Abstract: Provided is a hard coating film having excellent sand abrasion resistance. The present invention relates to a hard coating film (20) including a nitride containing Al and Cr as main components, the hard coating film (20) having a thickness of 6 ?m or more.

Abstract: Provided is a film formation method that includes: an etching step of etching the surface of the substrate by bringing inert gas ions into collision with the surface of the substrate, the inert gas ions generated in a chamber accommodating the substrate; an implantation step of bringing inert gas ions into collision with metal particles deposited on the surface of the substrate to thereby hit the metal particles into the surface of the substrate while bringing the inert gas ions into collision with a metal target to thereby cause the metal particles to sputter out of the metal target and depositing the metal particles on the surface of the substrate etched in the etching step; and a film formation step of forming the film on the surface of the substrate into which the metal particles have been hit in the implantation step.

Abstract: Provided are a nitriding apparatus and a method of nitriding, which are capable of suppressing generation of a compound layer by accurately measuring temperature of an object to be treated by nitriding. A nitriding apparatus includes a chamber, a gas supplying unit, a support, a plasma source, a heater, a thermocouple wire including a temperature measuring section, an accommodating member, a power supply for an object to be treated, and a treatment condition control unit. The accommodating member internally accommodates the thermocouple wire to cover the temperature measuring section, while being insulated from the thermocouple wire. The power supply for an object to be treated applies a predetermined voltage to an object to be treated and the housing member so that the object to be treated and the accommodating member are set to an identical potential on the negative side.

Abstract: Provided is a film formation method that includes: an etching step of etching the surface of the substrate by bringing inert gas ions into collision with the surface of the substrate, the inert gas ions generated in a chamber accommodating the substrate; an implantation step of bringing inert gas ions into collision with metal particles deposited on the surface of the substrate to thereby hit the metal particles into the surface of the substrate while bringing the inert gas ions into collision with a metal target to thereby cause the metal particles to sputter out of the metal target and depositing the metal particles on the surface of the substrate etched in the etching step; and a film formation step of forming the film on the surface of the substrate into which the metal particles have been hit in the implantation step.

Abstract: A laminated coating film according to the present invention comprises at least one coating film (A) and at least one coating film (B) laminated on each other and has excellent abrasion resistance. [Coating film (A)] The compositional formula is (M1-aSia)(BxCyN1-x-y) (wherein M represents at least one element selected from the group consisting of a Group-4 element, a Group-5 element, a Group-6 element and Al; and a, x and y respectively represent the atomic ratios of Si, B and C), wherein a, x and y respectively fulfill the formulae: 0.05?a?0.35, 0?x?0.15 and 0?y?0.5. [Coating film (B)] The compositional formula is L(BxCyN1-x-y) (wherein L represents at least one element selected from the group consisting of W, Mo and V; and x and y respectively represent the atomic ratios of B and C), wherein x and y respectively fulfill the formulae: 0?x?0.15 and 0?y?0.5.

Abstract: A laminated coating film according to the present invention comprises at least one coating film (A) and at least one coating film (B) laminated on each other and has excellent abrasion resistance. [Coating film (A)] The compositional formula is (M1-aSia)(BxCyN1-x-y) (wherein M represents at least one element selected from the group consisting of a Group-4 element, a Group-5 element, a Group-6 element and Al; and a, x and y respectively represent the atomic ratios of Si, B and C), wherein a, x and y respectively fulfil the formulae: 0.05?a?0.35, 0?x?0.15 and 0?y?0.5. [Coating film (B)] The compositional formula is L(BxCyN1-x-y) (wherein L represents at least one element selected from the group consisting of W, Mo and V; and x and y respectively represent the atomic ratios of B and C), wherein x and y respectively fulfil the formulae: 0?x?0.15 and 0?y?0.5.

Abstract: A sliding member includes: a substrate which has a sliding surface sliding under the presence of lubricating oil; and a film which is fixed to at least a part of the sliding surface. The film contains carbon (C), titanium (Ti), and boron (B), is obtained by repeatedly and alternately layering a first layer containing amorphous carbon as a principal component and a second layer containing C and Ti as principal components, and has hardness of 18 GPa or more.

Abstract: A diamondlike carbon hard multilayer formed film body comprises a substrate, a diamondlike carbon film mainly composed of diamondlike carbon, and an intermediate layer between the substrate and the diamondlike carbon film. The diamondlike carbon film is composed of, in order from the substrate side, a first diamondlike carbon film and a second diamondlike carbon film. The surface hardness of the first diamondlike carbon film is within the range from not less than 10 GPa to not more than 40 GPa based on nanoindentation test, and the surface hardness of the second diamondlike carbon film is within the range from more than 40 GPa to not more than 90 GPa based on nanoindentation test.

Abstract: A sliding member includes: a substrate which has a sliding surface sliding under the presence of lubricating oil; and a film which is fixed to at least a part of the sliding surface. The film contains carbon (C), titanium (Ti), and boron (B), is obtained by repeatedly and alternately layering a first layer containing amorphous carbon as a principal component and a second layer containing C and Ti as principal components, and has hardness of 18 GPa or more.

Abstract: In a cutting edge of a razor blade, a non-nitrided layer containing Ti, Al, and Cr formed on opposite surfaces of a base plate as a portion of a coating layer. A remaining layer containing Ti, Al, Cr, and N formed on opposite surfaces of the non-nitrided layer as a portion of a nitrided layer of the coating layer. A surface layer containing Ti, Al, Cr, and N formed on opposite surfaces of the remaining layer as a portion of the nitrided layer of the coating layer. A fluororesin layer formed on opposite surfaces of the surface layer with a bonding layer containing Cr and Al in between. The coating layer further improves the cutting edge, enhances cutting performance of the cutting edge, and maintains the enhanced cutting performance to improve the durability of the cutting edge.

