Abstract: A substrate supporting apparatus includes a substrate support that supports a substrate. A first connecting member is connected to the substrate support and includes a first magnet. A second connecting member faces the first connecting member and is connectable to a transport robot for transporting the substrate to a substrate holder. The second connecting member includes a second magnet magnetically coupled with the first magnet. A spacer is configured to hold an interval between the first connecting member and the second connecting member. The first connecting member and the second connecting member are relatively movable in a plane direction of the substrate via the spacer.

Abstract: A sputtering apparatus to form a film on a substrate includes an electrode arranged in a vacuum chamber and having a placing surface to place a target on it, a stationary portion provided on the peripheral portion of the placing surface, a shutter mechanism to shield in the vacuum chamber the target placed on the placing surface, and a moving mechanism which sets in the vacuum chamber the shutter mechanism at a predetermined position. Of the stationary portion and the movable portion of the shutter mechanism, one is provided with a recess and the other one is provided with a projection. When the moving mechanism sets the shutter mechanism at a position close to the stationary portion, the projection is inserted in the recess.