant
    Filed: June 25, 2018
    Date of Patent: February 1, 2022
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Koichi Kimura, Akira Mikumo
  • Patent number: 11195701
    Abstract: A showerhead provided in a chamber of a semiconductor manufacturing apparatus and facing a wafer holder includes: a plate-shaped ceramic substrate; a plurality of through holes penetrating the ceramic substrate in the direction of the thickness of the ceramic substrate; and a plurality of radio frequency conductors embedded in a plurality of zones, respectively, of the ceramic substrate, as seen on the side of a surface of the ceramic substrate facing the wafer holder.
    Type: Grant
    Filed: April 4, 2018
    Date of Patent: December 7, 2021
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Koichi Kimura, Akira Mikumo, Shigenobu Sakita
  • Publication number: 20210375647
    Abstract: A wafer holder includes a mounting table that has a mounting surface for a workpiece at a top, a supporting member that supports the mounting table from a lower side, a first cylindrical member one end of which is joined hermetically to a lower surface of the mounting table, and a second cylindrical member that is provided inside the first cylindrical member and one end of which is joined hermetically to the lower surface of the mounting table.
    Type: Application
    Filed: August 13, 2021
    Publication date: December 2, 2021
    Applicant: Sumitomo Electric Industries, Ltd.
    Inventors: Koichi KIMURA, Akira MIKUMO
  • Patent number: 11127605
    Abstract: A wafer holder includes a mounting table that has a mounting surface for a workpiece at a top, a supporting member that supports the mounting table from a lower side, a first cylindrical member one end of which is joined hermetically to a lower surface of the mounting table, and a second cylindrical member that is provided inside the first cylindrical member and one end of which is joined hermetically to the lower surface of the mounting table.
    Type: Grant
    Filed: October 17, 2017
    Date of Patent: September 21, 2021
    Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
    Inventors: Koichi Kimura, Akira Mikumo
  • Publication number: 20210074568
    Abstract: A wafer holding unit includes a disk-shaped ceramic substrate having a wafer mounting surface on an upper surface of the substrate, an RF electrode, for example, embedded within the substrate, a metal terminal inserted from a lower surface of the substrate, and a connecting terminal which electrically connects the RF electrode and the metal terminal with each other. The connecting terminal is constituted by a ceramic member and a metal layer. The ceramic member is made of the same material as the substrate and preferably has a truncated conical shape. The metal layer covers a surface of the ceramic member. An upper end of the metal layer is connected to the RF electrode, while a lower end of the metal layer is connected to the metal terminal with a metal member interposed therebetween.
    Type: Application
    Filed: November 19, 2020
    Publication date: March 11, 2021
    Applicant: Sumitomo Electric Industries, Ltd.
    Inventors: Koichi KIMURA, Shigenobu SAKITA, Kenji SHINMA, Daisuke SHIMAO, Katsuhiro ITAKURA, Masuhiro NATSUHARA, Akira MIKUMO
  • Publication number: 20210062703
    Abstract: An exhaust gas purification device includes a selective catalytic reduction (SCR) device arranged in a downstream exhaust flow path, and a mixer arranged upstream of the selective catalytic reduction device and including a helical flow path that helically guides the flow of exhaust gas from an internal combustion engine. In the exhaust gas purification device, the mixer includes a casing, an injector, and a partition plate. The casing has an upstream opening and a downstream opening and is provided with the helical flow path therein. The injector is arranged in the helical flow path to add a reducing agent to the helical flow path. The partition plate is continuous from the upstream opening to the downstream opening. The partition plate is arranged to divide the inner space of the casing into an upstream side and a downstream side, and defines the helical flow path.
    Type: Application
    Filed: November 13, 2020
    Publication date: March 4, 2021
    Inventors: Koichi Kimura, Sachiko Yoshizawa, Kenichi Miyazawa
  • Publication number: 20210027988
    Abstract: A showerhead provided in a chamber of a semiconductor manufacturing apparatus and facing a wafer holder includes: a plate-shaped ceramic substrate; a plurality of through holes penetrating the ceramic substrate in the direction of the thickness of the ceramic substrate; and a plurality of radio frequency conductors embedded in a plurality of zones, respectively, of the ceramic substrate, as seen on the side of a surface of the ceramic substrate facing the wafer holder.
