Patents by Inventor Koichi Saruwatari

Koichi Saruwatari has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7276293
    Abstract: The present invention discloses a far infrared radiator used in various types of heating equipment. This far infrared radiator is comprised of a base material 1 composed of aluminum or aluminum alloy, and an electrolytic colored film 2 formed on this base material 1. Fine irregularities are formed in the surface of the electrolytic colored film, and nickel or cobalt is heterogeneously deposited from the bottoms to the openings in micropores of this film 2. Electrolytic colored film 2 is obtained by performing electrolysis treatment in a nickel bath or cobalt bath using an alumite film 3, formed on the surface of base material 1 having fine irregularities, as the cathode.
    Type: Grant
    Filed: May 24, 2000
    Date of Patent: October 2, 2007
    Assignee: Fujikura Ltd.
    Inventors: Koichi Saruwatari, Maejima Masatsugu, Hirata Masanori, Ito Hiroshi, Teramoto Keigo
  • Patent number: 5336341
    Abstract: An infrared radiation element and a process for producing the same. An aluminum alloy material consists essentially of 0.3 to 4.3 weight % of Mn, balance Al, and impurities. The alluminum alloy material is heated for dispersing a precipitate of an Al--Mn intermetallic compound at a density of at a minimum 1.times.10.sup.5 /mm.sup.3 for a size of 0.1 .mu.m to 3 .mu.m. The heated aluminum alloy material is anodized to form an anodic oxide layer thereon.
    Type: Grant
    Filed: August 30, 1991
    Date of Patent: August 9, 1994
    Assignees: Fujikura Ltd., Sky Aluminium Co., Ltd.
    Inventors: Masatsugu Maejima, Koichi Saruwatari, Akihito Kurosaka, Mamoru Matsuo, Hiroyoshi Gunji, Toshiki Muramatsu
  • Patent number: 4726443
    Abstract: A diaphragm using a metal material applied with anodic oxide films, in which said metal material contains one of lead compounds, inorganic metal compounds and phosphor compounds at least to a portion in the micropores of the anodic oxide film.
    Type: Grant
    Filed: October 3, 1985
    Date of Patent: February 23, 1988
    Assignee: Sony Corporation and Fujikura Ltd.
    Inventors: Masana Ugaji, Shinichi Watanabe, Hiroyuki Sogawa, Nobuo Fuke, Masatsugu Maejima, Koichi Saruwatari
  • Patent number: 4368107
    Abstract: A method of the surface treatment of a porous material which comprises the step of electrolyzing the porous material in an electrolytic bath composed of an aqueous solution of at least one salt selected from the group consisting of alkali metal thiotungstate, alkali metal thioantimonate, alkali metal thiostannate, alkali metal thiocuprate, alkali metal thioarsenate, alkali metal thioaurate, alkali metal thioplatinate, alkali metal thioniobate, alkali metal thiovanadate, alkaline earth metal thiotungstate, alkaline earth metal thioantimonate, alkaline earth metal thiostannate, alkaline earth metal thiocuprate, alkaline earth metal thioarsenate, alkaline earth metal thioaurate, alkaline earth metal thioplatinate, alkaline earth metal thioniobate, alkaline earth metal thiovanadate, ammonium thiotungstate, ammonium thioantimonate, ammonium thiostannate, ammonium thiocuprate, ammonium thioarsenate, ammonium thioaurate, ammonium thioplatinate, ammonium thioniobate and ammonium thiovanadate, to thereby impregnate th
    Type: Grant
    Filed: June 11, 1981
    Date of Patent: January 11, 1983
    Assignee: Fujikura Cable Works, Ltd.
    Inventors: Masatsugu Maejima, Koichi Saruwatari, Kazuo Isawa