Patents by Inventor Koichi Wago

Koichi Wago has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170125049
    Abstract: Provided herein is a method, including creating a first pattern in a data region of a substrate, and creating a second pattern in a servo region of a substrate. A circumferential line pattern is created overlapping the first pattern to create rectangle-shaped protrusions in the data region of the substrate. A chevron pattern is created overlapping the second pattern to create chevron-derived protrusions in the servo region of the substrate.
    Type: Application
    Filed: January 10, 2017
    Publication date: May 4, 2017
    Inventors: Shuaigang Xiao, David S. Kuo, XiaoMin Yang, Kim Y. Lee, Yautzong Hsu, Koichi Wago
  • Patent number: 9620161
    Abstract: Provided herein is an apparatus, including a first region of a substrate corresponding to a data region in a patterned recording medium; a first set of protrusions etched out of the first region of the substrate, wherein the protrusions of the first set of protrusions are rectangle shaped; a second region of the substrate corresponding to a servo region in a patterned recording medium; and a second set of protrusions etched out of the second region of the substrate, wherein the second set of protrusions includes radial lines etched into the substrate across chevrons etched out of the substrate.
    Type: Grant
    Filed: April 16, 2015
    Date of Patent: April 11, 2017
    Assignee: Seagate Technology LLC
    Inventors: Shuaigang Xiao, David S. Kuo, XiaoMin Yang, Kim Y. Lee, Yautzong Hsu, Koichi Wago
  • Patent number: 9605348
    Abstract: Provided herein is an apparatus, including a substrate; an etch stop layer overlying the substrate, wherein the etch stop layer is substantially resistant to etching conditions; and a patterned layer overlying the etch stop layer, wherein the patterned layer is substantially labile to the etching conditions, and wherein the patterned layer comprises a number of features including substantially consistent feature profiles among regions of high feature density and regions of low feature density.
    Type: Grant
    Filed: May 20, 2016
    Date of Patent: March 28, 2017
    Assignee: Seagate Technology LLC
    Inventors: Michael R. Feldbaum, Koichi Wago, Gennady Gauzner, Kim Y. Lee, David S. Kuo
  • Publication number: 20170025141
    Abstract: The embodiments disclose a method including patterning a template substrate to have different densities using hierarchical block copolymer density patterns in different zones including a first pattern and a second pattern, using a first directed self-assembly to pattern a first zone in the substrate using a first block copolymer material, and using a second directed self-assembly to pattern a second zone in the substrate using a second block copolymer material.
    Type: Application
    Filed: October 10, 2016
    Publication date: January 26, 2017
    Inventors: XiaoMin Yang, Shuaigang Xiao, Kim Y. Lee, Koichi Wago, Philip Steiner
  • Patent number: 9489974
    Abstract: The embodiments disclose a method including patterning a template substrate to have different densities using hierarchical block copolymer density patterns in different zones including a first pattern and a second pattern, using a first directed self-assembly to pattern a first zone in the substrate using a first block copolymer material, and using a second directed self-assembly to pattern a second zone in the substrate using a second block copolymer material.
    Type: Grant
    Filed: April 11, 2014
    Date of Patent: November 8, 2016
    Assignee: Seagate Technology LLC
    Inventors: XiaoMin Yang, Shuaigang Xiao, Kim Y. Lee, Koichi Wago, Philip Steiner
  • Patent number: 9460747
    Abstract: A method for nano-patterning includes imprinting features in a resist with an imprint mold to form one or more topographic surface patterns on the imprinted resist. A block copolymer (“BCP”) material is deposited on the imprinted resist, wherein a molecular dimension L0 of the BCP material correlates by an integer multiple to a spacing dimension of the one or more topographic surface patterns on the imprinted resist. The deposited BCP is annealed and at least a portion of the annealed BCP is removed, forming a template having discrete domains.
    Type: Grant
    Filed: August 19, 2015
    Date of Patent: October 4, 2016
    Assignee: Seagate Technology LLC
    Inventors: Yuan Xu, Kim Y. Lee, David S. Kuo, Koichi Wago, Wei Hu
  • Publication number: 20160265119
    Abstract: Provided herein is an apparatus, including a substrate; an etch stop layer overlying the substrate, wherein the etch stop layer is substantially resistant to etching conditions; and a patterned layer overlying the etch stop layer, wherein the patterned layer is substantially labile to the etching conditions, and wherein the patterned layer comprises a number of features including substantially consistent feature profiles among regions of high feature density and regions of low feature density.