    Type: Application
    Filed: April 4, 2018
    Publication date: January 28, 2021
    Applicant: Sumitomo Electric Industries, Ltd.
    Inventors: Koichi KIMURA, Akira MIKUMO, Shigenobu SAKITA
  • Patent number: 10886157
    Abstract: A wafer holding unit includes a disk-shaped ceramic substrate having a wafer mounting surface on an upper surface of the substrate, an RF electrode, for example, embedded within the substrate, a metal terminal inserted from a lower surface of the substrate, and a connecting terminal which electrically connects the RF electrode and the metal terminal with each other. The connecting terminal is constituted by a ceramic member and a metal layer. The ceramic member is made of the same material as the substrate and preferably has a truncated conical shape. The metal layer covers a surface of the ceramic member. An upper end of the metal layer is connected to the RF electrode, while a lower end of the metal layer is connected to the metal terminal with a metal member interposed therebetween.
    Type: Grant
    Filed: July 1, 2016
    Date of Patent: January 5, 2021
    Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
    Inventors: Koichi Kimura, Shigenobu Sakita, Kenji Shinma, Daisuke Shimao, Katsuhiro Itakura, Masuhiro Natsuhara, Akira Mikumo
  • Publication number: 20200340102
    Abstract: A wafer holder comprising: a ceramic base having a wafer-mounting surface as an upper surface; and a conductive member embedded in the ceramic base, the conductive member including a circuit portion provided parallel to the wafer-mounting surface, a pull-out portion provided parallel to the wafer-mounting surface and spaced from the circuit portion in a direction opposite to a direction toward the wafer-mounting surface, and a connecting portion configured to electrically connect the circuit portion and the pull-out portion to each other.
    Type: Application
    Filed: February 8, 2018
    Publication date: October 29, 2020
    Applicant: Sumitomo Electric Industries, Ltd.
    Inventors: Koichi KIMURA, Akira MIKUMO, Shigenobu SAKITA, Daisuke SHIMAO
  • Patent number: 10669916
    Abstract: In a construction in which a turbine and an exhaust gas purification catalyst are arranged close to each other, and in which an exhaust gas sensor is arranged in an exhaust passage between the turbine and the exhaust gas purification catalyst, the exhaust gas sensor is suppressed from getting wet with condensed water. In an exhaust system for an internal combustion engine, an exhaust gas sensor is arranged in a circumferential direction of a specific exhaust passage in a position except a range which is reached by a bypass exhaust gas carried away by a turbine swirling flow.
    Type: Grant
    Filed: July 3, 2018
    Date of Patent: June 2, 2020
    Assignee: Toyota Jidosha Kabushiki Kaisha
    Inventors: Koichi Kimura, Yasuyuki Irisawa, Takashi Tsunooka
  • Publication number: 20200168435
    Abstract: A showerhead provided in a chamber of a semiconductor manufacturing apparatus and facing a wafer holder includes: a disk-shaped member having a plurality of through holes penetrating the disk-shaped member in a direction of a thickness thereof; a high-frequency conductor embedded in the disk-shaped member; a hole provided in the disk-shaped member, extending in the direction of the thickness of the disk-shaped member and having a bottom exposing a portion of the conductor; an electrode terminal portion disposed in the hole and having a base portion electrically connected to the conductor and a columnar portion provided on the base portion; a cylindrical member having a first end portion fitted outside the columnar portion and facing the conductor and a second end portion facing away from the first end portion, and a sealing member surrounding the first end portion.
    Type: Application
    Filed: June 25, 2018
    Publication date: May 28, 2020
    Applicant: Sumitomo Electric Industries, Ltd.
    Inventors: Koichi KIMURA, Akira MIKUMO
  • Patent number: 10655547
    Abstract: The internal combustion engine comprising: a catalyst arranged in an exhaust passage and able to store oxygen, a variable valve timing mechanism able to change a valve overlap amount between an intake valve and an exhaust valve, and a fuel supplying means for feeding fuel to the exhaust passage. The fuel supplying means feeds fuel to the exhaust passage only in an initial cycle after scavenging where valve overlap causes air to be expelled from an intake passage through a cylinder to the exhaust passage if such scavenging occurs.
    Type: Grant
    Filed: June 3, 2016
    Date of Patent: May 19, 2020
    Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Koichi Kimura, Takuya Okubo, Norihisa Nakagawa