Abstract: In a cutting edge of a razor blade, a non-nitrided layer containing Ti, Al, and Cr is formed on opposite surfaces of a base plate as a portion of a coating layer. A remaining layer containing Ti, Al, Cr, and N is formed on opposite surfaces of the non-nitrided layer as a portion of a nitrided layer of the coating layer. A surface layer containing Ti, Al, Cr, and N is formed on opposite surfaces of the remaining layer as a portion of the nitrided layer of the coating layer. A fluororesin layer is formed on opposite surfaces of the surface layer with a bonding layer containing Cr and Al in between. The coating layer including the non-nitrided layer and the nitrided layer further improves the cutting edge, enhances cutting performance of the cutting edge, and maintains the enhanced cutting performance to improve the durability of the cutting edge.

Abstract: A diamondlike carbon hard multilayer formed film body comprises a substrate, a diamondlike carbon film mainly composed of diamondlike carbon, and an intermediate layer between the substrate and the diamondlike carbon film. The diamondlike carbon film is composed of, in order from the substrate side, a first diamondlike carbon film and a second diamondlike carbon film. The surface hardness of the first diamondlike carbon film is within the range from not less than 10 GPa to not more than 40 GPa based on nanoindentation test, and the surface hardness of the second diamondlike carbon film is within the range from more than 40 GPa to not more than 90 GPa based on nanoindentation test.

Abstract: A diamondlike carbon hard multilayer formed film body comprises a substrate, a diamondlike carbon film mainly composed of diamondlike carbon, and an intermediate layer between the substrate and the diamondlike carbon film. The diamondlike carbon film is composed of, in order from the substrate side, a first diamondlike carbon film and a second diamondlike carbon film. The surface hardness of the first diamondlike carbon film is within the range from not less than 10 GPa to not more than 40 GPa based on nanoindentation test, and the surface hardness of the second diamondlike carbon film is within the range from more than 40 GPa to not more than 90 GPa based on nanoindentation test.

Abstract: An object of the present invention is to alter the shape of the magnetic field with ease in the state of auxiliary magnet poles being disposed in a sputtering apparatus. In a sputtering apparatus according to the present invention, one or more magnetron type sputtering evaporation sources 3 and one or more auxiliary magnet poles 9 are disposed in a chamber 1 so as to surround a solid substance 2 to be deposited, wherein an angle changing mechanism for changing the alignment angle of the auxiliary magnet poles 9 relative to the solid substance 2 to be deposited in order to alter the shape of the magnetic field formed by the magnetron type sputtering evaporation sources 3 and the auxiliary magnet poles 9.

Abstract: A multilayer film formed body comprises an outermost layer comprising a diamondlike carbon film, a substrate comprising an iron material, and an intermediate layer comprising a first layer on the substrate side, and a second layer on the outermost layer side. The first layer comprises at least either metal of Cr and Al, and a second layer comprises an amorphous layer including carbon and at least either metal of Cr and Al. The second layer has a gradient structure where the metal decreases as the position becomes closer to the outermost layer. The hardness of the second layer increases stepwise or continuously as the position becomes closer to the outermost layer. The hardness of the second layer close to the first layer is close to the hardness of the first layer. The hardness of the second layer close to the outermost layer is close to the hardness of the outermost layer.

Abstract: An object of the present invention is to alter the shape of the magnetic field with ease in the state of auxiliary magnet poles being disposed in a sputtering apparatus.

Abstract: A multilayer film formed body comprises an outermost layer comprising a diamondlike carbon film, a substrate comprising an iron material, and an intermediate layer comprising a first layer on the substrate side, and a second layer on the outermost layer side. The first layer comprises at least either metal of Cr and Al, and a second layer comprises an amorphous layer including carbon and at least either metal of Cr and Al. The second layer has a gradient structure where the metal decreases as the position becomes closer to the outermost layer. The hardness of the second layer increases stepwise or continuously as the position becomes closer to the outermost layer. The hardness of the second layer close to the first layer is close to the hardness of the first layer. The hardness of the second layer close to the outermost layer is close to the hardness of the outermost layer.

Abstract: This invention provides a magnetron sputtering apparatus for forming a thin film on a substrate by adhering metal atoms or ions evaporated from a magnetron evaporation source to the substrate, which comprises at least one magnetron evaporation source and at least one auxiliary magnetic pole provided on the circumference of the substrate to generate magnetic lines of force surrounding the substrate. According to this invention, only one kind of magnetron magnetic field structure suffices for the magnetron evaporation sources, a desired sealing magnetic field can be formed regardless of the number or arrangement of the magnetron evaporating sources, and the form of the sealing magnetic field can be easily changed.

Abstract: A vacuum arc evaporation method of disposing a vacuum arc evaporation source and a substrate in a vacuum chamber, and introducing ions generated by arc discharge on the surface of the vacuum arc evaporation source to the substrate by means of magnetic fields, thereby forming a film, wherein the substrate is cleaned before forming the film by generating the arc disc while supplying a gas mixture of a nitrogen gas and an argon gas, a xenon gas, or a gas mixture of nitrogen gas and a xenon gas in the vacuum chamber. A film with improved adhesion and surface roughness can be obtained.

Abstract: Cathodic arc deposition method and apparatus, including an arc evaporation source containing a film forming material. A substrate is arranged on the central axis line of and in front of the evaporation surface of the arc evaporation source. At least one magnet coil is arranged around the central axis line and between the arc evaporation source and the substrate.