    Type: Application
    Filed: May 24, 2016
    Publication date: September 15, 2016
    Inventors: Michael R. Feldbaum, Koichi Wago, Gennady Gauzner, Kim Y. Lee, David S. Kuo
  • Publication number: 20160266493
    Abstract: Provided herein is an apparatus, including a substrate; an etch stop layer overlying the substrate, wherein the etch stop layer is substantially resistant to etching conditions; and a patterned layer overlying the etch stop layer, wherein the patterned layer is substantially labile to the etching conditions, and wherein the patterned layer comprises a number of features including substantially consistent feature profiles among regions of high feature density and regions of low feature density.
    Type: Application
    Filed: May 20, 2016
    Publication date: September 15, 2016
    Inventors: Michael R. Feldbaum, Koichi Wago, Gennady Gauzner, Kim Y. Lee, David S. Kuo
  • Patent number: 9370907
    Abstract: Provided herein is an apparatus, including a substrate; an etch stop layer overlying the substrate, wherein the etch stop layer is substantially resistant to etching conditions; and a patterned layer overlying the etch stop layer, wherein the patterned layer is substantially labile to the etching conditions, and wherein the patterned layer comprises a number of features including substantially consistent feature profiles among regions of high feature density and regions of low feature density.
    Type: Grant
    Filed: March 20, 2014
    Date of Patent: June 21, 2016
    Assignee: Seagate Technology LLC
    Inventors: Michael R. Feldbaum, Koichi Wago, Gennady Gauzner, Kim Y. Lee, David S. Kuo
  • Patent number: 9299380
    Abstract: Provided herein is a method including oxidizing tops of features of a patterned magnetic layer to form oxidized tops of the features; removing an excess of an applied first protective material down to at least the oxidized tops of the features to form a planarized layer; and applying a second protective material over the planarized layer.
    Type: Grant
    Filed: October 24, 2013
    Date of Patent: March 29, 2016
    Assignee: Seagate Technology LLC
    Inventors: Michael R. Feldbaum, Koichi Wago, Bin Lu, David S. Kuo
  • Publication number: 20150356989
    Abstract: A method for nano-patterning includes imprinting features in a resist with an imprint mold to form one or more topographic surface patterns on the imprinted resist. A block copolymer (“BCP”) material is deposited on the imprinted resist, wherein a molecular dimension L0 of the BCP material correlates by an integer multiple to a spacing dimension of the one or more topographic surface patterns on the imprinted resist. The deposited BCP is annealed and at least a portion of the annealed BCP is removed, forming a template having discrete domains.
    Type: Application
    Filed: August 19, 2015
    Publication date: December 10, 2015
    Inventors: Yuan Xu, Kim Y. Lee, David S. Kuo, Koichi Wago, Wei Hu
  • Patent number: 9181618
    Abstract: Provided herein is a method including conformally depositing a first layer over a patterned resist; depositing a second, thicker layer over the first layer; etching the second layer to expose the first layer; and patterning a magnetic layer by ion implantation in accordance with the patterned resist to form a patterned magnet layer.
    Type: Grant
    Filed: March 2, 2015
    Date of Patent: November 10, 2015
    Assignee: Seagate Technology LLC
    Inventors: Michael Feldbaum, Koichi Wago, David Kuo
  • Publication number: 20150294680
    Abstract: The embodiments disclose a method including patterning a template substrate to have different densities using hierarchical block copolymer density patterns in different zones including a first pattern and a second pattern, using a first directed self-assembly to pattern a first zone in the substrate using a first block copolymer material, and using a second directed self-assembly to pattern a second zone in the substrate using a second block copolymer material.
    Type: Application
    Filed: April 11, 2014
    Publication date: October 15, 2015
    Applicant: SEAGATE TECHNOLGOY LLC
    Inventors: XiaoMin Yang, Shuaigang Xiao, Kim Y. Lee, Koichi Wago, Philip Steiner
  • Publication number: 20150266233
    Abstract: Provided herein is an apparatus, including a substrate; an etch stop layer overlying the substrate, wherein the etch stop layer is substantially resistant to etching conditions; and a patterned layer overlying the etch stop layer, wherein the patterned layer is substantially labile to the etching conditions, and wherein the patterned layer comprises a number of features including substantially consistent feature profiles among regions of high feature density and regions of low feature density.
