Patents by Inventor Koichi Obata

Koichi Obata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11179958
    Abstract: Printed matter including a viewed-page detection electrode provided to a primary surface of a first printed medium among a plurality of bound printed media, the viewed-page detection electrode being so disposed that, when the printed matter is closed, at least part of the electrode provided to a first page overlaps with an electrode provided to a second page facing the first page; a selected-area detection electrode provided to the primary surface and located at a position different from the viewed-page detection electrode; a first determination unit connected to the viewed-page detection electrode to determine a page that is currently open based on capacitance generated in the viewed-page detection electrode; and a second determination unit connected to the selected-area detection electrode to determine whether the selected-area detection electrode of the open page has been touched by a user based on capacitance generated in the selected-area detection electrode.
    Type: Grant
    Filed: September 25, 2018
    Date of Patent: November 23, 2021
    Assignee: TOPPAN PRINTING, CO., LTD.
    Inventors: Koichi Obata, Koichi Yoshino
  • Publication number: 20190025963
    Abstract: Printed matter including a viewed-page detection electrode provided to a primary surface of a first printed medium among a plurality of bound printed media, the viewed-page detection electrode being so disposed that, when the printed matter is closed, at least part of the electrode provided to a first page overlaps with an electrode provided to a second page facing the first page; a selected-area detection electrode provided to the primary surface and located at a position different from the viewed-page detection electrode; a first determination unit connected to the viewed-page detection electrode to determine a page that is currently open based on capacitance generated in the viewed-page detection electrode; and a second determination unit connected to the selected-area detection electrode to determine whether the selected-area detection electrode of the open page has been touched by a user based on capacitance generated in the selected-area detection electrode.
    Type: Application
    Filed: September 25, 2018
    Publication date: January 24, 2019
    Applicant: TOPPAN PRINTING CO., LTD.
    Inventors: Koichi OBATA, Koichi YOSHINO
  • Patent number: 10128136
    Abstract: There is provided a guide member 3 in which an inclined surface 32 thereof is inclined downwardly outwards from an edge portion of a rear surface of a horizontally held wafer W; and a cylindrical surrounding member 2 which surrounds the wafer W and in which an upper peripheral portion thereof is inwardly extended obliquely upwards. Further, the surrounding member 2 has, at an inner surface side thereof, two groove portions 23 extended along an entire circumference and located above a height position of the horizontally held wafer W. If an air flow flows along the surrounding member 2, a vortex flow is formed within the groove portions 23 and stays therein. Thus, mist can be captured, so that the flow of the mist to the outside of a cup body 1 can be suppressed. Accordingly, the adhesion of the mist to the wafer W can be suppressed.
    Type: Grant
    Filed: August 8, 2017
    Date of Patent: November 13, 2018
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Masahiro Fukuda, Hiroshi Ichinomiya, Koichi Obata, Taro Yamamoto, Kouichirou Tanaka
  • Publication number: 20180047592
    Abstract: There is provided a guide member 3 in which an inclined surface 32 thereof is inclined downwardly outwards from an edge portion of a rear surface of a horizontally held wafer W; and a cylindrical surrounding member 2 which surrounds the wafer W and in which an upper peripheral portion thereof is inwardly extended obliquely upwards. Further, the surrounding member 2 has, at an inner surface side thereof, two groove portions 23 extended along an entire circumference and located above a height position of the horizontally held wafer W. If an air flow flows along the surrounding member 2, a vortex flow is formed within the groove portions 23 and stays therein. Thus, mist can be captured, so that the flow of the mist to the outside of a cup body 1 can be suppressed. Accordingly, the adhesion of the mist to the wafer W can be suppressed.
    Type: Application
    Filed: August 8, 2017
    Publication date: February 15, 2018
    Inventors: Masahiro Fukuda, Hiroshi Ichinomiya, Koichi Obata, Taro Yamamoto, Kouichirou Tanaka
  • Patent number: 8808798
    Abstract: A coating method includes supplying a coating liquid from a coating nozzle onto a front side central portion of a substrate held on a substrate holding member, rotating the substrate holding member about a vertical axis to spread the coating liquid toward a peripheral portion of the substrate by a centrifugal force and thereby form a film of the coating liquid, forming a liquid film of a process liquid for preventing a contaminant derived from the coating liquid from being deposited or left on a back side peripheral portion of the substrate, and damping a vertical wobble of the peripheral portion of the substrate being rotated, by a posture regulating mechanism, while delivering a gas from delivery holes onto a back side region of the substrate on an inner side of the peripheral portion on which the liquid film is formed.
    Type: Grant
    Filed: August 8, 2012
    Date of Patent: August 19, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Takahiro Kitano, Koichi Obata, Hiroichi Inada, Nobuhiro Ogata
  • Patent number: 8551563
    Abstract: A coating method includes holding a substrate in a horizontal state on a substrate holding member; supplying a coating liquid onto a front side central portion of the substrate held on the substrate holding member; rotating the substrate holding member about a vertical axis to spread the coating liquid supplied on the front side central portion of the substrate toward a front side peripheral portion of the substrate by a centrifugal force; and damping a wobble of the substrate being rotated, by a wobble damping mechanism including a gas delivery port and a suction port both disposed to face a back side of the substrate, while delivering a gas from the delivery port and sucking the gas into the suction port.