    Type: Application
    Filed: March 20, 2014
    Publication date: September 24, 2015
    Applicant: SEAGATE TECHNOLOGY LLC
    Inventors: Michael R. Feldbaum, Koichi Wago, Gennady Gauzner, Kim Y. Lee, David S. Kuo
  • Publication number: 20150246476
    Abstract: The embodiments disclose an analyzer configured to determine positions of circumferential gratings track features and alignment patterns in a first template and a phase device configured to determine positions of radial gratings features and interspersed pattern fields in a second template, wherein the first template is transferred and cross-imprinted with the second template features and patterns to form a third template substrate as a rectangular patterned stack imprint template.
    Type: Application
    Filed: March 2, 2014
    Publication date: September 3, 2015
    Applicant: Seagate Technology LLC
    Inventors: Philip Steiner, Kim Y. Lee, Koichi Wago, Bruce Buch, David S. Kuo
  • Publication number: 20150167155
    Abstract: Provided herein is a method including conformally depositing a first layer over a patterned resist; depositing a second, thicker layer over the first layer; etching the second layer to expose the first layer; and patterning a magnetic layer by ion implantation in accordance with the patterned resist to form a patterned magnet layer.
    Type: Application
    Filed: March 2, 2015
    Publication date: June 18, 2015
    Inventors: Michael Feldbaum, Koichi Wago, David Kuo
  • Patent number: 9005699
    Abstract: A method for manufacturing a magnetic recording medium includes the steps of (a) forming a perpendicular magnetic recording layer and (b) applying an ion beam to regions between tracks of the perpendicular magnetic recording layer so as to form separation regions for magnetically separating the tracks from each other. In the step (a), a continuous film layer composed of a multilayer film is formed, and CoB layers and Pd layers are laminated in the multilayer film. In the step (b), the CoB layers and the Pd layers are melted by the ion beam so as to form an alloy of metals contained in the CoB layers and the Pd layers to thereby form the separation regions.
    Type: Grant
    Filed: September 27, 2007
    Date of Patent: April 14, 2015
    Assignee: WD Media, LLC
    Inventors: Yoshiaki Sonobe, Teiichiro Umezawa, Koichi Wago
  • Patent number: 8946835
    Abstract: A planarization process may planarize a media disk that has data trenches between data features and larger servo trenches between servo features. A filler material layer is deposited on the media disk and provides step coverage of the trenches. The filler material has data recesses over the data trenches and servo recesses over the servo trenches that must be removed to produce a planar media surface. A first planarization process is used to remove the data recesses and a second planarization process is used to remove the servo recesses.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: February 3, 2015
    Assignee: Seagate Technology LLC
    Inventors: Yuan Xu, Wei Hu, Justin Jia-Jen Hwu, Gene Gauzner, Koichi Wago, David Shiao-Min Kuo
  • Patent number: 8941938
    Abstract: Provided herein is an apparatus, including a first region corresponding to a data region in a patterned recording medium; a first set of features in the first region; a second region corresponding to a servo region in a patterned recording medium; and a second set of features in the second region including rhomboidal protrusions, wherein the first set of features and the second set of features are circumferentially aligned in accordance with concentrically circular lines etched into the apparatus across the first region and the second region.
    Type: Grant
    Filed: April 17, 2014
    Date of Patent: January 27, 2015
    Assignee: Seagate Technology LLC
    Inventors: Shuaigang Xiao, XiaoMin Yang, David S. Kuo, Kim Y. Lee, Koichi Wago, Yautzong Hsu
  • Publication number: 20150017482
    Abstract: The embodiments disclose a plasmonic cladding structure including at least one conformal plasmonic cladding structure wrapped around plural stack features of a recording device, wherein the conformal plasmonic cladding structure is configured to create a near-field transducer in close proximity to a recording head of the recording device, at least one conformal plasmonic cladding structure with substantially removed top surfaces of the stack features with exposed magnetic layer materials and a thermally insulating filler configured to be located between the stack features.
    Type: Application
    Filed: October 16, 2013
    Publication date: January 15, 2015
    Applicant: Seagate Technology LLC
    Inventors: Kim Y. Lee, Ganping Ju, Chubing Peng, Xiaobin Zhu, Yingguo Peng, Yukiko A. Kubota, Timothy J. Klemmer, Jan-Ulrich Thiele, Michael A. Seigler, Werner Scholz, David S. Kuo, Koichi Wago, Thomas P. Nolan