    Type: Grant
    Filed: May 3, 2012
    Date of Patent: October 8, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Takahiro Kitano, Koichi Obata, Hiroichi Inada, Nobuhiro Ogata
  • Publication number: 20120301612
    Abstract: A coating method includes supplying a coating liquid from a coating nozzle onto a front side central portion of a substrate held on a substrate holding member, rotating the substrate holding member about a vertical axis to spread the coating liquid toward a peripheral portion of the substrate by a centrifugal force and thereby form a film of the coating liquid, forming a liquid film of a process liquid for preventing a contaminant derived from the coating liquid from being deposited or left on a back side peripheral portion of the substrate, and damping a vertical wobble of the peripheral portion of the substrate being rotated, by a posture regulating mechanism, while delivering a gas from delivery holes onto a back side region of the substrate on an inner side of the peripheral portion on which the liquid film is formed.
    Type: Application
    Filed: August 8, 2012
    Publication date: November 29, 2012
    Applicant: Tokyo Electron Limited
    Inventors: Takahiro KITANO, Koichi OBATA, Hiroichi INADA, Nobuhiro OGATA
  • Patent number: 8256370
    Abstract: A coating apparatus includes a liquid film forming mechanism configured to form a liquid film of a process liquid for preventing a contaminant derived from a coating liquid from being deposited or left on a back side peripheral portion of a substrate. The liquid film forming mechanism includes a counter face portion facing the back side peripheral portion of the substrate and a process liquid supply portion for supplying the process liquid onto the counter face portion. The coating apparatus further includes a posture regulating mechanism disposed around the substrate holding member and configured to damp a vertical wobble of the peripheral portion of the substrate being rotated. The posture regulating mechanism includes delivery holes arrayed in a rotational direction of the substrate and configured to deliver a gas onto a back side region of the substrate on an inner side of the peripheral portion.
    Type: Grant
    Filed: February 23, 2009
    Date of Patent: September 4, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Takahiro Kitano, Koichi Obata, Hiroichi Inada, Nobuhiro Ogata
  • Publication number: 20120213925
    Abstract: A coating method includes holding a substrate in a horizontal state on a substrate holding member; supplying a coating liquid onto a front side central portion of the substrate held on the substrate holding member; rotating the substrate holding member about a vertical axis to spread the coating liquid supplied on the front side central portion of the substrate toward a front side peripheral portion of the substrate by a centrifugal force; and damping a wobble of the substrate being rotated, by a wobble damping mechanism including a gas delivery port and a suction port both disposed to face a back side of the substrate, while delivering a gas from the delivery port and sucking the gas into the suction port.
    Type: Application
    Filed: May 3, 2012
    Publication date: August 23, 2012
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Takahiro Kitano, Koichi Obata, Hiroichi Inada, Nobuhiro Ogata
  • Patent number: 8225737
    Abstract: A coating apparatus includes a driving unit configured to rotate a substrate holding member about a vertical axis to spread a coating liquid supplied on a front side central portion of a substrate toward a front side peripheral portion of the substrate by a centrifugal force. The apparatus is provided with a wobble damping mechanism including a gas delivery port and a suction port both disposed to face a back side of the substrate and configured to damp a wobble of the substrate being rotated by delivering a gas from the delivery port and sucking the gas into the suction port.
    Type: Grant
    Filed: February 27, 2009
    Date of Patent: July 24, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Takahiro Kitano, Koichi Obata, Hiroichi Inada, Nobuhiro Ogata
  • Publication number: 20090285984
    Abstract: A coating apparatus includes a driving unit configured to rotate a substrate holding member about a vertical axis to spread a coating liquid supplied on a front side central portion of a substrate toward a front side peripheral portion of the substrate by a centrifugal force. The apparatus is provided with a wobble damping mechanism including a gas delivery port and a suction port both disposed to face a back side of the substrate and configured to damp a wobble of the substrate being rotated by delivering a gas from the delivery port and sucking the gas into the suction port.
    Type: Application
    Filed: February 27, 2009
    Publication date: November 19, 2009
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Takahiro KITANO, Koichi OBATA, Hiroichi INADA, Nobuhiro OGATA
  • Publication number: 20090285991
    Abstract: A coating apparatus includes a liquid film forming mechanism configured to form a liquid film of a process liquid for preventing a contaminant derived from a coating liquid from being deposited or left on a back side peripheral portion of a substrate. The liquid film forming mechanism includes a counter face portion facing the back side peripheral portion of the substrate and a process liquid supply portion for supplying the process liquid onto the counter face portion. The coating apparatus further includes a posture regulating mechanism disposed around the substrate holding member and configured to damp a vertical wobble of the peripheral portion of the substrate being rotated. The posture regulating mechanism includes delivery holes arrayed in a rotational direction of the substrate and configured to deliver a gas onto a back side region of the substrate on an inner side of the peripheral portion.
    Type: Application
    Filed: February 23, 2009
    Publication date: November 19, 2009
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Takahiro Kitano, Koichi Obata, Hiroichi Inada, Nobuhiro Ogata
  • Patent number: 4988524
    Abstract: Disclosed is an oil and fat emulsified product, comprising an oil and fat which is solid at normal temperature and emulsified by use of a casein alkali salt decomposed with a milk coagulating enzyme. Disclosed is also a method for processing raw meat, which comprises injecting an aqueous mixture of the oil and fat emulsified product in the above and calcium ions into raw meat tissue, followed by coagulation and fixing of the emulsion.
    Type: Grant
    Filed: October 20, 1989
    Date of Patent: January 29, 1991
    Assignee: Wakodo Co., Ltd.
    Inventors: Koichi Obata, Yoshihiko Noriuchi